GB921530A - Photopolymerisable materials derived from epoxy resins for lithographic printing plates - Google Patents
Photopolymerisable materials derived from epoxy resins for lithographic printing platesInfo
- Publication number
- GB921530A GB921530A GB2819658A GB2819658A GB921530A GB 921530 A GB921530 A GB 921530A GB 2819658 A GB2819658 A GB 2819658A GB 2819658 A GB2819658 A GB 2819658A GB 921530 A GB921530 A GB 921530A
- Authority
- GB
- United Kingdom
- Prior art keywords
- stage
- acid
- pyridine
- epoxy
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4292—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with monocarboxylic acids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Abstract
Improved light sensitive materials are obtained by (i) reacting (a) an epoxy resin which is an organic solvent soluble polyalcohol with more than one but not more than two terminal epoxy groups with (b) a dicarboxylic acid in an amount substantially chemically equivalent to the epoxy content of the resin whereby a polyester alcohol substantially free of epoxy groups but containing a plurality of esterifiable hydroxy groups is produced (the dicarboxylic acid containing no chemical group-e.g. phenolic or amino-capable of reacting preferentially to the carboxyl groups with the epoxy groups) and (ii) esterifying the polyester alcohol thus obtained with cinnamic acid or an esterifiable derivative thereof (e.g. cinnamoyl chloride). Compounds specified are:- (a) epichlorhydrin/bisphenol A of varying molecular weights in powder form; (b) tartaric acid. A monobasic acid, e.g. cinnamic, may be added in stage (i) to limit the molecular weight. Catalysts specified for stage (i) are pyridine and N,N-diethyl aniline. Solvents specified are, for stage (i) dioxane, ethylene glycol, monoethyl ether, tetralin and pyridine; and for stage (ii) cyclohexanone and toluene, with pyridine optionally added as an acid absorbent. The materials may be light sensitized further in the usual way, e.g. with Michler's ketone (N,N,N1,N1-tetramethyl-p,p1-diamino diphenyl ketone). Specifications 713,947, 717,708, 717,710, 717,712 and 743,455 are referred to.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2819658A GB921530A (en) | 1958-09-02 | 1958-09-02 | Photopolymerisable materials derived from epoxy resins for lithographic printing plates |
DEA32764A DE1106181B (en) | 1958-09-02 | 1959-09-01 | Process for producing a copying layer for planographic printing plates from epoxy resins |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2819658A GB921530A (en) | 1958-09-02 | 1958-09-02 | Photopolymerisable materials derived from epoxy resins for lithographic printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
GB921530A true GB921530A (en) | 1963-03-20 |
Family
ID=10271818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2819658A Expired GB921530A (en) | 1958-09-02 | 1958-09-02 | Photopolymerisable materials derived from epoxy resins for lithographic printing plates |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE1106181B (en) |
GB (1) | GB921530A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3231378A (en) * | 1963-07-10 | 1966-01-25 | Union Carbide Corp | Image enhancement in photosensitive compositions for planographic printing plates |
US3387976A (en) * | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
US3790385A (en) * | 1970-07-13 | 1974-02-05 | Kalle Ag | Light-sensitive diazo copying composition and copying material produced therewith |
US4330611A (en) * | 1969-05-29 | 1982-05-18 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials |
US4486526A (en) * | 1969-05-29 | 1984-12-04 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials |
-
1958
- 1958-09-02 GB GB2819658A patent/GB921530A/en not_active Expired
-
1959
- 1959-09-01 DE DEA32764A patent/DE1106181B/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3231378A (en) * | 1963-07-10 | 1966-01-25 | Union Carbide Corp | Image enhancement in photosensitive compositions for planographic printing plates |
US3387976A (en) * | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
US4330611A (en) * | 1969-05-29 | 1982-05-18 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials |
US4486526A (en) * | 1969-05-29 | 1984-12-04 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials |
US3790385A (en) * | 1970-07-13 | 1974-02-05 | Kalle Ag | Light-sensitive diazo copying composition and copying material produced therewith |
Also Published As
Publication number | Publication date |
---|---|
DE1106181B (en) | 1961-05-04 |
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