GB913764A - - Google Patents

Info

Publication number
GB913764A
GB913764A GB913764DA GB913764A GB 913764 A GB913764 A GB 913764A GB 913764D A GB913764D A GB 913764DA GB 913764 A GB913764 A GB 913764A
Authority
GB
United Kingdom
Prior art keywords
group
alcohol
epoxy
groups
toluene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of GB913764A publication Critical patent/GB913764A/en
Active legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

913,764. Lithographic printing plates. ALGRAPHY Ltd., and ADAMS, R. A. C. Aug. 26, 1959 [Sept. 2, 1958], No. 28197/58. Class 98 (2). [Also in Group IV (a)] Lithographic printing plates may be coated with light sensitive materials prepared (see Group IV (a)) by (i) reacting (a) a linear epoxy resin which is an organic solvent soluble polyalcohol with more than one but not more than two terminal epoxy groups, with (b) an aliphatic alcohol containing two primary alcohol groups and at least one secondary alcohol group per molecule in an amount substantially equivalent to the epoxy content of the resin (one primary alcohol group being equivalent to one epoxy group) such that the hydroxyl equivalency of the alcohol is less than that of di-p-phenylol- 2,2-propane (i.e. less than 114), and (ii) esterifying with cinnamic acid or an esterifiable derivative thereof (e.g. cinnamoyl chloride), the solvent soluble polyether alcohol thus produced which contains no epoxy groups but has a lower hydroxyl equivalency and higher molecular weight than the original epoxy resin. Compounds specified are :-(a) epichlorhydrin/bisphenol A; (b) sorbitol. In Example (1) a solution of such a cinnamic ester and Michler's ketone in cyclohexanone/toluene was whirlcoated on to an aluminium plate; the plate was then exposed, developed in the same fresh solvent, rinsed in toluene, dried, and hand-inked by normal lithographic technique. A second example is similar. Specifications 713,947, 717,708, 717,710, 717,712 and 743,455 are referred to.
GB913764D 1958-09-02 Active GB913764A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1108078X 1958-09-02

Publications (1)

Publication Number Publication Date
GB913764A true GB913764A (en)

Family

ID=10874584

Family Applications (1)

Application Number Title Priority Date Filing Date
GB913764D Active GB913764A (en) 1958-09-02

Country Status (2)

Country Link
DE (1) DE1108078B (en)
GB (1) GB913764A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4330611A (en) * 1969-05-29 1982-05-18 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials
US4486526A (en) * 1969-05-29 1984-12-04 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4330611A (en) * 1969-05-29 1982-05-18 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials
US4486526A (en) * 1969-05-29 1984-12-04 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials

Also Published As

Publication number Publication date
DE1108078B (en) 1961-05-31

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