GB1492465A - Nozzles and method of producing nozzles - Google Patents

Nozzles and method of producing nozzles

Info

Publication number
GB1492465A
GB1492465A GB43997/75A GB4399775A GB1492465A GB 1492465 A GB1492465 A GB 1492465A GB 43997/75 A GB43997/75 A GB 43997/75A GB 4399775 A GB4399775 A GB 4399775A GB 1492465 A GB1492465 A GB 1492465A
Authority
GB
United Kingdom
Prior art keywords
layer
etching
silicon
section
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB43997/75A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1492465A publication Critical patent/GB1492465A/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1628Manufacturing processes etching dry etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/162Manufacturing of the nozzle plates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1629Manufacturing processes etching wet etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B9/00Blowing glass; Production of hollow glass articles
    • C03B9/30Details of blowing glass; Use of materials for the moulds
    • C03B9/32Giving special shapes to parts of hollow glass articles
    • C03B9/33Making hollow glass articles with feet or projections; Moulds therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14475Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S239/00Fluid sprinkling, spraying, and diffusing
    • Y10S239/19Nozzle materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Weting (AREA)
  • Facsimile Heads (AREA)
  • Nozzles (AREA)
GB43997/75A 1974-12-31 1975-10-27 Nozzles and method of producing nozzles Expired GB1492465A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US537799A US3921916A (en) 1974-12-31 1974-12-31 Nozzles formed in monocrystalline silicon

Publications (1)

Publication Number Publication Date
GB1492465A true GB1492465A (en) 1977-11-23

Family

ID=24144139

Family Applications (1)

Application Number Title Priority Date Filing Date
GB43997/75A Expired GB1492465A (en) 1974-12-31 1975-10-27 Nozzles and method of producing nozzles

Country Status (7)

Country Link
US (1) US3921916A (fr)
JP (1) JPS5516070B2 (fr)
CA (1) CA1037519A (fr)
DE (1) DE2555462C2 (fr)
FR (1) FR2296504A1 (fr)
GB (1) GB1492465A (fr)
IT (1) IT1054354B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0149330A1 (fr) * 1983-12-08 1985-07-24 General Signal Corporation Capteur ISFET et procédé de fabrication

Families Citing this family (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4007464A (en) * 1975-01-23 1977-02-08 International Business Machines Corporation Ink jet nozzle
US4014029A (en) * 1975-12-31 1977-03-22 International Business Machines Corporation Staggered nozzle array
US4047184A (en) * 1976-01-28 1977-09-06 International Business Machines Corporation Charge electrode array and combination for ink jet printing and method of manufacture
US4106976A (en) * 1976-03-08 1978-08-15 International Business Machines Corporation Ink jet nozzle method of manufacture
US4035812A (en) * 1976-07-12 1977-07-12 The Mead Corporation Ink jet recorder and charge ring plate therefor with reduced deplating current
US4169008A (en) * 1977-06-13 1979-09-25 International Business Machines Corporation Process for producing uniform nozzle orifices in silicon wafers
US4146899A (en) * 1977-10-13 1979-03-27 The Mead Corporation Formed orifice plate for ink jet printing apparatus
US4184925A (en) * 1977-12-19 1980-01-22 The Mead Corporation Solid metal orifice plate for a jet drop recorder
US4239586A (en) * 1979-06-29 1980-12-16 International Business Machines Corporation Etching of multiple holes of uniform size
US4229265A (en) * 1979-08-09 1980-10-21 The Mead Corporation Method for fabricating and the solid metal orifice plate for a jet drop recorder produced thereby
US4282533A (en) * 1980-02-22 1981-08-04 Celanese Corporation Precision orifice nozzle devices for ink jet printing apparati and the process for their manufacture
US4430784A (en) * 1980-02-22 1984-02-14 Celanese Corporation Manufacturing process for orifice nozzle devices for ink jet printing apparati
JPS5764563A (en) * 1980-10-07 1982-04-19 Fuji Xerox Co Ltd Ink particle jet apparatus of multi-nozzle ink jet printer
JPS57182449A (en) * 1981-05-07 1982-11-10 Fuji Xerox Co Ltd Forming method of ink jet multinozzle
JPS57208262A (en) * 1981-06-18 1982-12-21 Ibm Drop-on demand type ink jet printing method
EP0078337B1 (fr) * 1981-10-30 1987-04-22 Ibm Deutschland Gmbh Dispositif de contact pour la connexion amovible de composants électriques
US4583690A (en) * 1983-04-05 1986-04-22 Hewlett-Packard Company Anti-wetting in fluid nozzles
US4555062A (en) * 1983-04-05 1985-11-26 Hewlett-Packard Company Anti-wetting in fluid nozzles
EP0355862B1 (fr) * 1984-09-28 1993-01-13 Matsushita Electric Industrial Co., Ltd. Imprimante à jet d'encre
CA1237020A (fr) * 1984-10-13 1988-05-24 Herbert A. Waggener Buse en silicone, et sa fabrication
US4733823A (en) * 1984-10-15 1988-03-29 At&T Teletype Corporation Silicon nozzle structures and method of manufacture
US4756508A (en) * 1985-02-21 1988-07-12 Ford Motor Company Silicon valve
US4628576A (en) * 1985-02-21 1986-12-16 Ford Motor Company Method for fabricating a silicon valve
US4647013A (en) * 1985-02-21 1987-03-03 Ford Motor Company Silicon valve
US4768751A (en) * 1987-10-19 1988-09-06 Ford Motor Company Silicon micromachined non-elastic flow valves
WO1989008787A1 (fr) * 1988-03-14 1989-09-21 Baxter International Inc. Systemes presentant des mecanismes de regulation de debit a vitesse constante et variable
US5176360A (en) * 1988-03-14 1993-01-05 Baxter International Inc. Infusor having fixed and variable flow rate control mechanisms
US5014750A (en) * 1988-03-14 1991-05-14 Baxter International Inc. Systems having fixed and variable flow rate control mechanisms
US5009251A (en) * 1988-11-15 1991-04-23 Baxter International, Inc. Fluid flow control
SG45171A1 (en) * 1990-03-21 1998-01-16 Boehringer Ingelheim Int Atomising devices and methods
DE4112150C2 (de) * 1990-09-21 1998-11-19 Bosch Gmbh Robert Lochkörper und Ventil mit Lochkörper
IL100224A (en) * 1990-12-04 1994-10-21 Dmw Tech Ltd Spray nozzle
DE4104019C1 (fr) * 1991-02-09 1992-04-23 Robert Bosch Gmbh, 7000 Stuttgart, De
ATE173197T1 (de) * 1992-08-31 1998-11-15 Canon Kk Tintenstrahlkopfherstellungsverfahren mittels bearbeitung durch ionen und tintenstrahlkopf
US6007676A (en) 1992-09-29 1999-12-28 Boehringer Ingelheim International Gmbh Atomizing nozzle and filter and spray generating device
IL107120A (en) * 1992-09-29 1997-09-30 Boehringer Ingelheim Int Atomising nozzle and filter and spray generating device
DE69415362T2 (de) * 1993-02-17 1999-06-10 DENSO CORPORATION, Kariya-city, Aichi-pref. Flüssigkeiteinspritzventil
US5569187A (en) * 1994-08-16 1996-10-29 Texas Instruments Incorporated Method and apparatus for wireless chemical supplying
US5908414A (en) * 1995-05-03 1999-06-01 Tricumed Gmbh Implantable infusion pump
DE19515722C1 (de) * 1995-05-03 1996-07-25 Tricumed Gmbh Implantierbare Infusionspumpe
US5992769A (en) * 1995-06-09 1999-11-30 The Regents Of The University Of Michigan Microchannel system for fluid delivery
GB2302842B (en) * 1995-07-03 1998-12-30 Seiko Epson Corp A nozzle plate, ink-jet head and manufacturing method thereof
JP3386099B2 (ja) * 1995-07-03 2003-03-10 セイコーエプソン株式会社 インクジェット式記録ヘッド用ノズルプレート、これの製造方法、及びインクジェット式記録ヘッド
US5658471A (en) * 1995-09-22 1997-08-19 Lexmark International, Inc. Fabrication of thermal ink-jet feed slots in a silicon substrate
US5757400A (en) * 1996-02-01 1998-05-26 Spectra, Inc. High resolution matrix ink jet arrangement
US6352209B1 (en) 1996-07-08 2002-03-05 Corning Incorporated Gas assisted atomizing devices and methods of making gas-assisted atomizing devices
EP0910478A4 (fr) * 1996-07-08 1999-09-01 Corning Inc Dispositifs d'atomisation a rupture de rayleigh et procedes de fabrication de ces dispositifs
BR9710223A (pt) 1996-07-08 2000-01-18 Spraychip Systems Dispositivo de atomização auxiliado por gás.
US5901425A (en) * 1996-08-27 1999-05-11 Topaz Technologies Inc. Inkjet print head apparatus
WO1998047712A1 (fr) * 1997-04-18 1998-10-29 Topaz Technologies, Inc. Plaque de buse pour tete d'impression par jet d'encre
EP0985534A4 (fr) * 1997-05-14 2001-03-28 Seiko Epson Corp Procede de formation d'ajutage pour injecteurs et procede de fabrication d'une tete a jet d'encre
JP3530744B2 (ja) * 1997-07-04 2004-05-24 キヤノン株式会社 インクジェット記録ヘッドの製造方法
DE19742439C1 (de) * 1997-09-26 1998-10-22 Boehringer Ingelheim Int Mikrostrukturiertes Filter
EP1044172A4 (fr) * 1997-12-19 2005-01-19 Corning Inc Bruleur et procede de production de suies d'oxyde metallique
WO2000015321A1 (fr) * 1998-09-17 2000-03-23 Advanced Bioanalytical Services, Inc. Systeme monolithique integre microfabrique d'electronebulisation et de chromatographie en phase liquide et procede associe
US6363606B1 (en) * 1998-10-16 2002-04-02 Agere Systems Guardian Corp. Process for forming integrated structures using three dimensional printing techniques
US6633031B1 (en) 1999-03-02 2003-10-14 Advion Biosciences, Inc. Integrated monolithic microfabricated dispensing nozzle and liquid chromatography-electrospray system and method
JP2001179987A (ja) * 1999-12-22 2001-07-03 Samsung Electro Mech Co Ltd ノズルプレート及びその製造方法
CN1237572C (zh) 1999-12-30 2006-01-18 阿德维昂生物科学公司 多电雾化装置、系统和方法
JP2003520962A (ja) 2000-01-18 2003-07-08 アドビオン バイオサイエンシーズ インコーポレーティッド 分離媒体、複式電気噴霧ノズルシステム、および方法
KR100499118B1 (ko) 2000-02-24 2005-07-04 삼성전자주식회사 단결정 실리콘 웨이퍼를 이용한 일체형 유체 노즐어셈블리 및 그 제작방법
DE10101875B4 (de) * 2001-01-16 2006-05-04 Infineon Technologies Ag Elektronisches Bauteil mit aufeinander gestapelten Halbleiterchips und Verfahren zu seiner Herstellung
JP3881985B2 (ja) * 2001-12-04 2007-02-14 株式会社アトック 石英ガラス製流体送給用単穴ノズル及び石英ガラス製流体送給用多穴バーナヘッド
JP3975272B2 (ja) * 2002-02-21 2007-09-12 独立行政法人産業技術総合研究所 超微細流体ジェット装置
EP1665353A4 (fr) * 2003-09-09 2006-11-29 Csg Solar Ag Procede ameliore de gravure de silicium
WO2005024920A1 (fr) * 2003-09-09 2005-03-17 Csg Solar, Ag Procede ameliore de formation d'ouvertures dans une matiere de resine organique
WO2005024959A1 (fr) * 2003-09-09 2005-03-17 Csg Solar, Ag Reglage de masques par refusion
WO2005039696A1 (fr) * 2003-10-21 2005-05-06 The Regents Of The University Of Michigan Systeme d'interface neuronal intracranien
US7347532B2 (en) * 2004-08-05 2008-03-25 Fujifilm Dimatix, Inc. Print head nozzle formation
US9014796B2 (en) 2005-06-14 2015-04-21 Regents Of The University Of Michigan Flexible polymer microelectrode with fluid delivery capability and methods for making same
EP1931419B1 (fr) * 2005-10-07 2016-08-10 NeuroNexus Technologies, Inc. Reseau de microelectrodes multivoie modulaire
US8195267B2 (en) 2006-01-26 2012-06-05 Seymour John P Microelectrode with laterally extending platform for reduction of tissue encapsulation
JP4881126B2 (ja) * 2006-10-25 2012-02-22 株式会社東芝 ノズルプレートの製造方法、および液滴吐出ヘッドの製造方法
US8731673B2 (en) 2007-02-26 2014-05-20 Sapiens Steering Brain Stimulation B.V. Neural interface system
US20100276505A1 (en) * 2007-09-26 2010-11-04 Roger Earl Smith Drilling in stretched substrates
US8958862B2 (en) 2007-10-17 2015-02-17 Neuronexus Technologies, Inc. Implantable device including a resorbable carrier
US8565894B2 (en) * 2007-10-17 2013-10-22 Neuronexus Technologies, Inc. Three-dimensional system of electrode leads
US8224417B2 (en) 2007-10-17 2012-07-17 Neuronexus Technologies, Inc. Guide tube for an implantable device system
US8498720B2 (en) 2008-02-29 2013-07-30 Neuronexus Technologies, Inc. Implantable electrode and method of making the same
US20090240314A1 (en) * 2008-03-24 2009-09-24 Kong K C Implantable electrode lead system with a three dimensional arrangement and method of making the same
US9289142B2 (en) 2008-03-24 2016-03-22 Neuronexus Technologies, Inc. Implantable electrode lead system with a three dimensional arrangement and method of making the same
JP2012507417A (ja) * 2008-10-31 2012-03-29 フジフィルム ディマティックス, インコーポレイテッド ノズル噴出口成形
US8197029B2 (en) 2008-12-30 2012-06-12 Fujifilm Corporation Forming nozzles
EP2488098B1 (fr) * 2009-10-16 2014-03-19 Neuronexus Technologies Système d'interface neuronale
CN102686147B (zh) 2009-11-05 2016-01-20 格雷特巴奇有限公司 波导神经接口装置
US9155861B2 (en) 2010-09-20 2015-10-13 Neuronexus Technologies, Inc. Neural drug delivery system with fluidic threads
JP6901446B2 (ja) 2018-09-03 2021-07-14 株式会社東芝 無線通信装置、無線通信システム、無線通信方法及びプログラム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665946A (en) * 1951-05-29 1954-01-12 Arthur E Broughton Spray nozzle
US2834635A (en) * 1955-06-22 1958-05-13 Muellermist Irrigation Co Liquid spray device
US2987262A (en) * 1959-11-24 1961-06-06 Lodding Engineering Corp Removable and replaceable shower device
US3125295A (en) * 1960-12-30 1964-03-17 Crystal
US3211088A (en) * 1962-05-04 1965-10-12 Sperry Rand Corp Exponential horn printer
JPS5040616B1 (fr) * 1970-03-18 1975-12-25
US3655530A (en) * 1970-06-15 1972-04-11 Mead Corp Fabrication of orifices
US3742230A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask support substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0149330A1 (fr) * 1983-12-08 1985-07-24 General Signal Corporation Capteur ISFET et procédé de fabrication

Also Published As

Publication number Publication date
IT1054354B (it) 1981-11-10
JPS5516070B2 (fr) 1980-04-28
DE2555462C2 (de) 1982-06-03
FR2296504A1 (fr) 1976-07-30
JPS5184641A (fr) 1976-07-24
US3921916A (en) 1975-11-25
DE2555462A1 (de) 1976-07-08
FR2296504B1 (fr) 1978-05-12
CA1037519A (fr) 1978-08-29

Similar Documents

Publication Publication Date Title
GB1492465A (en) Nozzles and method of producing nozzles
GB1522293A (en) Forming monocrystalline silicon carbide on a silicon body
GB1436603A (en) Method of selectively etching multilayer structures
GB1475656A (en) Method of etching materials containing silicon
KR870011672A (ko) 단결정 실리콘의 디프 트렌치 에칭
JPS5493378A (en) Manufacture for semiconductor device
GB1449789A (en) Method of growing pyrolytic silicon dioxide layers
JPS5343480A (en) Etching method of gallium nitride
GB1142405A (en) Method of making a semiconductor device having two insulating coatings
JPS54114178A (en) Vacuum epitaxial growing method
JPS5543882A (en) Gaseous-phase growing of compound semiconductor epitaxial film
JPS6428962A (en) Semiconductor device and manufacture thereof
JPS5386571A (en) Production of self-alignment type crystal
JPS56124272A (en) Manufacture of semiconductor device
GB1297235A (fr)
UST101302I4 (en) Selective reactive ion etching of polycrystalline silicon against monocrystalline silicon
CA1065981A (fr) Fabrication de diodes electroluminescentes a radiance elevee
JPS5534482A (en) Manufacturing method for semiconductor laser
JPS54130877A (en) Production of semiconductor device
JPS53132279A (en) Production of semiconductor device
JPS5436185A (en) Etching method of gaas system compound semiconductor crystal
JPS52116072A (en) Process for doping nitrogen to gallium phosphide
JPS64744A (en) Element isolation method in semiconductor device
JPS5654066A (en) Production of bevel type semiconductor
GB1501894A (en) Method of manufacturing a power transistor

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee