GB1480562A - Detecting a registration mark on a target - Google Patents

Detecting a registration mark on a target

Info

Publication number
GB1480562A
GB1480562A GB818/75A GB81875A GB1480562A GB 1480562 A GB1480562 A GB 1480562A GB 818/75 A GB818/75 A GB 818/75A GB 81875 A GB81875 A GB 81875A GB 1480562 A GB1480562 A GB 1480562A
Authority
GB
United Kingdom
Prior art keywords
scan
registration mark
signal
scans
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB818/75A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1480562A publication Critical patent/GB1480562A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Image Analysis (AREA)
  • Image Processing (AREA)
GB818/75A 1974-01-28 1975-01-08 Detecting a registration mark on a target Expired GB1480562A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US437434A US3875415A (en) 1974-01-28 1974-01-28 Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer

Publications (1)

Publication Number Publication Date
GB1480562A true GB1480562A (en) 1977-07-20

Family

ID=23736432

Family Applications (1)

Application Number Title Priority Date Filing Date
GB818/75A Expired GB1480562A (en) 1974-01-28 1975-01-08 Detecting a registration mark on a target

Country Status (6)

Country Link
US (1) US3875415A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5821427B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2502591C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2259351B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1480562A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL7500897A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2143637A (en) * 1983-07-04 1985-02-13 Canon Kk An alignment apparatus

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
US4056730A (en) * 1976-07-12 1977-11-01 International Business Machines Corporation Apparatus for detecting registration marks on a target such as a semiconductor wafer
JPS5319763A (en) * 1976-08-09 1978-02-23 Nippon Telegr & Teleph Corp <Ntt> Mark detector in electron beam exposure
JPS5585028A (en) * 1978-12-22 1980-06-26 Hitachi Ltd Mark detecting signal amplifier
JPS5676531A (en) * 1979-11-28 1981-06-24 Fujitsu Ltd Manufacture of semiconductor device
JPS56103420A (en) * 1980-01-23 1981-08-18 Hitachi Ltd Compensating method for deflection distortion in charged particle beam apparatus
JPS5946025A (ja) * 1982-09-09 1984-03-15 Hitachi Ltd パタ−ンエツジの検出方法及び装置
US4535249A (en) * 1983-06-17 1985-08-13 Hughes Aircraft Company Benchmark detector
JPS615919U (ja) * 1984-06-16 1986-01-14 ワイケイケイ株式会社 複合パネル
US4977328A (en) * 1989-03-02 1990-12-11 U.S. Philips Corporation Method of detecting a marker provided on a specimen
JPH02286232A (ja) * 1989-04-26 1990-11-26 Showa Aircraft Ind Co Ltd ハニカムパネル
US5838013A (en) * 1996-11-13 1998-11-17 International Business Machines Corporation Method for monitoring resist charging in a charged particle system
US6739509B2 (en) * 2001-10-03 2004-05-25 Kimberly-Clark Worldwide, Inc. Registration mark detection using matched filtering
US6694205B2 (en) * 2001-12-21 2004-02-17 Kimberly-Clark Worldwide, Inc. Binary registration mark detection using 3-state sensing and matched filtering

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804646B2 (de) * 1968-10-18 1973-03-22 Siemens AG, 1000 Berlin u. 8000 München Korpuskularstrahl-bearbeitungsgeraet
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3832561A (en) * 1973-10-01 1974-08-27 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2143637A (en) * 1983-07-04 1985-02-13 Canon Kk An alignment apparatus

Also Published As

Publication number Publication date
US3875415A (en) 1975-04-01
FR2259351B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1976-10-22
DE2502591A1 (de) 1975-07-31
FR2259351A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-08-22
JPS5821427B2 (ja) 1983-04-30
NL7500897A (nl) 1975-07-30
JPS50105382A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-08-20
DE2502591C2 (de) 1983-02-24

Similar Documents

Publication Publication Date Title
GB1480562A (en) Detecting a registration mark on a target
US4588890A (en) Apparatus and method for composite image formation by scanning electron beam
GB1456549A (en) System for detecting the position of a pattern
US3901814A (en) Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer
GB1201383A (en) Means for adjusting the treating point in an electron beam apparatus
GB1427695A (en) Signal processing system
US4056730A (en) Apparatus for detecting registration marks on a target such as a semiconductor wafer
US3845319A (en) Method and apparatus for the accurate detection of the passage of the edge of a straight contrast jump
KR880004550A (ko) 일차입자 비임 조사장치 및 그의 조사방법
US4916315A (en) Scanning electron microscope for observing and measuring minute pattern of sample
GB1269140A (en) Pattern extremity determination
US3445663A (en) Noise discrimination by unblanking during the time that an a-c reference signal is in the neighborhood of the value it had at the time of the previously accepted pulse
US2918216A (en) Particle counting apparatus
US2922049A (en) Mask controlled signal generating system
JPS6258140B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
Naik et al. Random Line Segment Distance Measurement Using Image Processing
JPH08184678A (ja) 荷電粒子ビームの寸法測定装置および測定方法
US3939349A (en) Method and device for classifying tires
JPS62261911A (ja) 形状測定方法
JPH0282515A (ja) 電子ビーム描画方法
JPH0147892B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH03289507A (ja) パターン寸法測定方法及び装置
JPS5615040A (en) Mark detector
JP2758979B2 (ja) マーク位置検出方法
JPS57186327A (en) Detecting method for mark position in electron beam exposure

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee