FR2259351B1 - - Google Patents

Info

Publication number
FR2259351B1
FR2259351B1 FR7441668A FR7441668A FR2259351B1 FR 2259351 B1 FR2259351 B1 FR 2259351B1 FR 7441668 A FR7441668 A FR 7441668A FR 7441668 A FR7441668 A FR 7441668A FR 2259351 B1 FR2259351 B1 FR 2259351B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7441668A
Other versions
FR2259351A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2259351A1 publication Critical patent/FR2259351A1/fr
Application granted granted Critical
Publication of FR2259351B1 publication Critical patent/FR2259351B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Image Analysis (AREA)
  • Image Processing (AREA)
FR7441668A 1974-01-28 1974-12-05 Expired FR2259351B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US437434A US3875415A (en) 1974-01-28 1974-01-28 Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer

Publications (2)

Publication Number Publication Date
FR2259351A1 FR2259351A1 (fr) 1975-08-22
FR2259351B1 true FR2259351B1 (fr) 1976-10-22

Family

ID=23736432

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7441668A Expired FR2259351B1 (fr) 1974-01-28 1974-12-05

Country Status (6)

Country Link
US (1) US3875415A (fr)
JP (1) JPS5821427B2 (fr)
DE (1) DE2502591C2 (fr)
FR (1) FR2259351B1 (fr)
GB (1) GB1480562A (fr)
NL (1) NL7500897A (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
US4056730A (en) * 1976-07-12 1977-11-01 International Business Machines Corporation Apparatus for detecting registration marks on a target such as a semiconductor wafer
JPS5319763A (en) * 1976-08-09 1978-02-23 Nippon Telegr & Teleph Corp <Ntt> Mark detector in electron beam exposure
JPS5585028A (en) * 1978-12-22 1980-06-26 Hitachi Ltd Mark detecting signal amplifier
JPS5676531A (en) * 1979-11-28 1981-06-24 Fujitsu Ltd Manufacture of semiconductor device
JPS56103420A (en) * 1980-01-23 1981-08-18 Hitachi Ltd Compensating method for deflection distortion in charged particle beam apparatus
JPS5946025A (ja) * 1982-09-09 1984-03-15 Hitachi Ltd パタ−ンエツジの検出方法及び装置
US4535249A (en) * 1983-06-17 1985-08-13 Hughes Aircraft Company Benchmark detector
US4713784A (en) * 1983-07-04 1987-12-15 Canon Kabushiki Kaisha Alignment apparatus
JPS615919U (ja) * 1984-06-16 1986-01-14 ワイケイケイ株式会社 複合パネル
US4977328A (en) * 1989-03-02 1990-12-11 U.S. Philips Corporation Method of detecting a marker provided on a specimen
JPH02286232A (ja) * 1989-04-26 1990-11-26 Showa Aircraft Ind Co Ltd ハニカムパネル
US5838013A (en) * 1996-11-13 1998-11-17 International Business Machines Corporation Method for monitoring resist charging in a charged particle system
US6739509B2 (en) * 2001-10-03 2004-05-25 Kimberly-Clark Worldwide, Inc. Registration mark detection using matched filtering
US6694205B2 (en) * 2001-12-21 2004-02-17 Kimberly-Clark Worldwide, Inc. Binary registration mark detection using 3-state sensing and matched filtering

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804646B2 (de) * 1968-10-18 1973-03-22 Siemens AG, 1000 Berlin u. 8000 München Korpuskularstrahl-bearbeitungsgeraet
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3832561A (en) * 1973-10-01 1974-08-27 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts

Also Published As

Publication number Publication date
NL7500897A (nl) 1975-07-30
FR2259351A1 (fr) 1975-08-22
DE2502591C2 (de) 1983-02-24
JPS50105382A (fr) 1975-08-20
DE2502591A1 (de) 1975-07-31
US3875415A (en) 1975-04-01
JPS5821427B2 (ja) 1983-04-30
GB1480562A (en) 1977-07-20

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Legal Events

Date Code Title Description
ST Notification of lapse