GB1201383A - Means for adjusting the treating point in an electron beam apparatus - Google Patents

Means for adjusting the treating point in an electron beam apparatus

Info

Publication number
GB1201383A
GB1201383A GB37558/67A GB3755867A GB1201383A GB 1201383 A GB1201383 A GB 1201383A GB 37558/67 A GB37558/67 A GB 37558/67A GB 3755867 A GB3755867 A GB 3755867A GB 1201383 A GB1201383 A GB 1201383A
Authority
GB
United Kingdom
Prior art keywords
workpiece
electron beam
point
datum
aug
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB37558/67A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2827267A external-priority patent/JPS5127917B1/ja
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Publication of GB1201383A publication Critical patent/GB1201383A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)

Abstract

1,201,383. Programmed control of machining. NIHON DENSHI K.K. Aug.15, 1967 [Aug.16, 1966; May 2, 1967], No.37558/67. Heading G3N. An electron beam apparatus for treating a workpiece comprises means for focusing an electron beam on the workpiece, means for deflecting the electron beam across the workpiece, a detector for detecting the incidence of the electron beam on a workpiece datum point, having particular characteristics of electron reflection and/or absorption, a computer to which the outputs of the detector is fed and which is pre-set with the co-ordinates representative of a treatment point on the workpiece relative to the datum point, and control means responsive to the computer output to relatively move the workpiece and electron beam so that it impinges on the treatment point. When searching for the datum point the workpiece is scanned under computer control by being divided into several small regions. In order to eliminate spurious signals the datum points comprise pairs of v-shaped notches, the separation distance between which is used as a recognition pattern in a delayed-pulse signal discriminator. Rotational orientation is effected by determining the angle, with respect to co-ordinate areas, of a line between two datum points.
GB37558/67A 1966-08-16 1967-08-15 Means for adjusting the treating point in an electron beam apparatus Expired GB1201383A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5382666 1966-08-16
JP2827267A JPS5127917B1 (en) 1967-05-02 1967-05-02

Publications (1)

Publication Number Publication Date
GB1201383A true GB1201383A (en) 1970-08-05

Family

ID=26366331

Family Applications (1)

Application Number Title Priority Date Filing Date
GB37558/67A Expired GB1201383A (en) 1966-08-16 1967-08-15 Means for adjusting the treating point in an electron beam apparatus

Country Status (4)

Country Link
US (1) US3513285A (en)
DE (1) DE1690626C3 (en)
FR (1) FR1533755A (en)
GB (1) GB1201383A (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5552675A (en) * 1959-04-08 1996-09-03 Lemelson; Jerome H. High temperature reaction apparatus
DE1765819A1 (en) * 1968-07-23 1972-01-13 Ibm Deutschland Method for determining the deflection data for a charge carrier beam processing device
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3789185A (en) * 1969-12-15 1974-01-29 Ibm Electron beam deflection control apparatus
FR2087114A5 (en) * 1970-05-05 1971-12-31 Cit Alcatel
US3783228A (en) * 1970-12-28 1974-01-01 Agency Ind Science Techn Method of manufacturing integrated circuits
US3775581A (en) * 1971-06-23 1973-11-27 Welding Research Inc Seam tracking method
CA946480A (en) * 1971-07-26 1974-04-30 Sciaky Intertechnique S.A. Hole center locator
US3873802A (en) * 1971-07-26 1975-03-25 Welding Research Inc Elector beam welding apparatus chicorporating a hole center locating means
US3849659A (en) * 1973-09-10 1974-11-19 Westinghouse Electric Corp Alignment of a patterned electron beam with a member by electron backscatter
US4158122A (en) * 1973-12-21 1979-06-12 Obolonsky Alexei P Method of measuring and stabilizing the diameter of heating point on workpiece in electron beam welding machine and on automatic device for realization thereof
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
DE2719801C3 (en) * 1977-04-28 1981-11-19 Siemens AG, 1000 Berlin und 8000 München Corpuscular beam optical device for irradiating a specimen with a device for adjusting the same
US4179316A (en) * 1977-10-17 1979-12-18 Sciaky Bros., Inc. Method and apparatus for heat treating
US4149085A (en) * 1978-01-16 1979-04-10 International Business Machines Corporation Automatic overlay measurements using an electronic beam system as a measurement tool
JPS5731134A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Drawing device by electron beam
JPS57183034A (en) * 1981-05-07 1982-11-11 Toshiba Corp Electron bean transfer device
JPS5946026A (en) * 1982-09-09 1984-03-15 Toshiba Corp Measuring method for position of sample
DE3243033A1 (en) * 1982-11-22 1984-05-24 Institut für Kerntechnik und Energiewandlung e.V., 7000 Stuttgart METHOD AND ARRANGEMENT FOR MACHINING A WORKPIECE BY MEANS OF A FOCUSED ELECTRON BEAM
DE3810391A1 (en) * 1988-03-26 1989-10-05 Leybold Ag DEVICE AND METHOD FOR CONTROLLING AND MONITORING A DEFLECTABLE ELECTRON BEAM FOR METAL WORKING
DE4024084A1 (en) * 1989-11-29 1991-06-06 Daimler Benz Ag METHOD FOR PRODUCING HOLLOW GAS EXCHANGE VALVES FOR LIFTING PISTON MACHINES
US5483036A (en) * 1993-10-28 1996-01-09 Sandia Corporation Method of automatic measurement and focus of an electron beam and apparatus therefor
EP2575159B1 (en) * 2011-09-30 2016-04-20 Carl Zeiss Microscopy GmbH Particle beam system and method for operating the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3284618A (en) * 1962-03-16 1966-11-08 Licentia Gmbh Nominal value position control system
GB1065060A (en) * 1963-04-19 1967-04-12 United Aircraft Corp Improvements in and relating to apparatus for working articles with energised beams
US3326176A (en) * 1964-10-27 1967-06-20 Nat Res Corp Work-registration device including ionic beam probe

Also Published As

Publication number Publication date
US3513285A (en) 1970-05-19
FR1533755A (en) 1968-07-19
DE1690626B2 (en) 1973-09-13
DE1690626A1 (en) 1971-04-08
DE1690626C3 (en) 1979-02-08

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee