FR1533755A - Device for adjusting the point of treatment in an apparatus with an electric beam or the like - Google Patents
Device for adjusting the point of treatment in an apparatus with an electric beam or the likeInfo
- Publication number
- FR1533755A FR1533755A FR117128A FR117128A FR1533755A FR 1533755 A FR1533755 A FR 1533755A FR 117128 A FR117128 A FR 117128A FR 117128 A FR117128 A FR 117128A FR 1533755 A FR1533755 A FR 1533755A
- Authority
- FR
- France
- Prior art keywords
- adjusting
- treatment
- point
- electric beam
- electric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5382666 | 1966-08-16 | ||
JP2827267A JPS5127917B1 (en) | 1967-05-02 | 1967-05-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1533755A true FR1533755A (en) | 1968-07-19 |
Family
ID=26366331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR117128A Expired FR1533755A (en) | 1966-08-16 | 1967-08-07 | Device for adjusting the point of treatment in an apparatus with an electric beam or the like |
Country Status (4)
Country | Link |
---|---|
US (1) | US3513285A (en) |
DE (1) | DE1690626C3 (en) |
FR (1) | FR1533755A (en) |
GB (1) | GB1201383A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2016815A1 (en) * | 1968-07-23 | 1970-05-15 | Ibm | |
DE2056620A1 (en) * | 1969-12-15 | 1971-06-16 | Ibm | Device for exposure of semiconductor elements |
EP0003038A2 (en) * | 1978-01-16 | 1979-07-25 | International Business Machines Corporation | Method for overlay measurement using an electronic beam system as a measuring tool |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5552675A (en) * | 1959-04-08 | 1996-09-03 | Lemelson; Jerome H. | High temperature reaction apparatus |
US3789185A (en) * | 1969-12-15 | 1974-01-29 | Ibm | Electron beam deflection control apparatus |
FR2087114A5 (en) * | 1970-05-05 | 1971-12-31 | Cit Alcatel | |
US3783228A (en) * | 1970-12-28 | 1974-01-01 | Agency Ind Science Techn | Method of manufacturing integrated circuits |
US3775581A (en) * | 1971-06-23 | 1973-11-27 | Welding Research Inc | Seam tracking method |
CA946480A (en) * | 1971-07-26 | 1974-04-30 | Sciaky Intertechnique S.A. | Hole center locator |
US3873802A (en) * | 1971-07-26 | 1975-03-25 | Welding Research Inc | Elector beam welding apparatus chicorporating a hole center locating means |
US3849659A (en) * | 1973-09-10 | 1974-11-19 | Westinghouse Electric Corp | Alignment of a patterned electron beam with a member by electron backscatter |
US4158122A (en) * | 1973-12-21 | 1979-06-12 | Obolonsky Alexei P | Method of measuring and stabilizing the diameter of heating point on workpiece in electron beam welding machine and on automatic device for realization thereof |
JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
DE2719801C3 (en) * | 1977-04-28 | 1981-11-19 | Siemens AG, 1000 Berlin und 8000 München | Corpuscular beam optical device for irradiating a specimen with a device for adjusting the same |
US4179316A (en) * | 1977-10-17 | 1979-12-18 | Sciaky Bros., Inc. | Method and apparatus for heat treating |
JPS5731134A (en) * | 1980-08-01 | 1982-02-19 | Hitachi Ltd | Drawing device by electron beam |
JPS57183034A (en) * | 1981-05-07 | 1982-11-11 | Toshiba Corp | Electron bean transfer device |
JPS5946026A (en) * | 1982-09-09 | 1984-03-15 | Toshiba Corp | Measuring method for position of sample |
DE3243033A1 (en) * | 1982-11-22 | 1984-05-24 | Institut für Kerntechnik und Energiewandlung e.V., 7000 Stuttgart | METHOD AND ARRANGEMENT FOR MACHINING A WORKPIECE BY MEANS OF A FOCUSED ELECTRON BEAM |
DE3810391A1 (en) * | 1988-03-26 | 1989-10-05 | Leybold Ag | DEVICE AND METHOD FOR CONTROLLING AND MONITORING A DEFLECTABLE ELECTRON BEAM FOR METAL WORKING |
DE4024084A1 (en) * | 1989-11-29 | 1991-06-06 | Daimler Benz Ag | METHOD FOR PRODUCING HOLLOW GAS EXCHANGE VALVES FOR LIFTING PISTON MACHINES |
US5483036A (en) * | 1993-10-28 | 1996-01-09 | Sandia Corporation | Method of automatic measurement and focus of an electron beam and apparatus therefor |
EP2575159B1 (en) * | 2011-09-30 | 2016-04-20 | Carl Zeiss Microscopy GmbH | Particle beam system and method for operating the same |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3284618A (en) * | 1962-03-16 | 1966-11-08 | Licentia Gmbh | Nominal value position control system |
GB1065060A (en) * | 1963-04-19 | 1967-04-12 | United Aircraft Corp | Improvements in and relating to apparatus for working articles with energised beams |
US3326176A (en) * | 1964-10-27 | 1967-06-20 | Nat Res Corp | Work-registration device including ionic beam probe |
-
1967
- 1967-08-07 FR FR117128A patent/FR1533755A/en not_active Expired
- 1967-08-14 US US660432A patent/US3513285A/en not_active Expired - Lifetime
- 1967-08-15 GB GB37558/67A patent/GB1201383A/en not_active Expired
- 1967-08-16 DE DE1690626A patent/DE1690626C3/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2016815A1 (en) * | 1968-07-23 | 1970-05-15 | Ibm | |
DE2056620A1 (en) * | 1969-12-15 | 1971-06-16 | Ibm | Device for exposure of semiconductor elements |
EP0003038A2 (en) * | 1978-01-16 | 1979-07-25 | International Business Machines Corporation | Method for overlay measurement using an electronic beam system as a measuring tool |
EP0003038A3 (en) * | 1978-01-16 | 1979-08-08 | International Business Machines Corporation | Method for overlay measurement using an electronic beam system as a measuring tool |
Also Published As
Publication number | Publication date |
---|---|
DE1690626A1 (en) | 1971-04-08 |
GB1201383A (en) | 1970-08-05 |
DE1690626C3 (en) | 1979-02-08 |
DE1690626B2 (en) | 1973-09-13 |
US3513285A (en) | 1970-05-19 |
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