JPS6258140B2 - - Google Patents
Info
- Publication number
- JPS6258140B2 JPS6258140B2 JP15891378A JP15891378A JPS6258140B2 JP S6258140 B2 JPS6258140 B2 JP S6258140B2 JP 15891378 A JP15891378 A JP 15891378A JP 15891378 A JP15891378 A JP 15891378A JP S6258140 B2 JPS6258140 B2 JP S6258140B2
- Authority
- JP
- Japan
- Prior art keywords
- scanning
- mark
- electron beam
- size
- mark detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 26
- 238000010894 electron beam technology Methods 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15891378A JPS5583233A (en) | 1978-12-20 | 1978-12-20 | Electron beam scanning method for mark detection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15891378A JPS5583233A (en) | 1978-12-20 | 1978-12-20 | Electron beam scanning method for mark detection |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5583233A JPS5583233A (en) | 1980-06-23 |
| JPS6258140B2 true JPS6258140B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-12-04 |
Family
ID=15682076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15891378A Granted JPS5583233A (en) | 1978-12-20 | 1978-12-20 | Electron beam scanning method for mark detection |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5583233A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5870554U (ja) * | 1981-11-09 | 1983-05-13 | トヨタ自動車株式会社 | ダンパプ−リ |
| JPS58102524A (ja) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | 電子ビ−ム露光装置の位置合せ方法 |
| JPS58151041A (ja) * | 1982-03-03 | 1983-09-08 | Toshiba Corp | リダンダンシ−装置 |
| JPH079874B2 (ja) * | 1985-03-15 | 1995-02-01 | 株式会社東芝 | 電子ビ−ム描画方法 |
-
1978
- 1978-12-20 JP JP15891378A patent/JPS5583233A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5583233A (en) | 1980-06-23 |