Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAIfiledCriticalCHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP16245178ApriorityCriticalpatent/JPS5588328A/ja
Publication of JPS5588328ApublicationCriticalpatent/JPS5588328A/ja
Publication of JPS6244406B2publicationCriticalpatent/JPS6244406B2/ja
H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
Chemical & Material Sciences
(AREA)
Analytical Chemistry
(AREA)
Electron Beam Exposure
(AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
JP16245178A1978-12-271978-12-27Exposing method to electron beam
GrantedJPS5588328A
(en)