GB1283898A - Etching process - Google Patents
Etching processInfo
- Publication number
- GB1283898A GB1283898A GB29168/71A GB2916871A GB1283898A GB 1283898 A GB1283898 A GB 1283898A GB 29168/71 A GB29168/71 A GB 29168/71A GB 2916871 A GB2916871 A GB 2916871A GB 1283898 A GB1283898 A GB 1283898A
- Authority
- GB
- United Kingdom
- Prior art keywords
- areas
- exposed
- etching
- area
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 abstract 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 229920002120 photoresistant polymer Polymers 0.000 abstract 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 abstract 2
- 238000007654 immersion Methods 0.000 abstract 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 abstract 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 abstract 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract 1
- 229910001315 Tool steel Inorganic materials 0.000 abstract 1
- 239000003929 acidic solution Substances 0.000 abstract 1
- UFULAYFCSOUIOV-UHFFFAOYSA-N cysteamine Chemical compound NCCS UFULAYFCSOUIOV-UHFFFAOYSA-N 0.000 abstract 1
- 229960002089 ferrous chloride Drugs 0.000 abstract 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 235000011121 sodium hydroxide Nutrition 0.000 abstract 1
- 239000008096 xylene Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5315170A | 1970-07-08 | 1970-07-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1283898A true GB1283898A (en) | 1972-08-02 |
Family
ID=21982268
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB29168/71A Expired GB1283898A (en) | 1970-07-08 | 1971-06-22 | Etching process |
Country Status (8)
| Country | Link |
|---|---|
| BE (1) | BE769537A (enExample) |
| CA (1) | CA947562A (enExample) |
| CH (1) | CH550672A (enExample) |
| DE (1) | DE2133230A1 (enExample) |
| FR (1) | FR2100332A5 (enExample) |
| GB (1) | GB1283898A (enExample) |
| IT (1) | IT943517B (enExample) |
| ZA (1) | ZA714171B (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2192254A (en) * | 1986-07-02 | 1988-01-06 | Nippon Tenshashi Kk | Metal roller |
| CN112430814A (zh) * | 2020-12-14 | 2021-03-02 | 浙江一益医疗器械有限公司 | 一种针管蚀刻方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4123272A (en) * | 1977-05-17 | 1978-10-31 | E. I. Du Pont De Nemours And Company | Double-negative positive-working photohardenable elements |
| ES2666820T3 (es) | 2013-11-25 | 2018-05-08 | Akk Gmbh | Plantilla para estructuraciones de superficies mediante grabado al ácido |
-
1971
- 1971-03-30 CA CA109,145A patent/CA947562A/en not_active Expired
- 1971-06-22 GB GB29168/71A patent/GB1283898A/en not_active Expired
- 1971-06-25 ZA ZA714171A patent/ZA714171B/xx unknown
- 1971-07-03 DE DE19712133230 patent/DE2133230A1/de active Pending
- 1971-07-05 BE BE769537A patent/BE769537A/xx unknown
- 1971-07-06 IT IT7277/71A patent/IT943517B/it active
- 1971-07-07 FR FR7124769A patent/FR2100332A5/fr not_active Expired
- 1971-07-08 CH CH1007471A patent/CH550672A/xx not_active IP Right Cessation
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2192254A (en) * | 1986-07-02 | 1988-01-06 | Nippon Tenshashi Kk | Metal roller |
| GB2192254B (en) * | 1986-07-02 | 1990-03-21 | Nippon Tenshashi Kk | Metal roller |
| CN112430814A (zh) * | 2020-12-14 | 2021-03-02 | 浙江一益医疗器械有限公司 | 一种针管蚀刻方法 |
| CN112430814B (zh) * | 2020-12-14 | 2023-02-17 | 浙江一益医疗器械有限公司 | 一种针管蚀刻方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CA947562A (en) | 1974-05-21 |
| BE769537A (fr) | 1971-11-16 |
| IT943517B (it) | 1973-04-10 |
| ZA714171B (en) | 1972-03-29 |
| DE2133230A1 (de) | 1972-01-13 |
| CH550672A (de) | 1974-06-28 |
| FR2100332A5 (enExample) | 1972-03-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1522580A (en) | Metallizing a substrate | |
| JPS542720A (en) | Forming method of photopolymerized image | |
| SE7507761L (sv) | Sett att behandla tryckplatar. | |
| GB1010203A (en) | Presensitized positive acting lithographic plates | |
| ATE46582T1 (de) | Positiv arbeitendes verfahren zur herstellung von relief- und druckformen. | |
| GB1283898A (en) | Etching process | |
| GB1501194A (en) | Photoresist process | |
| JPS5339075A (en) | Step and repeat exposure method of masks | |
| ATE178997T1 (de) | Behandlung eines photoresists zwecks verbesserter auflösung | |
| JPS5321576A (en) | Mask for x-ray exposure | |
| JPS57183030A (en) | Manufacture of semiconductor device | |
| GB1282126A (en) | Method of forming a pattern on a metal roll surface | |
| JPS54141573A (en) | Mask for exposure | |
| JPS56137632A (en) | Pattern forming | |
| JPS5272175A (en) | Mask patterning of resist meterial | |
| JPS5758317A (en) | Method for forming pattern | |
| JPS5396678A (en) | Method and apparatus for mask pattern exposure | |
| JPS5421271A (en) | Pattern forming method | |
| JPS55135837A (en) | Manufacture of photomask | |
| JPS5217530A (en) | Method for masking an inorganic coating | |
| JPS53135578A (en) | Mark protection method | |
| JPS5618429A (en) | Minute electrode formation | |
| JPS5496369A (en) | Mask forming method | |
| JPS5255866A (en) | Etching method | |
| GB1397481A (en) | Exposure masks |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |