CA947562A - Manufacture of printing elements by a photoresist chemical etching system - Google Patents

Manufacture of printing elements by a photoresist chemical etching system

Info

Publication number
CA947562A
CA947562A CA109,145A CA109145A CA947562A CA 947562 A CA947562 A CA 947562A CA 109145 A CA109145 A CA 109145A CA 947562 A CA947562 A CA 947562A
Authority
CA
Canada
Prior art keywords
manufacture
chemical etching
printing elements
etching system
photoresist chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA109,145A
Other languages
English (en)
Other versions
CA109145S (en
Inventor
Donald H. Knapke
Robert L. Ruleff
Jay W. Childress
William P. Lee (Ii)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Cash Register Co
Original Assignee
National Cash Register Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Cash Register Co filed Critical National Cash Register Co
Application granted granted Critical
Publication of CA947562A publication Critical patent/CA947562A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
CA109,145A 1970-07-08 1971-03-30 Manufacture of printing elements by a photoresist chemical etching system Expired CA947562A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5315170A 1970-07-08 1970-07-08

Publications (1)

Publication Number Publication Date
CA947562A true CA947562A (en) 1974-05-21

Family

ID=21982268

Family Applications (1)

Application Number Title Priority Date Filing Date
CA109,145A Expired CA947562A (en) 1970-07-08 1971-03-30 Manufacture of printing elements by a photoresist chemical etching system

Country Status (8)

Country Link
BE (1) BE769537A (enExample)
CA (1) CA947562A (enExample)
CH (1) CH550672A (enExample)
DE (1) DE2133230A1 (enExample)
FR (1) FR2100332A5 (enExample)
GB (1) GB1283898A (enExample)
IT (1) IT943517B (enExample)
ZA (1) ZA714171B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
GB2192254B (en) * 1986-07-02 1990-03-21 Nippon Tenshashi Kk Metal roller
EP2875872B1 (de) 2013-11-25 2018-03-28 AKK GmbH Schablone für ätztechnische Oberflächenstrukturierungen
CN112430814B (zh) * 2020-12-14 2023-02-17 浙江一益医疗器械有限公司 一种针管蚀刻方法

Also Published As

Publication number Publication date
BE769537A (fr) 1971-11-16
CH550672A (de) 1974-06-28
FR2100332A5 (enExample) 1972-03-17
ZA714171B (en) 1972-03-29
GB1283898A (en) 1972-08-02
DE2133230A1 (de) 1972-01-13
IT943517B (it) 1973-04-10

Similar Documents

Publication Publication Date Title
CA926523A (en) Ion etching through a pattern mask
CA957260A (en) Microporous film reinforced by a macroporous substrate
CA991200A (en) Photopolymerizable compounds
AU466665B2 (en) Photoresist film
GB1417726A (en) Producing a resist image on a substrate
CA945419A (en) Photographic printing system
CA947562A (en) Manufacture of printing elements by a photoresist chemical etching system
CA988628A (en) Method of etching a semiconductor element
CA979265A (en) Manufacture of printing elements by a photoresist chemical etching system
AU3414971A (en) Process for the manufacture of highly-purified 2-hydroxydiphenyl using a new catalyst
CA964514A (en) Lithographic printing system
CA918486A (en) Method of preparing photographic lithographic printing plate
CA927686A (en) Method for the production of a photographic element
CA982381A (en) Print stripping mechanism
CA843903A (en) Etching
CA843905A (en) Etching
CA880856A (en) Steady state etching system
AU413005B2 (en) Light-sensitive material for the photomechanical production of printing plates
AU5085064A (en) Light-sensitive material for the photomechanical production of printing plates
CA668626A (en) Light-sensitive element for preparing etching resist for gravure purposes
CA836470A (en) Photosensitive printing
CA829238A (en) Photolithographic etching of extremely detailed patterns
CA840939A (en) Light sensitive element for preparing etching resist for gravure purposes
CA902473A (en) Etching system
CA897040A (en) Zirconium mask for semiconductor fabricated using alkaline etchants