CA979265A - Manufacture of printing elements by a photoresist chemical etching system - Google Patents

Manufacture of printing elements by a photoresist chemical etching system

Info

Publication number
CA979265A
CA979265A CA139,233A CA139233A CA979265A CA 979265 A CA979265 A CA 979265A CA 139233 A CA139233 A CA 139233A CA 979265 A CA979265 A CA 979265A
Authority
CA
Canada
Prior art keywords
manufacture
chemical etching
printing elements
etching system
photoresist chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA139,233A
Other versions
CA139233S (en
Inventor
Robert L. Ruleff
William P. Lee (Ii)
Jay W. Childress
Donald H. Knapke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NCR Voyix Corp
Original Assignee
NCR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NCR Corp filed Critical NCR Corp
Application granted granted Critical
Publication of CA979265A publication Critical patent/CA979265A/en
Expired legal-status Critical Current

Links

CA139,233A 1971-05-03 1972-04-07 Manufacture of printing elements by a photoresist chemical etching system Expired CA979265A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13996271A 1971-05-03 1971-05-03

Publications (1)

Publication Number Publication Date
CA979265A true CA979265A (en) 1975-12-09

Family

ID=22489106

Family Applications (1)

Application Number Title Priority Date Filing Date
CA139,233A Expired CA979265A (en) 1971-05-03 1972-04-07 Manufacture of printing elements by a photoresist chemical etching system

Country Status (1)

Country Link
CA (1) CA979265A (en)

Similar Documents

Publication Publication Date Title
CA926523A (en) Ion etching through a pattern mask
CA1035624A (en) High sensitivity positive resist layers and mask formation process
CA979664A (en) Procede chimique de fabrication de metaux et alliages metalliques
CA956039A (en) Semiconductor device fabrication using nickel to mask cathodic etching
GB1417726A (en) Producing a resist image on a substrate
AU476473B2 (en) Method of projection printing photoresist masking layers, including elimination of spurious diffraction-associated patterns from the print
CA988628A (en) Method of etching a semiconductor element
CA947562A (en) Manufacture of printing elements by a photoresist chemical etching system
CA979265A (en) Manufacture of printing elements by a photoresist chemical etching system
CA961526A (en) Tracheotomy mask
CA967360A (en) Manufacture of printing paper
AU465832B2 (en) Light-sensitive compounds
CA982381A (en) Print stripping mechanism
CA971022A (en) Print stripping mechanism
CA920923A (en) Process of etching a shadow mask
GB1413936A (en) Production by etching of silicon bodies having patterned silicon dioxide layers thereon
CA829238A (en) Photolithographic etching of extremely detailed patterns
CA882846A (en) Fabrication of a printer drum
AU466536B2 (en) A process for the preparation of alpha-substituted epoxide compounds
CA889272A (en) System suitable for controlling etching without the aid of an etchant resist
CA879058A (en) Etching
CA1031209A (en) Air etching of polymeric printing plates
CA868833A (en) Lithographic printing process
CA870146A (en) Photosensitive varnish masks
AU413005B2 (en) Light-sensitive material for the photomechanical production of printing plates