GB1208574A - Methods of manufacturing semiconductor devices - Google Patents

Methods of manufacturing semiconductor devices

Info

Publication number
GB1208574A
GB1208574A GB44763/67A GB4476367A GB1208574A GB 1208574 A GB1208574 A GB 1208574A GB 44763/67 A GB44763/67 A GB 44763/67A GB 4476367 A GB4476367 A GB 4476367A GB 1208574 A GB1208574 A GB 1208574A
Authority
GB
United Kingdom
Prior art keywords
silicon
layer
oxide
silicon oxide
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB44763/67A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Priority to GB27516/70A priority Critical patent/GB1208577A/en
Priority to GB27239/70A priority patent/GB1208576A/en
Priority to GB27517/70A priority patent/GB1208578A/en
Priority to GB27238/70A priority patent/GB1208575A/en
Publication of GB1208574A publication Critical patent/GB1208574A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/012—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401—Combinations of FETs or IGBTs with BJTs
    • H10D84/403—Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/61—Formation of materials, e.g. in the shape of layers or pillars of insulating materials using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/012—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS]
    • H10W10/0121—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS] in regions recessed from the surface, e.g. in trenches or grooves
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/012—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS]
    • H10W10/0125—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS] comprising introducing electrical impurities in local oxidation regions, e.g. to alter LOCOS oxide growth characteristics
    • H10W10/0126—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS] comprising introducing electrical impurities in local oxidation regions, e.g. to alter LOCOS oxide growth characteristics introducing electrical active impurities in local oxidation regions to create channel stoppers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10—Isolation regions comprising dielectric materials
    • H10W10/13—Isolation regions comprising dielectric materials formed using local oxidation of silicon [LOCOS], e.g. sealed interface localised oxidation [SILO] or side-wall mask isolation [SWAMI]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/531—Shapes of wire connectors
    • H10W72/5363—Shapes of wire connectors the connected ends being wedge-shaped

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Element Separation (AREA)
  • Bipolar Transistors (AREA)
  • Formation Of Insulating Films (AREA)
  • Weting (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Level Indicators Using A Float (AREA)
GB44763/67A 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices Expired GB1208574A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GB27516/70A GB1208577A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices
GB27239/70A GB1208576A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices
GB27517/70A GB1208578A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices
GB27238/70A GB1208575A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL666614016A NL153374B (nl) 1966-10-05 1966-10-05 Werkwijze ter vervaardiging van een halfgeleiderinrichting voorzien van een oxydelaag en halfgeleiderinrichting vervaardigd volgens de werkwijze.

Publications (1)

Publication Number Publication Date
GB1208574A true GB1208574A (en) 1970-10-14

Family

ID=19797850

Family Applications (1)

Application Number Title Priority Date Filing Date
GB44763/67A Expired GB1208574A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices

Country Status (13)

Country Link
US (1) US3970486A (enExample)
JP (8) JPS5631893B1 (enExample)
AT (1) AT280349B (enExample)
BE (1) BE704674A (enExample)
CH (1) CH469358A (enExample)
DE (1) DE1614283C3 (enExample)
DK (1) DK121913B (enExample)
ES (1) ES345702A1 (enExample)
FR (1) FR1549386A (enExample)
GB (1) GB1208574A (enExample)
NL (1) NL153374B (enExample)
NO (1) NO125653B (enExample)
SE (1) SE335177B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3958040A (en) 1973-09-07 1976-05-18 U.S. Philips Corporation Semiconductor device manufacture
US4646115A (en) * 1983-12-20 1987-02-24 U.S. Philips Corporation Semiconductor devices having field-relief regions

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6849918B1 (en) * 1965-09-28 2005-02-01 Chou H. Li Miniaturized dielectrically isolated solid state device
US5696402A (en) * 1965-09-28 1997-12-09 Li; Chou H. Integrated circuit device
US7038290B1 (en) 1965-09-28 2006-05-02 Li Chou H Integrated circuit device
US6979877B1 (en) 1965-09-28 2005-12-27 Li Chou H Solid-state device
NL159817B (nl) * 1966-10-05 1979-03-15 Philips Nv Werkwijze ter vervaardiging van een halfgeleiderinrichting.
NL7010208A (enExample) * 1966-10-05 1972-01-12 Philips Nv
USRE31580E (en) * 1967-06-08 1984-05-01 U.S. Philips Corporation Insulated gate field-effect transistor comprising a mesa channel and a thicker surrounding oxide
USRE28653E (en) * 1968-04-23 1975-12-16 Method of fabricating semiconductor devices
BE753245A (fr) * 1969-08-04 1970-12-16 Rca Corp Procede pour la fabrication de dispositifs semiconducteurs
FR2058385A1 (en) * 1969-08-20 1971-05-28 Ibm Diode with schottky barrier
DE1952636C3 (de) * 1969-10-18 1981-04-30 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Herstellen einer Halbleiteranordnung mit einem Schottky-Kontakt
GB1332931A (en) * 1970-01-15 1973-10-10 Mullard Ltd Methods of manufacturing a semiconductor device
US3698966A (en) * 1970-02-26 1972-10-17 North American Rockwell Processes using a masking layer for producing field effect devices having oxide isolation
GB1360996A (en) * 1970-06-15 1974-07-24 Hitachi Ltd Semiconductor device and method for manufacture
NL170902C (nl) * 1970-07-10 1983-01-03 Philips Nv Halfgeleiderinrichting, in het bijzonder monolithische geintegreerde halfgeleiderschakeling.
FR2098325B1 (enExample) * 1970-07-10 1977-04-22 Philips Nv
JPS514756B1 (enExample) * 1970-10-05 1976-02-14
US3648125A (en) * 1971-02-02 1972-03-07 Fairchild Camera Instr Co Method of fabricating integrated circuits with oxidized isolation and the resulting structure
JPS498183A (enExample) * 1972-05-10 1974-01-24
FR2188304B1 (enExample) * 1972-06-15 1977-07-22 Commissariat Energie Atomique
DE2318912A1 (de) * 1972-06-30 1974-01-17 Ibm Integrierte halbleiteranordnung
JPS4960684A (enExample) * 1972-10-12 1974-06-12
JPS5617734B2 (enExample) * 1973-07-19 1981-04-24
JPS5159853U (enExample) * 1974-11-06 1976-05-11
JPS5938741B2 (ja) * 1976-07-31 1984-09-19 ティーディーケイ株式会社 半導体装置およびその作製方法
EP0002107A3 (en) * 1977-11-17 1979-09-05 Rca Corporation Method of making a planar semiconductor device
GB2042801B (en) * 1979-02-13 1983-12-14 Standard Telephones Cables Ltd Contacting semicnductor devices
US4441941A (en) * 1980-03-06 1984-04-10 Tokyo Shibaura Denki Kabushiki Kaisha Method for manufacturing a semiconductor device employing element isolation using insulating materials
US4274909A (en) * 1980-03-17 1981-06-23 International Business Machines Corporation Method for forming ultra fine deep dielectric isolation
US4317690A (en) * 1980-06-18 1982-03-02 Signetics Corporation Self-aligned double polysilicon MOS fabrication
US4506435A (en) * 1981-07-27 1985-03-26 International Business Machines Corporation Method for forming recessed isolated regions
US4454646A (en) * 1981-08-27 1984-06-19 International Business Machines Corporation Isolation for high density integrated circuits
US4454647A (en) * 1981-08-27 1984-06-19 International Business Machines Corporation Isolation for high density integrated circuits
JPS5873163A (ja) * 1981-10-27 1983-05-02 Toshiba Corp Ｍｏｓ型半導体装置
US4508757A (en) * 1982-12-20 1985-04-02 International Business Machines Corporation Method of manufacturing a minimum bird's beak recessed oxide isolation structure
JPS60115416U (ja) * 1984-01-12 1985-08-05 三菱電機株式会社 フラツトキ−型操作ボ−ド
JPS6133323U (ja) * 1984-07-31 1986-02-28 武夫 大坪 キ−ボ−ド表示板
JPS61126696U (enExample) * 1985-01-28 1986-08-08
US4630356A (en) * 1985-09-19 1986-12-23 International Business Machines Corporation Method of forming recessed oxide isolation with reduced steepness of the birds' neck
US5019526A (en) * 1988-09-26 1991-05-28 Nippondenso Co., Ltd. Method of manufacturing a semiconductor device having a plurality of elements
US5077235A (en) * 1989-01-24 1991-12-31 Ricoh Comany, Ltd. Method of manufacturing a semiconductor integrated circuit device having SOI structure
US4968641A (en) * 1989-06-22 1990-11-06 Alexander Kalnitsky Method for formation of an isolating oxide layer
US4987099A (en) * 1989-12-29 1991-01-22 North American Philips Corp. Method for selectively filling contacts or vias or various depths with CVD tungsten
JP3111500B2 (ja) * 1991-05-09 2000-11-20 富士電機株式会社 誘電体分離ウエハの製造方法
JPH05283710A (ja) * 1991-12-06 1993-10-29 Intel Corp 高電圧ｍｏｓトランジスタ及びその製造方法
US5418176A (en) * 1994-02-17 1995-05-23 United Microelectronics Corporation Process for producing memory devices having narrow buried N+ lines
US5661053A (en) * 1994-05-25 1997-08-26 Sandisk Corporation Method of making dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with the use of spacers
US5756385A (en) * 1994-03-30 1998-05-26 Sandisk Corporation Dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with the use of spacers
US5814875A (en) * 1995-01-31 1998-09-29 Nippon Steel Corporation Semiconductor device and method of manufacturing the same apparatus and method for providing semiconductor devices having a field shield element between devices
US20040144999A1 (en) * 1995-06-07 2004-07-29 Li Chou H. Integrated circuit device
US5747357A (en) 1995-09-27 1998-05-05 Mosel Vitelic, Inc. Modified poly-buffered isolation
US5883566A (en) * 1997-02-24 1999-03-16 International Business Machines Corporation Noise-isolated buried resistor

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2981877A (en) * 1959-07-30 1961-04-25 Fairchild Semiconductor Semiconductor device-and-lead structure
US3212162A (en) * 1962-01-05 1965-10-19 Fairchild Camera Instr Co Fabricating semiconductor devices
US3165430A (en) * 1963-01-21 1965-01-12 Siliconix Inc Method of ultra-fine semiconductor manufacture
US3279963A (en) * 1963-07-23 1966-10-18 Ibm Fabrication of semiconductor devices
DE1439737B2 (de) * 1964-10-31 1970-05-06 Telefunken Patentverwertungsgesellschaft Mbh, 7900 Ulm Verfahren zum Herstellen einer Halblei teranordnung
US3484313A (en) * 1965-03-25 1969-12-16 Hitachi Ltd Method of manufacturing semiconductor devices
US3442011A (en) * 1965-06-30 1969-05-06 Texas Instruments Inc Method for isolating individual devices in an integrated circuit monolithic bar
US3479237A (en) * 1966-04-08 1969-11-18 Bell Telephone Labor Inc Etch masks on semiconductor surfaces
US3649386A (en) * 1968-04-23 1972-03-14 Bell Telephone Labor Inc Method of fabricating semiconductor devices
US3550292A (en) * 1968-08-23 1970-12-29 Nippon Electric Co Semiconductor device and method of manufacturing the same
JPS4917069A (enExample) * 1972-06-10 1974-02-15
JPS5232803B2 (enExample) * 1972-08-15 1977-08-24

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3958040A (en) 1973-09-07 1976-05-18 U.S. Philips Corporation Semiconductor device manufacture
US4646115A (en) * 1983-12-20 1987-02-24 U.S. Philips Corporation Semiconductor devices having field-relief regions

Also Published As

Publication number Publication date
JPS4939308B1 (enExample) 1974-10-24
ES345702A1 (es) 1969-02-01
DE1614283A1 (de) 1970-05-27
JPS4939309B1 (enExample) 1974-10-24
CH469358A (de) 1969-02-28
AT280349B (de) 1970-04-10
NL153374B (nl) 1977-05-16
JPS5631893B1 (enExample) 1981-07-24
JPS4923071B1 (enExample) 1974-06-13
JPS5434596B1 (enExample) 1979-10-27
NL6614016A (enExample) 1968-04-08
JPS5435071B1 (enExample) 1979-10-31
BE704674A (enExample) 1968-04-04
FR1549386A (enExample) 1968-12-13
DE1614283B2 (de) 1975-06-05
NO125653B (enExample) 1972-10-09
JPS5134274B1 (enExample) 1976-09-25
DK121913B (da) 1971-12-20
DE1614283C3 (de) 1983-03-10
US3970486A (en) 1976-07-20
SE335177B (enExample) 1971-05-17
JPS5838937B1 (enExample) 1983-08-26

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years