FR2705104B1 - Procédé pour augmenter la vitesse de revêtement, procédé pour réduire la densité de poussière dans un espace de décharge de plasma, et chambre à plasma. - Google Patents

Procédé pour augmenter la vitesse de revêtement, procédé pour réduire la densité de poussière dans un espace de décharge de plasma, et chambre à plasma.

Info

Publication number
FR2705104B1
FR2705104B1 FR9405316A FR9405316A FR2705104B1 FR 2705104 B1 FR2705104 B1 FR 2705104B1 FR 9405316 A FR9405316 A FR 9405316A FR 9405316 A FR9405316 A FR 9405316A FR 2705104 B1 FR2705104 B1 FR 2705104B1
Authority
FR
France
Prior art keywords
dust
density
increasing
reducing
discharge space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR9405316A
Other languages
English (en)
Other versions
FR2705104A1 (fr
Inventor
Jacques Schmitt
Paul-Rene Muralt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of FR2705104A1 publication Critical patent/FR2705104A1/fr
Application granted granted Critical
Publication of FR2705104B1 publication Critical patent/FR2705104B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
FR9405316A 1993-05-03 1994-05-02 Procédé pour augmenter la vitesse de revêtement, procédé pour réduire la densité de poussière dans un espace de décharge de plasma, et chambre à plasma. Expired - Lifetime FR2705104B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH01344/93A CH687987A5 (de) 1993-05-03 1993-05-03 Verfahren zur Erhoehung der Beschichtungsrate in einem Plasmaentladungsraum und Plasmakammer.

Publications (2)

Publication Number Publication Date
FR2705104A1 FR2705104A1 (fr) 1994-11-18
FR2705104B1 true FR2705104B1 (fr) 1997-08-08

Family

ID=4208289

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9405316A Expired - Lifetime FR2705104B1 (fr) 1993-05-03 1994-05-02 Procédé pour augmenter la vitesse de revêtement, procédé pour réduire la densité de poussière dans un espace de décharge de plasma, et chambre à plasma.

Country Status (5)

Country Link
US (2) US5693238A (fr)
JP (2) JP3683599B2 (fr)
CH (1) CH687987A5 (fr)
DE (2) DE4447977B4 (fr)
FR (1) FR2705104B1 (fr)

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Also Published As

Publication number Publication date
CH687987A5 (de) 1997-04-15
US20010003272A1 (en) 2001-06-14
JP3683599B2 (ja) 2005-08-17
DE4412902B4 (de) 2007-02-08
FR2705104A1 (fr) 1994-11-18
JPH06346245A (ja) 1994-12-20
US5693238A (en) 1997-12-02
DE4412902A1 (de) 1994-11-10
US6533534B2 (en) 2003-03-18
DE4447977B4 (de) 2009-09-10
JP2004282086A (ja) 2004-10-07

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