FR2630555A1 - Procede et dispositif pour la creation d'une image latente sur un revetement sensible a la lumiere d'une plaque d'impression offset - Google Patents
Procede et dispositif pour la creation d'une image latente sur un revetement sensible a la lumiere d'une plaque d'impression offset Download PDFInfo
- Publication number
- FR2630555A1 FR2630555A1 FR8905258A FR8905258A FR2630555A1 FR 2630555 A1 FR2630555 A1 FR 2630555A1 FR 8905258 A FR8905258 A FR 8905258A FR 8905258 A FR8905258 A FR 8905258A FR 2630555 A1 FR2630555 A1 FR 2630555A1
- Authority
- FR
- France
- Prior art keywords
- printing plate
- liquid crystal
- offset printing
- image
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3813398A DE3813398A1 (de) | 1988-04-21 | 1988-04-21 | Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2630555A1 true FR2630555A1 (fr) | 1989-10-27 |
Family
ID=6352543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8905258A Withdrawn FR2630555A1 (fr) | 1988-04-21 | 1989-04-20 | Procede et dispositif pour la creation d'une image latente sur un revetement sensible a la lumiere d'une plaque d'impression offset |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPH0212253A (zh) |
DE (1) | DE3813398A1 (zh) |
FR (1) | FR2630555A1 (zh) |
GB (1) | GB2217862B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9401566D0 (en) * | 1994-01-27 | 1994-03-23 | Univ Dundee | Method |
DE59509689D1 (de) * | 1994-02-21 | 2001-11-15 | Friedrich Luellau | Verfahren und vorrichtung zur photomechanischen herstellung strukturierter oberflächen, insbesondere zum belichten von offsetdruckplatten |
DE19602307A1 (de) * | 1996-01-23 | 1997-07-24 | Roland Man Druckmasch | Druckmaschine |
DE19602289A1 (de) * | 1996-01-23 | 1997-07-24 | Roland Man Druckmasch | Druckvorrichtung |
JP2001188354A (ja) * | 1999-12-28 | 2001-07-10 | Asahi Kasei Corp | 感光性樹脂凸版の製造方法、及びその製造装置 |
DE10012017A1 (de) | 2000-03-11 | 2001-09-13 | Basysprint Gmbh Sys Druckind | Belichtungsvorrichtung und Verfahren zur Kompensation von optischen Fehlern |
US20020115021A1 (en) * | 2001-02-01 | 2002-08-22 | Advanced Micro Devices, Inc. | Configurable patterning device and a method of making integrated circuits using such a device |
US6855482B2 (en) * | 2002-04-09 | 2005-02-15 | Day International, Inc. | Liquid transfer articles and method for producing the same using digital imaging photopolymerization |
EP3182206B1 (en) * | 2015-12-15 | 2019-12-04 | Agfa Nv | A method of exposing a print master precursor |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4013466A (en) * | 1975-06-26 | 1977-03-22 | Western Electric Company, Inc. | Method of preparing a circuit utilizing a liquid crystal artwork master |
GB2131964A (en) * | 1982-12-10 | 1984-06-27 | Letraset International Ltd | Exposing through an LCD |
JPS6083019A (ja) * | 1983-10-12 | 1985-05-11 | Fujitsu Ltd | パタ−ン反射型投影露光方法 |
US4675702A (en) * | 1986-03-14 | 1987-06-23 | Gerber Scientific Inc. | Photoplotter using a light valve device and process for exposing graphics |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3761171A (en) * | 1972-02-17 | 1973-09-25 | Eastman Kodak Co | Negative-positive, positive-positive exposure station |
US4054094A (en) * | 1972-08-25 | 1977-10-18 | E. I. Du Pont De Nemours And Company | Laser production of lithographic printing plates |
GB1500952A (en) * | 1974-03-26 | 1978-02-15 | Berkel Patent Nv | Optical recording device particularly for use with weighing equipment |
DE3321346A1 (de) * | 1983-06-13 | 1984-12-13 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Optischer druckkopf sowie drucker mit einem derartigen druckkopf |
JPS60107034A (ja) * | 1983-11-14 | 1985-06-12 | Mitsubishi Electric Corp | 投影露光装置 |
DE3514807C2 (de) * | 1984-04-25 | 1994-12-22 | Canon Kk | Vorrichtung mit einer Flüssigkristallzelle, zum Ansteuern einer Transistoranordnung |
JPS6159430A (ja) * | 1984-08-31 | 1986-03-26 | Casio Comput Co Ltd | 記録装置の駆動法 |
JPS61111061A (ja) * | 1984-11-05 | 1986-05-29 | Casio Comput Co Ltd | 記録装置 |
US4672014A (en) * | 1985-10-08 | 1987-06-09 | The Mead Corporation | Exposure of imaging sheets utilizing a light valve as a wavelength transformer |
-
1988
- 1988-04-21 DE DE3813398A patent/DE3813398A1/de active Granted
-
1989
- 1989-04-19 GB GB8908837A patent/GB2217862B/en not_active Expired - Lifetime
- 1989-04-20 FR FR8905258A patent/FR2630555A1/fr not_active Withdrawn
- 1989-04-21 JP JP1100348A patent/JPH0212253A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4013466A (en) * | 1975-06-26 | 1977-03-22 | Western Electric Company, Inc. | Method of preparing a circuit utilizing a liquid crystal artwork master |
GB2131964A (en) * | 1982-12-10 | 1984-06-27 | Letraset International Ltd | Exposing through an LCD |
JPS6083019A (ja) * | 1983-10-12 | 1985-05-11 | Fujitsu Ltd | パタ−ン反射型投影露光方法 |
US4675702A (en) * | 1986-03-14 | 1987-06-23 | Gerber Scientific Inc. | Photoplotter using a light valve device and process for exposing graphics |
Non-Patent Citations (2)
Title |
---|
JOURNAL OF APPLIED PHYSICS, vol. 57, no, 4, 15 février 1985, pages 1356-1368; U. EFRON et al.: "The silicon liquid-crystal light valve" * |
PATENT ABSTRACTS OF JAPAN, vol. 9, no. 224 (P-387)[1947], 10 septembre 1985; & JP-A-60 83 019 (FUJITSU) 11-05-1985 * |
Also Published As
Publication number | Publication date |
---|---|
GB2217862B (en) | 1992-05-13 |
DE3813398A1 (de) | 1989-11-02 |
GB2217862A (en) | 1989-11-01 |
JPH0212253A (ja) | 1990-01-17 |
DE3813398C2 (zh) | 1991-09-26 |
GB8908837D0 (en) | 1989-06-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |