FR2630555A1 - Procede et dispositif pour la creation d'une image latente sur un revetement sensible a la lumiere d'une plaque d'impression offset - Google Patents

Procede et dispositif pour la creation d'une image latente sur un revetement sensible a la lumiere d'une plaque d'impression offset Download PDF

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Publication number
FR2630555A1
FR2630555A1 FR8905258A FR8905258A FR2630555A1 FR 2630555 A1 FR2630555 A1 FR 2630555A1 FR 8905258 A FR8905258 A FR 8905258A FR 8905258 A FR8905258 A FR 8905258A FR 2630555 A1 FR2630555 A1 FR 2630555A1
Authority
FR
France
Prior art keywords
printing plate
liquid crystal
offset printing
image
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR8905258A
Other languages
English (en)
French (fr)
Inventor
Rudolf Karl Uhrig
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heidelberger Druckmaschinen AG
Original Assignee
Heidelberger Druckmaschinen AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heidelberger Druckmaschinen AG filed Critical Heidelberger Druckmaschinen AG
Publication of FR2630555A1 publication Critical patent/FR2630555A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
FR8905258A 1988-04-21 1989-04-20 Procede et dispositif pour la creation d'une image latente sur un revetement sensible a la lumiere d'une plaque d'impression offset Withdrawn FR2630555A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3813398A DE3813398A1 (de) 1988-04-21 1988-04-21 Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte

Publications (1)

Publication Number Publication Date
FR2630555A1 true FR2630555A1 (fr) 1989-10-27

Family

ID=6352543

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8905258A Withdrawn FR2630555A1 (fr) 1988-04-21 1989-04-20 Procede et dispositif pour la creation d'une image latente sur un revetement sensible a la lumiere d'une plaque d'impression offset

Country Status (4)

Country Link
JP (1) JPH0212253A (enrdf_load_stackoverflow)
DE (1) DE3813398A1 (enrdf_load_stackoverflow)
FR (1) FR2630555A1 (enrdf_load_stackoverflow)
GB (1) GB2217862B (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9401566D0 (en) * 1994-01-27 1994-03-23 Univ Dundee Method
JP3344423B2 (ja) * 1994-02-21 2002-11-11 リュラオ，フリードリッヒ オフセット印刷版等の版面を写真製版によって形成するための方法および装置
DE19602289A1 (de) * 1996-01-23 1997-07-24 Roland Man Druckmasch Druckvorrichtung
DE19602307A1 (de) * 1996-01-23 1997-07-24 Roland Man Druckmasch Druckmaschine
JP2001188354A (ja) * 1999-12-28 2001-07-10 Asahi Kasei Corp 感光性樹脂凸版の製造方法、及びその製造装置
DE10012017A1 (de) * 2000-03-11 2001-09-13 Basysprint Gmbh Sys Druckind Belichtungsvorrichtung und Verfahren zur Kompensation von optischen Fehlern
US20020115021A1 (en) * 2001-02-01 2002-08-22 Advanced Micro Devices, Inc. Configurable patterning device and a method of making integrated circuits using such a device
US6855482B2 (en) * 2002-04-09 2005-02-15 Day International, Inc. Liquid transfer articles and method for producing the same using digital imaging photopolymerization
EP3182206B1 (en) * 2015-12-15 2019-12-04 Agfa Nv A method of exposing a print master precursor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4013466A (en) * 1975-06-26 1977-03-22 Western Electric Company, Inc. Method of preparing a circuit utilizing a liquid crystal artwork master
GB2131964A (en) * 1982-12-10 1984-06-27 Letraset International Ltd Exposing through an LCD
JPS6083019A (ja) * 1983-10-12 1985-05-11 Fujitsu Ltd パタ−ン反射型投影露光方法
US4675702A (en) * 1986-03-14 1987-06-23 Gerber Scientific Inc. Photoplotter using a light valve device and process for exposing graphics

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3761171A (en) * 1972-02-17 1973-09-25 Eastman Kodak Co Negative-positive, positive-positive exposure station
US4054094A (en) * 1972-08-25 1977-10-18 E. I. Du Pont De Nemours And Company Laser production of lithographic printing plates
GB1500952A (en) * 1974-03-26 1978-02-15 Berkel Patent Nv Optical recording device particularly for use with weighing equipment
DE3321346C2 (de) * 1983-06-13 1987-04-09 Philips Patentverwaltung Gmbh, 2000 Hamburg Optischer Druckkopf
JPS60107034A (ja) * 1983-11-14 1985-06-12 Mitsubishi Electric Corp 投影露光装置
DE3514807C2 (de) * 1984-04-25 1994-12-22 Canon Kk Vorrichtung mit einer Flüssigkristallzelle, zum Ansteuern einer Transistoranordnung
JPS6159430A (ja) * 1984-08-31 1986-03-26 Casio Comput Co Ltd 記録装置の駆動法
JPS61111061A (ja) * 1984-11-05 1986-05-29 Casio Comput Co Ltd 記録装置
US4672014A (en) * 1985-10-08 1987-06-09 The Mead Corporation Exposure of imaging sheets utilizing a light valve as a wavelength transformer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4013466A (en) * 1975-06-26 1977-03-22 Western Electric Company, Inc. Method of preparing a circuit utilizing a liquid crystal artwork master
GB2131964A (en) * 1982-12-10 1984-06-27 Letraset International Ltd Exposing through an LCD
JPS6083019A (ja) * 1983-10-12 1985-05-11 Fujitsu Ltd パタ−ン反射型投影露光方法
US4675702A (en) * 1986-03-14 1987-06-23 Gerber Scientific Inc. Photoplotter using a light valve device and process for exposing graphics

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JOURNAL OF APPLIED PHYSICS, vol. 57, no, 4, 15 février 1985, pages 1356-1368; U. EFRON et al.: "The silicon liquid-crystal light valve" *
PATENT ABSTRACTS OF JAPAN, vol. 9, no. 224 (P-387)[1947], 10 septembre 1985; & JP-A-60 83 019 (FUJITSU) 11-05-1985 *

Also Published As

Publication number Publication date
GB2217862B (en) 1992-05-13
GB8908837D0 (en) 1989-06-07
DE3813398C2 (enrdf_load_stackoverflow) 1991-09-26
DE3813398A1 (de) 1989-11-02
GB2217862A (en) 1989-11-01
JPH0212253A (ja) 1990-01-17

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