FR2579910A1 - - Google Patents
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- Publication number
- FR2579910A1 FR2579910A1 FR8604430A FR8604430A FR2579910A1 FR 2579910 A1 FR2579910 A1 FR 2579910A1 FR 8604430 A FR8604430 A FR 8604430A FR 8604430 A FR8604430 A FR 8604430A FR 2579910 A1 FR2579910 A1 FR 2579910A1
- Authority
- FR
- France
- Prior art keywords
- target
- cooling
- clamping means
- plate
- periphery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3497—Temperature of target
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH144685A CH664303A5 (de) | 1985-04-03 | 1985-04-03 | Haltevorrichtung fuer targets fuer kathodenzerstaeubung. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2579910A1 true FR2579910A1 (de) | 1986-10-10 |
FR2579910B1 FR2579910B1 (de) | 1990-01-12 |
Family
ID=4210652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8604430A Expired - Fee Related FR2579910B1 (de) | 1985-04-03 | 1986-03-27 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS61231171A (de) |
CH (1) | CH664303A5 (de) |
DE (1) | DE3603646C2 (de) |
FR (1) | FR2579910B1 (de) |
GB (1) | GB2173217B (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3613018A1 (de) * | 1986-04-17 | 1987-10-22 | Santos Pereira Ribeiro Car Dos | Magnetron-zerstaeubungskathode |
EP0276962A1 (de) * | 1987-01-27 | 1988-08-03 | Machine Technology Inc. | Kühlvorrichtung für Sputter-Target und -Quelle |
EP0393344A1 (de) * | 1989-04-20 | 1990-10-24 | Balzers Aktiengesellschaft | Haltevorrichtung für Targets von Zerstäubungsquellen und Verfahren zum Festhalten eines Targets in einer Halterung |
US5032246A (en) * | 1990-05-17 | 1991-07-16 | Tosoh Smd, Inc. | Sputtering target wrench and sputtering target design |
JPH074359Y2 (ja) * | 1990-07-10 | 1995-02-01 | 三ツ星ベルト株式会社 | 歯付ベルト |
DE9014857U1 (de) * | 1990-10-26 | 1992-02-20 | Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De | |
US6689254B1 (en) | 1990-10-31 | 2004-02-10 | Tokyo Electron Limited | Sputtering apparatus with isolated coolant and sputtering target therefor |
DE4133564C2 (de) * | 1991-10-10 | 1999-11-18 | Leybold Ag | Vorrichtung zur lösbaren Befestigung eines Targets oder Targetgrundkörpers auf der Kathodenhalterung |
US5271817A (en) * | 1992-03-19 | 1993-12-21 | Vlsi Technology, Inc. | Design for sputter targets to reduce defects in refractory metal films |
US5286361A (en) * | 1992-10-19 | 1994-02-15 | Regents Of The University Of California | Magnetically attached sputter targets |
CA2218736A1 (en) * | 1995-05-11 | 1996-11-14 | Steven D. Hurwitt | Sputtering apparatus with isolated coolant and sputtering target therefor |
DE29510381U1 (de) * | 1995-06-27 | 1995-09-07 | Leybold Ag | Vorrichtung zum Beschichten eines scheibenförmigen Substrats |
DE19535894A1 (de) * | 1995-09-27 | 1997-04-03 | Leybold Materials Gmbh | Target für die Sputterkathode einer Vakuumbeschichtungsanlage und Verfahren zu seiner Herstellung |
DE19648390A1 (de) * | 1995-09-27 | 1998-05-28 | Leybold Materials Gmbh | Target für die Sputterkathode einer Vakuumbeschichtungsanlage |
DE19627533A1 (de) * | 1996-07-09 | 1998-01-15 | Leybold Materials Gmbh | Target für die Sputterkathode einer Vakuumbeschichtungsanlage und Verfahren zu seiner Herstellung |
US6068742A (en) * | 1996-07-22 | 2000-05-30 | Balzers Aktiengesellschaft | Target arrangement with a circular plate, magnetron for mounting the target arrangement, and process for coating a series of circular disc-shaped workpieces by means of said magnetron source |
WO1998037568A1 (en) * | 1997-02-24 | 1998-08-27 | Novellus Systems, Inc. | Internally cooled target assembly for magnetron sputtering |
US5985115A (en) | 1997-04-11 | 1999-11-16 | Novellus Systems, Inc. | Internally cooled target assembly for magnetron sputtering |
DE19746988A1 (de) * | 1997-10-24 | 1999-05-06 | Leybold Ag | Zerstäuberkathode |
DE29801666U1 (de) * | 1998-02-02 | 1998-04-02 | Leybold Materials Gmbh | Vorrichtung für die Herstellung von Targets für Zerstäubungskathoden |
DE19910786A1 (de) * | 1999-03-11 | 2000-09-14 | Leybold Systems Gmbh | Magnetronkathoden |
US6551470B1 (en) * | 1999-06-15 | 2003-04-22 | Academy Precision Materials | Clamp and target assembly |
US6123775A (en) * | 1999-06-30 | 2000-09-26 | Lam Research Corporation | Reaction chamber component having improved temperature uniformity |
US6413381B1 (en) | 2000-04-12 | 2002-07-02 | Steag Hamatech Ag | Horizontal sputtering system |
US6264804B1 (en) | 2000-04-12 | 2001-07-24 | Ske Technology Corp. | System and method for handling and masking a substrate in a sputter deposition system |
DE10018858B4 (de) * | 2000-04-14 | 2005-08-18 | Von Ardenne Anlagentechnik Gmbh | Magnetronanordnung |
DE102012006717A1 (de) * | 2012-04-04 | 2013-10-10 | Oerlikon Trading Ag, Trübbach | An eine indirekte Kühlvorrichtung angepasstes Target |
CN103286403A (zh) * | 2013-05-06 | 2013-09-11 | 郑凯 | 一种平板焊接炉 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0124075A1 (de) * | 1983-04-28 | 1984-11-07 | Kabushiki Kaisha Toshiba | Aufnahmevorrichtung für Sputter-Target |
EP0127272A2 (de) * | 1983-05-25 | 1984-12-05 | Materials Research Corporation | Fokussierende Magneten-Zerstäubungsvorrichtung |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2054161A1 (de) * | 1969-11-12 | 1971-05-19 | Varian Associates | Zerstaubungs Beschichtungsvor richtung |
US3878085A (en) * | 1973-07-05 | 1975-04-15 | Sloan Technology Corp | Cathode sputtering apparatus |
US4166018A (en) * | 1974-01-31 | 1979-08-28 | Airco, Inc. | Sputtering process and apparatus |
GB2058143B (en) * | 1979-07-31 | 1983-11-02 | Nordiko Ltd | Sputtering electrodes |
GB2110719B (en) * | 1981-11-30 | 1985-10-30 | Anelva Corp | Sputtering apparatus |
DE3148354A1 (de) * | 1981-12-07 | 1983-06-09 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur kathodenzerstaeubung eines metalles |
US4448659A (en) * | 1983-09-12 | 1984-05-15 | Vac-Tec Systems, Inc. | Method and apparatus for evaporation arc stabilization including initial target cleaning |
US4581540A (en) * | 1984-03-16 | 1986-04-08 | Teledyne Industries, Inc. | Current overload protected solid state relay |
CH665057A5 (de) * | 1984-07-20 | 1988-04-15 | Balzers Hochvakuum | Targetplatte fuer kathodenzerstaeubung. |
-
1985
- 1985-04-03 CH CH144685A patent/CH664303A5/de not_active IP Right Cessation
-
1986
- 1986-02-06 DE DE19863603646 patent/DE3603646C2/de not_active Expired - Fee Related
- 1986-03-14 GB GB8606354A patent/GB2173217B/en not_active Expired
- 1986-03-27 FR FR8604430A patent/FR2579910B1/fr not_active Expired - Fee Related
- 1986-04-01 JP JP7263686A patent/JPS61231171A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0124075A1 (de) * | 1983-04-28 | 1984-11-07 | Kabushiki Kaisha Toshiba | Aufnahmevorrichtung für Sputter-Target |
EP0127272A2 (de) * | 1983-05-25 | 1984-12-05 | Materials Research Corporation | Fokussierende Magneten-Zerstäubungsvorrichtung |
Also Published As
Publication number | Publication date |
---|---|
DE3603646A1 (de) | 1986-10-16 |
GB2173217B (en) | 1989-04-19 |
CH664303A5 (de) | 1988-02-29 |
GB2173217A (en) | 1986-10-08 |
GB8606354D0 (en) | 1986-04-23 |
JPS61231171A (ja) | 1986-10-15 |
FR2579910B1 (de) | 1990-01-12 |
DE3603646C2 (de) | 1996-08-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |