FR2510145B1 - Additif pour bain de cuivrage electrolytique acide, son procede de preparation et son application au cuivrage des circuits imprimes - Google Patents

Additif pour bain de cuivrage electrolytique acide, son procede de preparation et son application au cuivrage des circuits imprimes

Info

Publication number
FR2510145B1
FR2510145B1 FR8114394A FR8114394A FR2510145B1 FR 2510145 B1 FR2510145 B1 FR 2510145B1 FR 8114394 A FR8114394 A FR 8114394A FR 8114394 A FR8114394 A FR 8114394A FR 2510145 B1 FR2510145 B1 FR 2510145B1
Authority
FR
France
Prior art keywords
printed circuits
additive
preparation
copper
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8114394A
Other languages
English (en)
French (fr)
Other versions
FR2510145A1 (fr
Inventor
Bernard Boudot
Georges Nury
Andre Lambert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhone Poulenc Specialites Chimiques
Original Assignee
Rhone Poulenc Specialites Chimiques
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR8114394A priority Critical patent/FR2510145B1/fr
Application filed by Rhone Poulenc Specialites Chimiques filed Critical Rhone Poulenc Specialites Chimiques
Priority to AT82401328T priority patent/ATE13697T1/de
Priority to DE8282401328T priority patent/DE3264038D1/de
Priority to US06/398,805 priority patent/US4430173A/en
Priority to EP82401328A priority patent/EP0071512B1/fr
Priority to JP57126848A priority patent/JPS5827992A/ja
Priority to IE1754/82A priority patent/IE53352B1/en
Publication of FR2510145A1 publication Critical patent/FR2510145A1/fr
Application granted granted Critical
Publication of FR2510145B1 publication Critical patent/FR2510145B1/fr
Priority to SG640/86A priority patent/SG64086G/en
Priority to HK965/86A priority patent/HK96586A/xx
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electroplating Methods And Accessories (AREA)
FR8114394A 1981-07-24 1981-07-24 Additif pour bain de cuivrage electrolytique acide, son procede de preparation et son application au cuivrage des circuits imprimes Expired FR2510145B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR8114394A FR2510145B1 (fr) 1981-07-24 1981-07-24 Additif pour bain de cuivrage electrolytique acide, son procede de preparation et son application au cuivrage des circuits imprimes
DE8282401328T DE3264038D1 (en) 1981-07-24 1982-07-16 Process for the preparation of an additive for an acid bath for the electrodeposition of copper and use thereof
US06/398,805 US4430173A (en) 1981-07-24 1982-07-16 Additive composition, bath and process for acid copper electroplating
EP82401328A EP0071512B1 (fr) 1981-07-24 1982-07-16 Procédé de préparation d'un additif pour bain de cuivrage électrolytique acide et son application
AT82401328T ATE13697T1 (de) 1981-07-24 1982-07-16 Verfahren zur herstellung eines zusatzmittels fuer ein saures kupferelektroplattierbad und seine verwendung.
JP57126848A JPS5827992A (ja) 1981-07-24 1982-07-22 酸性電解銅メッキ浴用添加剤、その製造法及びプリント回路の銅メッキへのその応用
IE1754/82A IE53352B1 (en) 1981-07-24 1982-07-22 Additive for an acid electrolytic coppering bath
SG640/86A SG64086G (en) 1981-07-24 1986-07-24 Process for the preparation of an additive for an acid bath for the electrodeposition of copper and use thereof
HK965/86A HK96586A (en) 1981-07-24 1986-12-11 Process for the preparation of an additive for an acid bath for the electrodeposition of copper and use thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8114394A FR2510145B1 (fr) 1981-07-24 1981-07-24 Additif pour bain de cuivrage electrolytique acide, son procede de preparation et son application au cuivrage des circuits imprimes

Publications (2)

Publication Number Publication Date
FR2510145A1 FR2510145A1 (fr) 1983-01-28
FR2510145B1 true FR2510145B1 (fr) 1986-02-07

Family

ID=9260823

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8114394A Expired FR2510145B1 (fr) 1981-07-24 1981-07-24 Additif pour bain de cuivrage electrolytique acide, son procede de preparation et son application au cuivrage des circuits imprimes

Country Status (9)

Country Link
US (1) US4430173A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0071512B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5827992A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AT (1) ATE13697T1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3264038D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2510145B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
HK (1) HK96586A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IE (1) IE53352B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SG (1) SG64086G (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

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DE4032864A1 (de) * 1990-10-13 1992-04-16 Schering Ag Saures bad zur galvanischen abscheidung von kupferueberzuegen und verfahren unter verwendung dieser kombination
DE4126502C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1991-08-07 1993-02-11 Schering Ag Berlin Und Bergkamen, 1000 Berlin, De
US6024857A (en) 1997-10-08 2000-02-15 Novellus Systems, Inc. Electroplating additive for filling sub-micron features
DE19758121C2 (de) * 1997-12-17 2000-04-06 Atotech Deutschland Gmbh Wäßriges Bad und Verfahren zum elektrolytischen Abscheiden von Kupferschichten
EP1118696A4 (en) * 1998-09-03 2007-10-17 Ebara Corp METHOD AND DEVICE FOR COATING SUBSTRATES
US6413388B1 (en) 2000-02-23 2002-07-02 Nutool Inc. Pad designs and structures for a versatile materials processing apparatus
US7427337B2 (en) * 1998-12-01 2008-09-23 Novellus Systems, Inc. System for electropolishing and electrochemical mechanical polishing
US7204924B2 (en) * 1998-12-01 2007-04-17 Novellus Systems, Inc. Method and apparatus to deposit layers with uniform properties
US6497800B1 (en) * 2000-03-17 2002-12-24 Nutool Inc. Device providing electrical contact to the surface of a semiconductor workpiece during metal plating
US7425250B2 (en) * 1998-12-01 2008-09-16 Novellus Systems, Inc. Electrochemical mechanical processing apparatus
US7578923B2 (en) * 1998-12-01 2009-08-25 Novellus Systems, Inc. Electropolishing system and process
US6610190B2 (en) 2000-11-03 2003-08-26 Nutool, Inc. Method and apparatus for electrodeposition of uniform film with minimal edge exclusion on substrate
KR100665745B1 (ko) 1999-01-26 2007-01-09 가부시키가이샤 에바라 세이사꾸쇼 구리도금방법 및 그 장치
JP2001073182A (ja) * 1999-07-15 2001-03-21 Boc Group Inc:The 改良された酸性銅電気メッキ用溶液
US6355153B1 (en) * 1999-09-17 2002-03-12 Nutool, Inc. Chip interconnect and packaging deposition methods and structures
US6612915B1 (en) 1999-12-27 2003-09-02 Nutool Inc. Work piece carrier head for plating and polishing
US6354916B1 (en) 2000-02-11 2002-03-12 Nu Tool Inc. Modified plating solution for plating and planarization and process utilizing same
US20060131177A1 (en) * 2000-02-23 2006-06-22 Jeffrey Bogart Means to eliminate bubble entrapment during electrochemical processing of workpiece surface
US7141146B2 (en) * 2000-02-23 2006-11-28 Asm Nutool, Inc. Means to improve center to edge uniformity of electrochemical mechanical processing of workpiece surface
US20090020437A1 (en) * 2000-02-23 2009-01-22 Basol Bulent M Method and system for controlled material removal by electrochemical polishing
US6406609B1 (en) * 2000-02-25 2002-06-18 Agere Systems Guardian Corp. Method of fabricating an integrated circuit
US6482307B2 (en) 2000-05-12 2002-11-19 Nutool, Inc. Method of and apparatus for making electrical contact to wafer surface for full-face electroplating or electropolishing
US6852208B2 (en) 2000-03-17 2005-02-08 Nutool, Inc. Method and apparatus for full surface electrotreating of a wafer
US20060118425A1 (en) * 2000-04-19 2006-06-08 Basol Bulent M Process to minimize and/or eliminate conductive material coating over the top surface of a patterned substrate
AU2001247109A1 (en) * 2000-04-27 2001-11-12 Nutool, Inc. Conductive structure for use in multi-level metallization and process
US7195696B2 (en) * 2000-05-11 2007-03-27 Novellus Systems, Inc. Electrode assembly for electrochemical processing of workpiece
US6695962B2 (en) 2001-05-01 2004-02-24 Nutool Inc. Anode designs for planar metal deposits with enhanced electrolyte solution blending and process of supplying electrolyte solution using such designs
US6478936B1 (en) 2000-05-11 2002-11-12 Nutool Inc. Anode assembly for plating and planarizing a conductive layer
US7754061B2 (en) * 2000-08-10 2010-07-13 Novellus Systems, Inc. Method for controlling conductor deposition on predetermined portions of a wafer
US6921551B2 (en) * 2000-08-10 2005-07-26 Asm Nutool, Inc. Plating method and apparatus for controlling deposition on predetermined portions of a workpiece
US6776893B1 (en) 2000-11-20 2004-08-17 Enthone Inc. Electroplating chemistry for the CU filling of submicron features of VLSI/ULSI interconnect
US6802946B2 (en) 2000-12-21 2004-10-12 Nutool Inc. Apparatus for controlling thickness uniformity of electroplated and electroetched layers
US6866763B2 (en) * 2001-01-17 2005-03-15 Asm Nutool. Inc. Method and system monitoring and controlling film thickness profile during plating and electroetching
US20050040049A1 (en) * 2002-09-20 2005-02-24 Rimma Volodarsky Anode assembly for plating and planarizing a conductive layer
US20070131563A1 (en) * 2003-04-14 2007-06-14 Asm Nutool, Inc. Means to improve center to edge uniformity of electrochemical mechanical processing of workpiece surface
US7297247B2 (en) * 2003-05-06 2007-11-20 Applied Materials, Inc. Electroformed sputtering target
DE10337669B4 (de) * 2003-08-08 2006-04-27 Atotech Deutschland Gmbh Wässrige, saure Lösung und Verfahren zum galvanischen Abscheiden von Kupferüberzügen sowie Verwendung der Lösung
US7648622B2 (en) * 2004-02-27 2010-01-19 Novellus Systems, Inc. System and method for electrochemical mechanical polishing
CN1946879B (zh) * 2005-01-25 2010-05-05 日矿金属株式会社 作为添加剂含有具有特定骨架化合物的铜电解液以及由该铜电解液制造的电解铜箔
US9127362B2 (en) 2005-10-31 2015-09-08 Applied Materials, Inc. Process kit and target for substrate processing chamber
US8647484B2 (en) * 2005-11-25 2014-02-11 Applied Materials, Inc. Target for sputtering chamber
EP1839695A1 (en) * 2006-03-31 2007-10-03 Debiotech S.A. Medical liquid injection device
US8500985B2 (en) * 2006-07-21 2013-08-06 Novellus Systems, Inc. Photoresist-free metal deposition
US20080237048A1 (en) * 2007-03-30 2008-10-02 Ismail Emesh Method and apparatus for selective electrofilling of through-wafer vias
US8968536B2 (en) * 2007-06-18 2015-03-03 Applied Materials, Inc. Sputtering target having increased life and sputtering uniformity
US7901552B2 (en) 2007-10-05 2011-03-08 Applied Materials, Inc. Sputtering target with grooves and intersecting channels
KR20110079466A (ko) 2009-12-31 2011-07-07 제일모직주식회사 열가소성 수지 조성물 및 이를 이용한 성형품
CN105568326A (zh) * 2015-12-31 2016-05-11 深圳市鑫鸿顺科技有限公司 一种pcb垂直连续电镀专用镀铜溶液
CN113166962A (zh) 2018-11-07 2021-07-23 科文特亚股份有限公司 缎面铜浴和沉积缎面铜层的方法
CN110284163B (zh) * 2019-07-31 2020-08-04 广州三孚新材料科技股份有限公司 一种太阳能电池用镀铜液及其制备方法
WO2021200614A1 (ja) * 2020-04-01 2021-10-07 住友電気工業株式会社 フレキシブルプリント配線板及びその製造方法
US20240337039A1 (en) * 2021-10-26 2024-10-10 Jcu Corporation Method for coarsening copper crystal grains in objects to be plated and copper-plated membrane having coarsened copper crystal grains in copper-plated membrane

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US4036710A (en) * 1974-11-21 1977-07-19 M & T Chemicals Inc. Electrodeposition of copper
US4036711A (en) 1975-12-18 1977-07-19 M & T Chemicals Inc. Electrodeposition of copper
US4038161A (en) * 1976-03-05 1977-07-26 R. O. Hull & Company, Inc. Acid copper plating and additive composition therefor

Also Published As

Publication number Publication date
EP0071512B1 (fr) 1985-06-05
FR2510145A1 (fr) 1983-01-28
EP0071512A1 (fr) 1983-02-09
IE53352B1 (en) 1988-10-26
SG64086G (en) 1987-09-18
IE821754L (en) 1983-01-24
JPS5827992A (ja) 1983-02-18
US4430173A (en) 1984-02-07
JPS6155599B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-11-28
DE3264038D1 (en) 1985-07-11
ATE13697T1 (de) 1985-06-15
HK96586A (en) 1986-12-19

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Legal Events

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