FR2445022A1 - Perfectionnement relatif au procede pour la production de dispositifs integres a semi-conducteur et produit ainsi obtenu - Google Patents

Perfectionnement relatif au procede pour la production de dispositifs integres a semi-conducteur et produit ainsi obtenu

Info

Publication number
FR2445022A1
FR2445022A1 FR7929840A FR7929840A FR2445022A1 FR 2445022 A1 FR2445022 A1 FR 2445022A1 FR 7929840 A FR7929840 A FR 7929840A FR 7929840 A FR7929840 A FR 7929840A FR 2445022 A1 FR2445022 A1 FR 2445022A1
Authority
FR
France
Prior art keywords
diffused
layer
zones
production
semiconductor devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7929840A
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SRL
Original Assignee
ATES Componenti Elettronici SpA
SGS ATES Componenti Elettronici SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ATES Componenti Elettronici SpA, SGS ATES Componenti Elettronici SpA filed Critical ATES Componenti Elettronici SpA
Publication of FR2445022A1 publication Critical patent/FR2445022A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/761PN junctions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0821Collector regions of bipolar transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Element Separation (AREA)
FR7929840A 1978-12-22 1979-12-05 Perfectionnement relatif au procede pour la production de dispositifs integres a semi-conducteur et produit ainsi obtenu Withdrawn FR2445022A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT31304/78A IT1101096B (it) 1978-12-22 1978-12-22 Perfezionamento al procedimento per produrre dispositivi integrati a semiconduttore e prodotto risultante

Publications (1)

Publication Number Publication Date
FR2445022A1 true FR2445022A1 (fr) 1980-07-18

Family

ID=11233426

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7929840A Withdrawn FR2445022A1 (fr) 1978-12-22 1979-12-05 Perfectionnement relatif au procede pour la production de dispositifs integres a semi-conducteur et produit ainsi obtenu

Country Status (6)

Country Link
JP (1) JPS55108762A (it)
DE (1) DE2951821A1 (it)
FR (1) FR2445022A1 (it)
GB (1) GB2039415A (it)
IT (1) IT1101096B (it)
SE (1) SE7910530L (it)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0057549A2 (en) * 1981-01-29 1982-08-11 Kabushiki Kaisha Toshiba Semiconductor device
EP0341461A2 (en) * 1988-05-09 1989-11-15 Motorola, Inc. Process for making a bipolar integrated circuit

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2309040A1 (fr) * 1975-04-22 1976-11-19 Tokyo Shibaura Electric Co Circuit integre comportant un transistor vertical a base epitaxiale

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2309040A1 (fr) * 1975-04-22 1976-11-19 Tokyo Shibaura Electric Co Circuit integre comportant un transistor vertical a base epitaxiale

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0057549A2 (en) * 1981-01-29 1982-08-11 Kabushiki Kaisha Toshiba Semiconductor device
EP0057549A3 (en) * 1981-01-29 1983-07-27 Tokyo Shibaura Denki Kabushiki Kaisha Semiconductor body
EP0341461A2 (en) * 1988-05-09 1989-11-15 Motorola, Inc. Process for making a bipolar integrated circuit
EP0341461A3 (en) * 1988-05-09 1990-05-16 Motorola, Inc. Process for making a bipolar integrated circuit

Also Published As

Publication number Publication date
SE7910530L (sv) 1980-06-23
IT1101096B (it) 1985-09-28
DE2951821A1 (de) 1980-07-03
IT7831304A0 (it) 1978-12-22
JPS55108762A (en) 1980-08-21
GB2039415A (en) 1980-08-06

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Legal Events

Date Code Title Description
RE Withdrawal of published application