FR2433238A1 - Procede de fabrication d'une jonction p-n - Google Patents

Procede de fabrication d'une jonction p-n

Info

Publication number
FR2433238A1
FR2433238A1 FR7920416A FR7920416A FR2433238A1 FR 2433238 A1 FR2433238 A1 FR 2433238A1 FR 7920416 A FR7920416 A FR 7920416A FR 7920416 A FR7920416 A FR 7920416A FR 2433238 A1 FR2433238 A1 FR 2433238A1
Authority
FR
France
Prior art keywords
substrate
type
manufacturing
manufacture
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7920416A
Other languages
English (en)
Other versions
FR2433238B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
US Department of Energy
Original Assignee
US Department of Energy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by US Department of Energy filed Critical US Department of Energy
Publication of FR2433238A1 publication Critical patent/FR2433238A1/fr
Application granted granted Critical
Publication of FR2433238B1 publication Critical patent/FR2433238B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251—Diffusion into or out of group IV semiconductors
    • H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/09—Laser anneal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/092—Laser beam processing-diodes or transistor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/153—Solar cells-implantations-laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Photovoltaic Devices (AREA)

Abstract

L'invention concerne la fabrication des dispositifs à semiconducteurs. Un procédé de fabrication d'une cellule solaire comprenant notamment un substrat de type n,9 et une couche diffusée de type p,13 consiste à déposer sur le substrat une impureté de type p, et à faire diffuser ensuite cette impureté dans le substrat, en l'irradiant avec une impulsion laser dont la longueur d'onde est comprise entre 0,3 et 1,1 mu m, la densité d'énergie entre 1 et 2 J/cm** 2 et la durée entre 20 et 60 ns. Les paramètres du faisceau laser sont choisis de façon à provoquer la fusion du substrat sur une profondeur comprise dans une plage allant approximativement de 10 nm à 1 mu m. Application à la fabrication de cellules solaires.
FR7920416A 1978-08-09 1979-08-09 Procede de fabrication d'une jonction p-n Granted FR2433238A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/932,154 US4147563A (en) 1978-08-09 1978-08-09 Method for forming p-n junctions and solar-cells by laser-beam processing

Publications (2)

Publication Number Publication Date
FR2433238A1 true FR2433238A1 (fr) 1980-03-07
FR2433238B1 FR2433238B1 (fr) 1984-11-09

Family

ID=25461865

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7920416A Granted FR2433238A1 (fr) 1978-08-09 1979-08-09 Procede de fabrication d'une jonction p-n

Country Status (6)

Country Link
US (1) US4147563A (fr)
JP (1) JPS5524500A (fr)
CA (1) CA1080835A (fr)
DE (1) DE2929296A1 (fr)
FR (1) FR2433238A1 (fr)
GB (1) GB2027989B (fr)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2056769B (en) * 1978-11-28 1983-03-30 Western Electric Co Dual wavelength laser annealing of material
GB2044804A (en) * 1979-03-16 1980-10-22 Boc Ltd Heat treatment method
US4234358A (en) * 1979-04-05 1980-11-18 Western Electric Company, Inc. Patterned epitaxial regrowth using overlapping pulsed irradiation
US4273950A (en) * 1979-05-29 1981-06-16 Photowatt International, Inc. Solar cell and fabrication thereof using microwaves
FR2460544A1 (fr) * 1979-06-29 1981-01-23 Labo Electronique Physique Procede d'amelioration des performances des photopiles solaires, par irradiation laser et photopiles ainsi obtenues
US4242149A (en) * 1979-07-31 1980-12-30 The United States Of America As Represented By The Secretary Of The Army Method of making photodetectors using ion implantation and laser annealing
US4257824A (en) * 1979-07-31 1981-03-24 Bell Telephone Laboratories, Incorporated Photo-induced temperature gradient zone melting
US4309225A (en) * 1979-09-13 1982-01-05 Massachusetts Institute Of Technology Method of crystallizing amorphous material with a moving energy beam
US4261764A (en) * 1979-10-01 1981-04-14 The United States Of America As Represented By The United States Department Of Energy Laser method for forming low-resistance ohmic contacts on semiconducting oxides
US4257827A (en) * 1979-11-13 1981-03-24 International Business Machines Corporation High efficiency gettering in silicon through localized superheated melt formation
US4370175A (en) * 1979-12-03 1983-01-25 Bernard B. Katz Method of annealing implanted semiconductors by lasers
JPS56135969A (en) * 1980-03-27 1981-10-23 Fujitsu Ltd Manufacture of semiconductor device
US4322253A (en) * 1980-04-30 1982-03-30 Rca Corporation Method of making selective crystalline silicon regions containing entrapped hydrogen by laser treatment
US4318752A (en) * 1980-05-16 1982-03-09 Bell Telephone Laboratories, Incorporated Heterojunction semiconductor laser fabrication utilizing laser radiation
US4364778A (en) * 1980-05-30 1982-12-21 Bell Telephone Laboratories, Incorporated Formation of multilayer dopant distributions in a semiconductor
US4311870A (en) * 1980-09-11 1982-01-19 Nasa Efficiency of silicon solar cells containing chromium
DE3221180A1 (de) * 1981-06-05 1983-01-05 Mitsubishi Denki K.K., Tokyo Verfahren und vorrichtung zur herstellung einer halbleitervorrichtung
JPS6059060A (ja) * 1983-09-09 1985-04-05 Fujitsu Ltd 浸炭窒化の炉気制御方法
US4608452A (en) * 1984-11-07 1986-08-26 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Lithium counterdoped silicon solar cell
US5918140A (en) * 1997-06-16 1999-06-29 The Regents Of The University Of California Deposition of dopant impurities and pulsed energy drive-in
AUPP437598A0 (en) * 1998-06-29 1998-07-23 Unisearch Limited A self aligning method for forming a selective emitter and metallization in a solar cell
AU749022B2 (en) * 1998-06-29 2002-06-13 Unisearch Limited A self aligning method for forming a selective emitter and metallization in a solar cell
DE102004036220B4 (de) * 2004-07-26 2009-04-02 Jürgen H. Werner Verfahren zur Laserdotierung von Festkörpern mit einem linienfokussierten Laserstrahl
EP2654089A3 (fr) * 2007-02-16 2015-08-12 Nanogram Corporation Structures de cellules solaires, modules photovoltaïques et procédés correspondants
US20090227095A1 (en) * 2008-03-05 2009-09-10 Nicholas Bateman Counterdoping for solar cells
CN104882513A (zh) * 2009-04-22 2015-09-02 泰特拉桑有限公司 通过局部激光辅助转变太阳能电池中的功能膜得到的局部金属接触
US20100294352A1 (en) * 2009-05-20 2010-11-25 Uma Srinivasan Metal patterning for electrically conductive structures based on alloy formation
US20100294349A1 (en) * 2009-05-20 2010-11-25 Uma Srinivasan Back contact solar cells with effective and efficient designs and corresponding patterning processes
US7799666B1 (en) 2009-07-27 2010-09-21 Potomac Photonics, Inc. Method of spatially selective laser-assisted doping of a semiconductor
DE102010061296A1 (de) 2010-12-16 2012-06-21 Schott Solar Ag Verfahren zum Herstellen von elektrisch leitenden Kontakten auf Solarzellen sowie Solarzelle
US8912083B2 (en) 2011-01-31 2014-12-16 Nanogram Corporation Silicon substrates with doped surface contacts formed from doped silicon inks and corresponding processes
CN102191563B (zh) * 2011-04-22 2012-09-19 中国科学院半导体研究所 共掺杂的硅基杂质中间带材料的制备方法
CN102368510A (zh) * 2011-11-11 2012-03-07 中山大学 基于激光掺杂制备发射极的n型晶体硅太阳电池的制备方法
CN103219421B (zh) * 2013-03-27 2015-05-13 中国科学院上海光学精密机械研究所 利用激光制作垂直多结太阳能电池片的方法
EP2838120B1 (fr) * 2013-08-12 2016-03-23 Rigas Tehniska Universitate Procédé de formation d'une homojonction pn à base de silicium avec bande interdite graduée
WO2016084299A1 (fr) * 2014-11-28 2016-06-02 パナソニックＩｐマネジメント株式会社 Cellule solaire et module solaire
US9659775B2 (en) * 2015-02-25 2017-05-23 Fuji Electric Co., Ltd. Method for doping impurities, method for manufacturing semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3420719A (en) * 1965-05-27 1969-01-07 Ibm Method of making semiconductors by laser induced diffusion
FR2188310A2 (en) * 1970-08-03 1974-01-18 Anvar Microcircuit prodn using laser beam - in which the beam promotes diffusion doping

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458368A (en) * 1966-05-23 1969-07-29 Texas Instruments Inc Integrated circuits and fabrication thereof
US3420119A (en) * 1967-06-19 1969-01-07 Milton Morse Nonexpandable boot
US3585088A (en) * 1968-10-18 1971-06-15 Ibm Methods of producing single crystals on supporting substrates
US3940289A (en) * 1975-02-03 1976-02-24 The United States Of America As Represented By The Secretary Of The Navy Flash melting method for producing new impurity distributions in solids
US4059461A (en) * 1975-12-10 1977-11-22 Massachusetts Institute Of Technology Method for improving the crystallinity of semiconductor films by laser beam scanning and the products thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3420719A (en) * 1965-05-27 1969-01-07 Ibm Method of making semiconductors by laser induced diffusion
FR2188310A2 (en) * 1970-08-03 1974-01-18 Anvar Microcircuit prodn using laser beam - in which the beam promotes diffusion doping

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
EXBK/68 *
EXBK/74 *
EXBK/77 *
EXBK/78 *

Also Published As

Publication number Publication date
GB2027989A (en) 1980-02-27
DE2929296A1 (de) 1980-02-28
JPS5524500A (en) 1980-02-21
FR2433238B1 (fr) 1984-11-09
GB2027989B (en) 1983-01-19
US4147563A (en) 1979-04-03
CA1080835A (fr) 1980-07-01

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