FR2392499A1 - Dispositif semi-conducteur en logique integree a injection - Google Patents
Dispositif semi-conducteur en logique integree a injectionInfo
- Publication number
- FR2392499A1 FR2392499A1 FR7815050A FR7815050A FR2392499A1 FR 2392499 A1 FR2392499 A1 FR 2392499A1 FR 7815050 A FR7815050 A FR 7815050A FR 7815050 A FR7815050 A FR 7815050A FR 2392499 A1 FR2392499 A1 FR 2392499A1
- Authority
- FR
- France
- Prior art keywords
- zone
- semiconductor device
- integrated logic
- metallizations
- logic injection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000002347 injection Methods 0.000 title abstract 2
- 239000007924 injection Substances 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title 1
- 238000001465 metallisation Methods 0.000 abstract 2
- 230000004888 barrier function Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
- H01L29/41708—Emitter or collector electrodes for bipolar transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
- H01L27/0229—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
- H01L27/0233—Integrated injection logic structures [I2L]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0821—Collector regions of bipolar transistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
- Logic Circuits (AREA)
Abstract
L'invention concerne les circuits logiques. Un dispositif en logique intégrée à injection comporte un transistor de sortie dont la région de collecteur comprend une première zone 22, 23, 24, et une seconde zone 25 à 30. La première zone forme un contact à barrière Schottky avec les métallisations 34, 35, 36, tandis que la seconde zone forme avec ces métallisations un contact ohmique à faible résistance. Application à la fabrication des circuits intégrés.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/800,282 US4156246A (en) | 1977-05-25 | 1977-05-25 | Combined ohmic and Schottky output transistors for logic circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2392499A1 true FR2392499A1 (fr) | 1978-12-22 |
Family
ID=25177976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7815050A Withdrawn FR2392499A1 (fr) | 1977-05-25 | 1978-05-22 | Dispositif semi-conducteur en logique integree a injection |
Country Status (5)
Country | Link |
---|---|
US (1) | US4156246A (fr) |
JP (1) | JPS53145585A (fr) |
DE (1) | DE2822403A1 (fr) |
FR (1) | FR2392499A1 (fr) |
NL (1) | NL7805471A (fr) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4282538A (en) * | 1977-11-11 | 1981-08-04 | Rca Corporation | Method of integrating semiconductor components |
DE2835930C2 (de) * | 1978-08-17 | 1986-07-17 | Siemens AG, 1000 Berlin und 8000 München | Monolithisch integrierte Halbleiterschaltungsanordnung mit mindestens einem Lateraltransistor |
US4357178A (en) * | 1978-12-20 | 1982-11-02 | Ibm Corporation | Schottky barrier diode with controlled characteristics and fabrication method |
US4373166A (en) * | 1978-12-20 | 1983-02-08 | Ibm Corporation | Schottky Barrier diode with controlled characteristics |
US4214315A (en) * | 1979-03-16 | 1980-07-22 | International Business Machines Corporation | Method for fabricating vertical NPN and PNP structures and the resulting product |
GB2050694B (en) * | 1979-05-07 | 1983-09-28 | Nippon Telegraph & Telephone | Electrode structure for a semiconductor device |
JPS5669844A (en) * | 1979-11-10 | 1981-06-11 | Toshiba Corp | Manufacture of semiconductor device |
EP0029986B1 (fr) * | 1979-11-29 | 1986-03-12 | Vlsi Technology Research Association | Procédé de fabrication d'un dispositif semiconducteur comportant une jonction Schottky |
US4281448A (en) * | 1980-04-14 | 1981-08-04 | Gte Laboratories Incorporated | Method of fabricating a diode bridge rectifier in monolithic integrated circuit structure utilizing isolation diffusions and metal semiconductor rectifying barrier diode formation |
JPH0693512B2 (ja) * | 1986-06-17 | 1994-11-16 | 日産自動車株式会社 | 縦形mosfet |
US4871686A (en) * | 1988-03-28 | 1989-10-03 | Motorola, Inc. | Integrated Schottky diode and transistor |
US5250834A (en) * | 1991-09-19 | 1993-10-05 | International Business Machines Corporation | Silicide interconnection with schottky barrier diode isolation |
US7528459B2 (en) * | 2003-05-27 | 2009-05-05 | Nxp B.V. | Punch-through diode and method of processing the same |
US7667264B2 (en) | 2004-09-27 | 2010-02-23 | Alpha And Omega Semiconductor Limited | Shallow source MOSFET |
US8093651B2 (en) * | 2005-02-11 | 2012-01-10 | Alpha & Omega Semiconductor Limited | MOS device with integrated schottky diode in active region contact trench |
US7285822B2 (en) * | 2005-02-11 | 2007-10-23 | Alpha & Omega Semiconductor, Inc. | Power MOS device |
US8362547B2 (en) | 2005-02-11 | 2013-01-29 | Alpha & Omega Semiconductor Limited | MOS device with Schottky barrier controlling layer |
US7948029B2 (en) | 2005-02-11 | 2011-05-24 | Alpha And Omega Semiconductor Incorporated | MOS device with varying trench depth |
US8283723B2 (en) * | 2005-02-11 | 2012-10-09 | Alpha & Omega Semiconductor Limited | MOS device with low injection diode |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2431011A1 (de) * | 1973-06-28 | 1975-01-30 | Sony Corp | Halbleitervorrichtung |
FR2313820A1 (fr) * | 1975-06-03 | 1976-12-31 | Siemens Ag | Element logique |
FR2317771A1 (fr) * | 1975-07-07 | 1977-02-04 | Siemens Ag | Etage inverseur d'un circuit logique integre a injection |
FR2337433A1 (fr) * | 1975-12-29 | 1977-07-29 | Tokyo Shibaura Electric Co | Dispositif a semi-conducteur |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3938243A (en) * | 1973-02-20 | 1976-02-17 | Signetics Corporation | Schottky barrier diode semiconductor structure and method |
CA1056513A (fr) * | 1975-06-19 | 1979-06-12 | Benjamin J. Sloan (Jr.) | Mode de fabrication de circuit logique integre |
-
1977
- 1977-05-25 US US05/800,282 patent/US4156246A/en not_active Expired - Lifetime
-
1978
- 1978-05-19 NL NL7805471A patent/NL7805471A/xx not_active Application Discontinuation
- 1978-05-22 FR FR7815050A patent/FR2392499A1/fr not_active Withdrawn
- 1978-05-23 DE DE19782822403 patent/DE2822403A1/de active Pending
- 1978-05-25 JP JP6174278A patent/JPS53145585A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2431011A1 (de) * | 1973-06-28 | 1975-01-30 | Sony Corp | Halbleitervorrichtung |
FR2313820A1 (fr) * | 1975-06-03 | 1976-12-31 | Siemens Ag | Element logique |
FR2317771A1 (fr) * | 1975-07-07 | 1977-02-04 | Siemens Ag | Etage inverseur d'un circuit logique integre a injection |
FR2337433A1 (fr) * | 1975-12-29 | 1977-07-29 | Tokyo Shibaura Electric Co | Dispositif a semi-conducteur |
Non-Patent Citations (2)
Title |
---|
EXBK/75 * |
EXBK/77 * |
Also Published As
Publication number | Publication date |
---|---|
DE2822403A1 (de) | 1978-12-07 |
NL7805471A (nl) | 1978-11-28 |
US4156246A (en) | 1979-05-22 |
JPS53145585A (en) | 1978-12-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2392499A1 (fr) | Dispositif semi-conducteur en logique integree a injection | |
KR850001647A (ko) | 바이폴라 트랜지스터와 전계효과 트랜지스터와의 복합회로 | |
FR2506057A1 (fr) | Memoire a semi-conducteurs | |
JPS55132055A (en) | Mos integrated circuit | |
KR930007096A (ko) | 인체 효과를 감소시키기 위한 엔-채널 풀업 트랜지스터 | |
DE3576612D1 (de) | Halbleiteranordnung mit mos-transistoren. | |
GB1450167A (en) | Integrated citcuits | |
KR910005448A (ko) | 반도체 집적회로 | |
JPS5618456A (en) | Substrate potential generator | |
JPS5310984A (en) | Complementary type mos integrated circuit | |
SE8101994L (sv) | Elektronisk krets med schottky-felttransistor med kontaktelement med olika schottky-barrierhojd | |
KR910007159A (ko) | Mos형 반도체장치 | |
FR2430096A1 (fr) | Circuit logique integre a circuits-portes | |
JPS5548957A (en) | Semiconductor logic element | |
KR930003414A (ko) | 반도체 집적 회로 장치 | |
JPS6377155A (ja) | オ−プンドレイン出力回路 | |
KR900004040A (ko) | 반도체 집적회로 디바이스 | |
KR870001672A (ko) | 반도체 회로장치 | |
JPS57154869A (en) | Semiconductor device | |
KR930022369A (ko) | 워드선 구동회로 | |
JPS55146963A (en) | Semiconductor integrated circuit | |
JPH01253267A (ja) | 半導体装置のための入力保護回路 | |
JPS52117584A (en) | Mos type semiconductor device | |
KR0141963B1 (ko) | 씨모스 아이씨의 공급전원 보호회로 | |
JPS5662376A (en) | Schottky diode |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |