FR2388300A1 - Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant - Google Patents

Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant

Info

Publication number
FR2388300A1
FR2388300A1 FR7711910A FR7711910A FR2388300A1 FR 2388300 A1 FR2388300 A1 FR 2388300A1 FR 7711910 A FR7711910 A FR 7711910A FR 7711910 A FR7711910 A FR 7711910A FR 2388300 A1 FR2388300 A1 FR 2388300A1
Authority
FR
France
Prior art keywords
focus
device including
projection device
optical pattern
pattern projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7711910A
Other languages
English (en)
Other versions
FR2388300B1 (fr
Inventor
Michel Lacombat
Lacombat Et Rene Gerard Michel
Rene Gerard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7711910A priority Critical patent/FR2388300A1/fr
Priority to US05/897,168 priority patent/US4140392A/en
Priority to DE19782817401 priority patent/DE2817401A1/de
Priority to JP4715878A priority patent/JPS53132270A/ja
Publication of FR2388300A1 publication Critical patent/FR2388300A1/fr
Application granted granted Critical
Publication of FR2388300B1 publication Critical patent/FR2388300B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/34—Means for automatic focusing therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Projection-Type Copiers In General (AREA)

Abstract

L'invention se rapporte aux dispositifs optiques de projection, plus particulièrement aux dispositifs de photorépétition destinées au transfert de motifs sur une plaque photosensible. Le dispositif selon l'invention comprend des moyens de déplacement de l'objectif et de l'objet, permettant de régler le grandissement et la mise au point en fonction de l'objectif utilisé, et coopérant avec des moyens d'asservissement de la position de l'objectif permettant une focalisation automatique, tout en maintenant constant le grandissement. L'invention s'applique notamment à la fabrication de masques destinés au report sur substrat semi-conducteur, ou à la réalisation de circuits intégrés sur substrats, par photorépétition directe.
FR7711910A 1977-04-20 1977-04-20 Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant Granted FR2388300A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR7711910A FR2388300A1 (fr) 1977-04-20 1977-04-20 Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant
US05/897,168 US4140392A (en) 1977-04-20 1978-04-17 Optical system for projecting patterns comprising a constant-magnification focusing servocontrol
DE19782817401 DE2817401A1 (de) 1977-04-20 1978-04-20 Optische vorrichtung zum projizieren von motiven
JP4715878A JPS53132270A (en) 1977-04-20 1978-04-20 Optical device for projecting pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7711910A FR2388300A1 (fr) 1977-04-20 1977-04-20 Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant

Publications (2)

Publication Number Publication Date
FR2388300A1 true FR2388300A1 (fr) 1978-11-17
FR2388300B1 FR2388300B1 (fr) 1982-06-25

Family

ID=9189664

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7711910A Granted FR2388300A1 (fr) 1977-04-20 1977-04-20 Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant

Country Status (4)

Country Link
US (1) US4140392A (fr)
JP (1) JPS53132270A (fr)
DE (1) DE2817401A1 (fr)
FR (1) FR2388300A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2526555A1 (fr) * 1982-04-14 1983-11-10 Canon Kk Appareil de transfert et dispositif de cadrage de masques
EP0116940A2 (fr) * 1983-02-14 1984-08-29 Kabushiki Kaisha Toshiba Dispositif de transfert de motifs ainsi que son procédé

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2035610B (en) * 1978-10-20 1983-03-23 Hitachi Ltd Wafer projection aligner
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
JPS55164840U (fr) * 1979-05-14 1980-11-27
US4345836A (en) * 1979-10-22 1982-08-24 Optimetrix Corporation Two-stage wafer prealignment system for an optical alignment and exposure machine
JPS57181119A (en) * 1981-05-01 1982-11-08 Agency Of Ind Science & Technol Forming method for pattern
JPS5817446A (ja) * 1981-07-24 1983-02-01 Hitachi Ltd 投影露光方法および装置
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
US4580900A (en) * 1982-04-02 1986-04-08 Eaton Corporation Auto focus alignment and measurement system and method
US4615621A (en) * 1982-04-02 1986-10-07 Eaton Corporation Auto-focus alignment and measurement system and method
JPS5990929A (ja) * 1982-11-17 1984-05-25 Canon Inc 投影露光装置のピント合わせ方法
JPS59200227A (ja) * 1983-04-27 1984-11-13 Fuji Photo Film Co Ltd レンズ選択時における露光量補正方法
JPS59232333A (ja) * 1983-06-15 1984-12-27 Fuji Photo Film Co Ltd 自動焦点設定方法
JPS6018918A (ja) * 1983-07-13 1985-01-31 Canon Inc ステージ装置
JPS61256636A (ja) * 1985-05-09 1986-11-14 Nec Corp 縮小投影露光装置
JPS6232613A (ja) * 1985-08-05 1987-02-12 Canon Inc 投影露光装置
NL8601547A (nl) * 1986-06-16 1988-01-18 Philips Nv Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting.
JPS63172148A (ja) * 1987-01-12 1988-07-15 Hitachi Ltd 基板表面変形装置
NL9100202A (nl) * 1991-02-05 1992-09-01 Asm Lithography Bv Lithografische inrichting met een hangende objecttafel.
JPH0712019B2 (ja) * 1992-03-13 1995-02-08 株式会社日立製作所 投影露光方法及び投影露光装置
JP2689408B2 (ja) * 1994-11-18 1997-12-10 株式会社シゲル工業 理容鋏
JP2653356B2 (ja) * 1996-01-29 1997-09-17 株式会社日立製作所 投影露光方法
AU2003245400A1 (en) * 2002-06-05 2003-12-22 Nokia Corporation Digital camera system with piezoelectric actuators
US6710950B2 (en) * 2002-06-05 2004-03-23 Nokia Mobile Phones Limited Piezoelectric actuator for digital camera optical system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2030468A5 (fr) * 1969-01-29 1970-11-13 Thomson Brandt Csf
US3625607A (en) * 1969-05-22 1971-12-07 Warren Childers Automatic focusing camera
US3704657A (en) * 1971-05-05 1972-12-05 Computervision Corp Adaptive optical focusing system
US3728019A (en) * 1971-09-13 1973-04-17 Eastman Kodak Co Auto-focus printing below 1,1 {33 {0 magnification

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2526555A1 (fr) * 1982-04-14 1983-11-10 Canon Kk Appareil de transfert et dispositif de cadrage de masques
EP0116940A2 (fr) * 1983-02-14 1984-08-29 Kabushiki Kaisha Toshiba Dispositif de transfert de motifs ainsi que son procédé
EP0116940A3 (en) * 1983-02-14 1985-01-30 Kabushiki Kaisha Toshiba Pattern transfer device and method

Also Published As

Publication number Publication date
JPS53132270A (en) 1978-11-17
US4140392A (en) 1979-02-20
DE2817401A1 (de) 1978-10-26
FR2388300B1 (fr) 1982-06-25

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