FR2366350A1 - Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions - Google Patents

Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions

Info

Publication number
FR2366350A1
FR2366350A1 FR7729711A FR7729711A FR2366350A1 FR 2366350 A1 FR2366350 A1 FR 2366350A1 FR 7729711 A FR7729711 A FR 7729711A FR 7729711 A FR7729711 A FR 7729711A FR 2366350 A1 FR2366350 A1 FR 2366350A1
Authority
FR
France
Prior art keywords
organic
compositions
mineral substrates
substances
ppm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7729711A
Other languages
English (en)
Other versions
FR2366350B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Allied Corp
Original Assignee
Allied Chemical and Dye Corp
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chemical and Dye Corp, Allied Chemical Corp filed Critical Allied Chemical and Dye Corp
Publication of FR2366350A1 publication Critical patent/FR2366350A1/fr
Application granted granted Critical
Publication of FR2366350B1 publication Critical patent/FR2366350B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00—Chemical paint or ink removers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • ing And Chemical Polishing (AREA)
  • Paints Or Removers (AREA)

Abstract

Compositions organiques d'enlèvement de substances organiques polymères. Des compositions organiques d'enlèvement renferment un ou plusieurs acides sulfoniques organiques, tels que l'acide dodécyl linéaire) benzènesulfonique, l'acide para-toluènesulfonique et l'acide phénolsulfonique, un ou plusieurs solvants organiques et, éventuellement du phénol; dans ces compositions, on incorpore l'ion fluorure en quantité d'environ 5 à 250 ppm en poids, de préférence environ 10 à 200 ppm en poids. La présente invention est particulierement utile pour fournir des compositions organiques d'enlèvement utiles pour retirer des substances organiques polymères, telles que des produits photo-résistants, à partir de substrats minéraux métallisés.
FR7729711A 1976-10-04 1977-10-03 Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions Granted FR2366350A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/729,515 US4165295A (en) 1976-10-04 1976-10-04 Organic stripping compositions and method for using same

Publications (2)

Publication Number Publication Date
FR2366350A1 true FR2366350A1 (fr) 1978-04-28
FR2366350B1 FR2366350B1 (fr) 1982-11-12

Family

ID=24931404

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7729711A Granted FR2366350A1 (fr) 1976-10-04 1977-10-03 Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions

Country Status (7)

Country Link
US (1) US4165295A (fr)
JP (1) JPS5344491A (fr)
CA (1) CA1074218A (fr)
DE (1) DE2744027C2 (fr)
FR (1) FR2366350A1 (fr)
GB (1) GB1562356A (fr)
IT (1) IT1143831B (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0013310A1 (fr) * 1978-11-17 1980-07-23 Hoechst Aktiengesellschaft Procédé de fabrication d'une image photorésist
FR2455075A1 (fr) * 1979-04-24 1980-11-21 Rhone Poulenc Ind Composition a base de solvants chlores pour l'elimination de resines photoresistantes
EP0102628A1 (fr) * 1982-09-02 1984-03-14 J.T. Baker Chemical Co. Compositions d'enlèvement et procédé pour l'enlèvement de couches photorésistantes
EP0119337A1 (fr) * 1981-11-23 1984-09-26 Ekc Technology, Inc. Composition et méthode pour l'enlèvement de couches photorésistantes
EP0163202A2 (fr) * 1984-05-21 1985-12-04 Shipley Company Inc. Agent et méthode pour le dépouillement des couches de photoréserve

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2821637A1 (de) * 1978-05-18 1979-11-22 Babcock Ag Geblaeseschlaegermuehle
US4414035A (en) * 1979-05-21 1983-11-08 Petrolite Corporation Method for the removal of asphaltenic deposits
US4426311A (en) 1980-07-07 1984-01-17 Allied Corporation Methylene chloride-methane sulfonic acid stripping compositions and methods for using same
EP0043438A3 (fr) * 1980-07-07 1982-09-29 Allied Corporation Composition ébarbante composée de chlorure de méthylène et d'acide méthanesulfonique et méthodes pour son utilisation
US4304681A (en) * 1980-09-15 1981-12-08 Shipley Company, Inc. Novel stripping composition for positive photoresists and method of using same
US4491530A (en) * 1983-05-20 1985-01-01 Allied Corporation Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper
JPS6235357A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ホトレジスト用剥離液
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US4992108A (en) * 1990-01-18 1991-02-12 Ward Irl E Photoresist stripping compositions
US5556482A (en) * 1991-01-25 1996-09-17 Ashland, Inc. Method of stripping photoresist with composition containing inhibitor
DE9304878U1 (de) * 1993-03-31 1993-06-09 Morton International, Inc., Chicago, Ill. Entschichterlösung für lichtvernetzte Photoresistschablonen
GB2282607A (en) * 1993-10-06 1995-04-12 Itac Limited Stripping compositions comprising sulphonic acid and thickener
JP3236220B2 (ja) * 1995-11-13 2001-12-10 東京応化工業株式会社 レジスト用剥離液組成物
US5728664A (en) * 1996-04-15 1998-03-17 Ashland, Inc. Photoresist stripping compositions
US7534752B2 (en) * 1996-07-03 2009-05-19 Advanced Technology Materials, Inc. Post plasma ashing wafer cleaning formulation
US6273959B1 (en) * 1996-07-08 2001-08-14 Matsushita Electric Industrial Co., Ltd. Method of cleaning semiconductor device
JP3755776B2 (ja) * 1996-07-11 2006-03-15 東京応化工業株式会社 リソグラフィー用リンス液組成物及びそれを用いた基板の処理方法
JP2001508239A (ja) * 1997-01-09 2001-06-19 アドバンスド ケミカル システムズ インターナショナル，インコーポレイテッド 水性フッ化アンモニウムおよびアミンを用いた、半導体ウエハ洗浄組成物および方法
US6755989B2 (en) * 1997-01-09 2004-06-29 Advanced Technology Materials, Inc. Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
US6896826B2 (en) 1997-01-09 2005-05-24 Advanced Technology Materials, Inc. Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
US5939336A (en) * 1998-08-21 1999-08-17 Micron Technology, Inc. Aqueous solutions of ammonium fluoride in propylene glycol and their use in the removal of etch residues from silicon substrates
US6248704B1 (en) 1999-05-03 2001-06-19 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductors devices
US6403286B1 (en) 1999-11-04 2002-06-11 Corning Incorporated High aspect ratio patterning of glass film
TWI288777B (en) * 2000-04-26 2007-10-21 Daikin Ind Ltd Detergent composition
US6475292B1 (en) * 2000-07-31 2002-11-05 Shipley Company, L.L.C. Photoresist stripping method
JP4124315B2 (ja) * 2001-05-01 2008-07-23 東京応化工業株式会社 被膜の処理方法およびこの方法を用いた半導体素子の製造方法
US6943142B2 (en) 2002-01-09 2005-09-13 Air Products And Chemicals, Inc. Aqueous stripping and cleaning composition
EP1468335A4 (fr) * 2002-01-11 2006-05-17 Az Electronic Materials Usa Composition d'agent de nettoyage destinee a une photoresine positive ou negative
JP4776191B2 (ja) * 2004-08-25 2011-09-21 関東化学株式会社 フォトレジスト残渣及びポリマー残渣除去組成物、並びにそれを用いた残渣除去方法
US7713885B2 (en) * 2005-05-11 2010-05-11 Micron Technology, Inc. Methods of etching oxide, reducing roughness, and forming capacitor constructions
WO2014160962A2 (fr) 2013-03-29 2014-10-02 Life Technologies Corporation Procédé de traitement d'un dispositif semi-conducteur
US7687447B2 (en) * 2008-03-13 2010-03-30 Air Products And Chemicals, Inc. Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid
US8940104B2 (en) 2011-08-02 2015-01-27 Brewer Science Inc. Cleaning composition for temporary wafer bonding materials
CN107429294B (zh) 2015-03-05 2021-10-26 生命技术公司 生物传感器的表面稳定
EP3274699B1 (fr) 2015-03-26 2023-12-20 Life Technologies Corporation Méthode de traitement des réseaux de capteurs de fet et dispositifs de capteurs résultants
US11054749B2 (en) 2018-05-22 2021-07-06 Versum Materials Us, Llc Photoresist stripping composition and method

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB860374A (en) * 1958-12-11 1961-02-01 Diversey U K Ltd Remover composition
US3335087A (en) * 1965-12-20 1967-08-08 Pennsalt Chemical Corp Method of stripping resins
US3335088A (en) * 1965-12-20 1967-08-08 Pennsalt Chemicals Corp Method of stripping resins
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods
DE1958857A1 (de) * 1969-11-24 1971-10-07 Eggen Kg Hans Verfahren zum Entschichten von Kopierschichten aus Polyvinylalkohol auf Aluminium-Druckplatten
US3871929A (en) * 1974-01-30 1975-03-18 Allied Chem Polymeric etch resist strippers and method of using same
FR2291607A1 (fr) * 1974-11-16 1976-06-11 Merck Patent Gmbh Agents de pelliculage pour photovernie
US3969135A (en) * 1975-02-13 1976-07-13 Oxy Metal Industries Corporation Low temperature aluminum cleaning composition and process
FR2319396A1 (fr) * 1975-08-01 1977-02-25 Allied Chem Solution a base d'acide arylsulfonique pour l'enlevement de substances polymeres organiques a partir de substrats mineraux

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA734389A (en) 1966-05-17 Pennsalt Chemicals Corporation Stripping composition and methods for its use
US1890214A (en) * 1929-05-18 1932-12-06 Aluminum Co Of America Cleaning composition
US2413365A (en) * 1944-04-13 1946-12-31 Wyandotte Chemicals Corp Cleaning composition for aluminum and aluminum alloys
US2687346A (en) * 1953-04-24 1954-08-24 Kelite Products Inc Process and composition for brightening the skin of aircraft
US3019194A (en) * 1957-02-18 1962-01-30 Alan D Brite Cleaning composition and method
GB922507A (en) 1961-09-28 1963-04-03 Continental Titanium Metals Co Improvements in and relating to the conditioning of titanium or titanium base alloys
US3574123A (en) * 1968-04-23 1971-04-06 Grace W R & Co Paint stripping composition and process
GB1279834A (en) * 1968-10-07 1972-06-28 Chugai Kasei Co Ltd Improvements in metal cleaning and etching compositions
US4009115A (en) * 1974-02-14 1977-02-22 Amchem Products, Inc. Composition and method for cleaning aluminum at low temperatures
US4116853A (en) * 1974-02-14 1978-09-26 Amchem Products, Inc. Composition for cleaning aluminum at low temperatures
US3932130A (en) * 1974-07-03 1976-01-13 Texaco Inc. Inhibition of aluminum corrosion by sulfuric acid solutions

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB860374A (en) * 1958-12-11 1961-02-01 Diversey U K Ltd Remover composition
US3335087A (en) * 1965-12-20 1967-08-08 Pennsalt Chemical Corp Method of stripping resins
US3335088A (en) * 1965-12-20 1967-08-08 Pennsalt Chemicals Corp Method of stripping resins
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods
DE1958857A1 (de) * 1969-11-24 1971-10-07 Eggen Kg Hans Verfahren zum Entschichten von Kopierschichten aus Polyvinylalkohol auf Aluminium-Druckplatten
US3871929A (en) * 1974-01-30 1975-03-18 Allied Chem Polymeric etch resist strippers and method of using same
FR2291607A1 (fr) * 1974-11-16 1976-06-11 Merck Patent Gmbh Agents de pelliculage pour photovernie
US3969135A (en) * 1975-02-13 1976-07-13 Oxy Metal Industries Corporation Low temperature aluminum cleaning composition and process
FR2319396A1 (fr) * 1975-08-01 1977-02-25 Allied Chem Solution a base d'acide arylsulfonique pour l'enlevement de substances polymeres organiques a partir de substrats mineraux

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0013310A1 (fr) * 1978-11-17 1980-07-23 Hoechst Aktiengesellschaft Procédé de fabrication d'une image photorésist
FR2455075A1 (fr) * 1979-04-24 1980-11-21 Rhone Poulenc Ind Composition a base de solvants chlores pour l'elimination de resines photoresistantes
EP0119337A1 (fr) * 1981-11-23 1984-09-26 Ekc Technology, Inc. Composition et méthode pour l'enlèvement de couches photorésistantes
EP0102628A1 (fr) * 1982-09-02 1984-03-14 J.T. Baker Chemical Co. Compositions d'enlèvement et procédé pour l'enlèvement de couches photorésistantes
EP0163202A2 (fr) * 1984-05-21 1985-12-04 Shipley Company Inc. Agent et méthode pour le dépouillement des couches de photoréserve
EP0163202A3 (en) * 1984-05-21 1986-10-01 Shipley Company Inc. Photoresist stripper

Also Published As

Publication number Publication date
JPS5344491A (en) 1978-04-21
FR2366350B1 (fr) 1982-11-12
GB1562356A (en) 1980-03-12
IT1143831B (it) 1986-10-22
DE2744027A1 (de) 1978-04-06
DE2744027C2 (de) 1986-06-05
CA1074218A (fr) 1980-03-25
US4165295A (en) 1979-08-21

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