FR2455075A1 - Composition a base de solvants chlores pour l'elimination de resines photoresistantes - Google Patents

Composition a base de solvants chlores pour l'elimination de resines photoresistantes

Info

Publication number
FR2455075A1
FR2455075A1 FR7910290A FR7910290A FR2455075A1 FR 2455075 A1 FR2455075 A1 FR 2455075A1 FR 7910290 A FR7910290 A FR 7910290A FR 7910290 A FR7910290 A FR 7910290A FR 2455075 A1 FR2455075 A1 FR 2455075A1
Authority
FR
France
Prior art keywords
acid
compsn
pref
chlorobenzene
ortho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7910290A
Other languages
English (en)
Other versions
FR2455075B1 (fr
Inventor
Michel Peignier
Marcel Hucleux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhone Poulenc Industries SA
Original Assignee
Rhone Poulenc Industries SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhone Poulenc Industries SA filed Critical Rhone Poulenc Industries SA
Priority to FR7910290A priority Critical patent/FR2455075A1/fr
Publication of FR2455075A1 publication Critical patent/FR2455075A1/fr
Application granted granted Critical
Publication of FR2455075B1 publication Critical patent/FR2455075B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)

Abstract

COMPOSITIONS POUR L'ELIMINATION DE RESINES PHOTORESISTANTES DEPOSEES SUR UN SUPPORT POUR PROTEGER UN CIRCUIT CONDUCTEUR GRAVE DANS CERTAINES PHASES DE SA FABRICATION. CES COMPOSITIONS COMPRENNENT AU MOINS 40 DE PERCHLORETHYLENE ETOU DE ORTHODICHLOROBENZENE, UN COMPOSE A CARACTERE ACIDE, ET, DE PREFERENCE, MOINS DE 40 DE CYCLOHEXANONE. CES COMPOSITIONS SONT DESTINEES A L'ELIMINATION DE RESINES PHOTOPOLYMERISEES ET UTILISEES, EN PARTICULIER, DANS L'INDUSTRIE ELECTRONIQUE.
FR7910290A 1979-04-24 1979-04-24 Composition a base de solvants chlores pour l'elimination de resines photoresistantes Granted FR2455075A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7910290A FR2455075A1 (fr) 1979-04-24 1979-04-24 Composition a base de solvants chlores pour l'elimination de resines photoresistantes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7910290A FR2455075A1 (fr) 1979-04-24 1979-04-24 Composition a base de solvants chlores pour l'elimination de resines photoresistantes

Publications (2)

Publication Number Publication Date
FR2455075A1 true FR2455075A1 (fr) 1980-11-21
FR2455075B1 FR2455075B1 (fr) 1983-02-18

Family

ID=9224637

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7910290A Granted FR2455075A1 (fr) 1979-04-24 1979-04-24 Composition a base de solvants chlores pour l'elimination de resines photoresistantes

Country Status (1)

Country Link
FR (1) FR2455075A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5374500A (en) * 1993-04-02 1994-12-20 International Business Machines Corporation Positive photoresist composition containing photoacid generator and use thereof
EP0939344A1 (fr) * 1998-02-27 1999-09-01 Kanto Kagaku Kabushiki Kaisha Composition liquide pour le décapage de films de photoréserves

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods
FR2072172A5 (fr) * 1969-12-23 1971-09-24 Ibm
US3871929A (en) * 1974-01-30 1975-03-18 Allied Chem Polymeric etch resist strippers and method of using same
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates
FR2366350A1 (fr) * 1976-10-04 1978-04-28 Allied Chem Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions
FR2370089A2 (fr) * 1976-11-08 1978-06-02 Allied Chem Produits a base d'acides arylsulfoniques et de composes aryliques chlores ou alkylaryliques, pour l'enlevement de substances polymeres organiques

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods
FR2072172A5 (fr) * 1969-12-23 1971-09-24 Ibm
US3871929A (en) * 1974-01-30 1975-03-18 Allied Chem Polymeric etch resist strippers and method of using same
FR2366350A1 (fr) * 1976-10-04 1978-04-28 Allied Chem Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates
FR2370089A2 (fr) * 1976-11-08 1978-06-02 Allied Chem Produits a base d'acides arylsulfoniques et de composes aryliques chlores ou alkylaryliques, pour l'enlevement de substances polymeres organiques

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
EXBK/77 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5374500A (en) * 1993-04-02 1994-12-20 International Business Machines Corporation Positive photoresist composition containing photoacid generator and use thereof
EP0939344A1 (fr) * 1998-02-27 1999-09-01 Kanto Kagaku Kabushiki Kaisha Composition liquide pour le décapage de films de photoréserves
US6231677B1 (en) 1998-02-27 2001-05-15 Kanto Kagaku Kabushiki Kaisha Photoresist stripping liquid composition

Also Published As

Publication number Publication date
FR2455075B1 (fr) 1983-02-18

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Legal Events

Date Code Title Description
ST Notification of lapse