FR2291607A1 - Agents de pelliculage pour photovernie - Google Patents

Agents de pelliculage pour photovernie

Info

Publication number
FR2291607A1
FR2291607A1 FR7535025A FR7535025A FR2291607A1 FR 2291607 A1 FR2291607 A1 FR 2291607A1 FR 7535025 A FR7535025 A FR 7535025A FR 7535025 A FR7535025 A FR 7535025A FR 2291607 A1 FR2291607 A1 FR 2291607A1
Authority
FR
France
Prior art keywords
photovernia
film coating
coating agents
agents
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7535025A
Other languages
English (en)
Other versions
FR2291607B3 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck Patent GmbH
Original Assignee
Merck Patent GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent GmbH filed Critical Merck Patent GmbH
Publication of FR2291607A1 publication Critical patent/FR2291607A1/fr
Application granted granted Critical
Publication of FR2291607B3 publication Critical patent/FR2291607B3/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
FR7535025A 1974-11-16 1975-11-17 Agents de pelliculage pour photovernie Granted FR2291607A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2454399A DE2454399C2 (de) 1974-11-16 1974-11-16 Ablösemittel für Fotolacke

Publications (2)

Publication Number Publication Date
FR2291607A1 true FR2291607A1 (fr) 1976-06-11
FR2291607B3 FR2291607B3 (fr) 1977-12-16

Family

ID=5931004

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7535025A Granted FR2291607A1 (fr) 1974-11-16 1975-11-17 Agents de pelliculage pour photovernie

Country Status (8)

Country Link
US (1) US4070203A (fr)
JP (1) JPS5911100B2 (fr)
BE (1) BE835591A (fr)
CH (1) CH601916A5 (fr)
DE (1) DE2454399C2 (fr)
FR (1) FR2291607A1 (fr)
GB (1) GB1491577A (fr)
IT (1) IT1052264B (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2366350A1 (fr) * 1976-10-04 1978-04-28 Allied Chem Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions
FR2370089A2 (fr) * 1976-11-08 1978-06-02 Allied Chem Produits a base d'acides arylsulfoniques et de composes aryliques chlores ou alkylaryliques, pour l'enlevement de substances polymeres organiques
EP0365988A2 (fr) * 1988-10-26 1990-05-02 E.I. Du Pont De Nemours & Company Incorporated Solvant pour le développement de couches réticulées par photopolymérisation et procédé de fabrication de formes en relief
EP0613053A1 (fr) * 1993-02-10 1994-08-31 MICROPARTS GESELLSCHAFT FÜR MIKROSTRUKTURTECHNIK mbH Procédé pour éliminer des matières plastiques de microstructures

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169068A (en) * 1976-08-20 1979-09-25 Japan Synthetic Rubber Company Limited Stripping liquor composition for removing photoresists comprising hydrogen peroxide
US4165294A (en) * 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
US4215005A (en) * 1978-01-30 1980-07-29 Allied Chemical Corporation Organic stripping compositions and method for using same
US4190461A (en) * 1978-03-20 1980-02-26 Alpha-Omega Services, Inc. Method for removing metallic seeds from nylon tubing used in interstitial brachytherapy
CA1116059A (fr) * 1978-05-22 1982-01-12 Allied Corporation Purgeur photoresistant, exempt de phenol et d'hydrocarbure chlore
US4221674A (en) * 1979-03-09 1980-09-09 Allied Chemical Corporation Organic sulfonic acid stripping composition and method with nitrile and fluoride metal corrosion inhibitor system
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
US4414035A (en) * 1979-05-21 1983-11-08 Petrolite Corporation Method for the removal of asphaltenic deposits
US4664721A (en) * 1981-12-07 1987-05-12 Intercontinental Chemical Corporation Printing screen cleaning and reclaiming compositions
US4491530A (en) * 1983-05-20 1985-01-01 Allied Corporation Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper
JPS60164498U (ja) * 1984-04-11 1985-10-31 川崎　敏明 船舶における昇降巻取り式帆走装置
JPS6235357A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ホトレジスト用剥離液
US5312719A (en) * 1988-10-26 1994-05-17 E. I. Du Pont De Nemours And Company Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US4992108A (en) * 1990-01-18 1991-02-12 Ward Irl E Photoresist stripping compositions
US5728664A (en) * 1996-04-15 1998-03-17 Ashland, Inc. Photoresist stripping compositions
KR100301680B1 (ko) 1999-06-28 2001-09-22 주식회사 동진쎄미켐 네가티브 화학증폭 레지스트용 스트리퍼 조성물
JP5195362B2 (ja) * 2008-12-03 2013-05-08 三菱電機株式会社 回路基板の製造方法および回路基板
EP2979083B1 (fr) 2013-03-29 2017-12-13 Life Technologies Corporation Procédé de traitement d'un dispositif semi-conducteur
KR20170121211A (ko) 2015-03-05 2017-11-01 라이프 테크놀로지스 코포레이션 바이오센서의 표면 안정화
CN107530739B (zh) 2015-03-26 2021-04-27 生命技术公司 用于处理半导体传感器阵列装置的方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2607741A (en) * 1952-08-19 Offiol
US985405A (en) * 1907-03-30 1911-02-28 Chadeloid Chemical Co Paint or varnish remover.
US1185641A (en) * 1911-10-10 1916-06-06 Chadeloid Chemical Co Finish-removing process.
US2750343A (en) * 1952-04-12 1956-06-12 Adolph J Beber Paint brush cleaner
US3179609A (en) * 1958-09-25 1965-04-20 Union Carbide Corp Finish removal formulation
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods
US3574123A (en) * 1968-04-23 1971-04-06 Grace W R & Co Paint stripping composition and process
US3592691A (en) * 1968-07-11 1971-07-13 Westinghouse Electric Corp Photoresist removal method
US3625763A (en) * 1968-12-04 1971-12-07 Bunker Ramo Conformal coating stripping method and composition
US3629004A (en) * 1969-04-17 1971-12-21 Grace W R & Co Paint-removing method
US3813309A (en) * 1969-12-23 1974-05-28 Ibm Method for stripping resists from substrates
DE2007693B2 (de) * 1970-02-19 1976-12-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zum lokalen abaetzen einer auf einem halbleiterkoerper aufgebrachten siliciumnitridschicht

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2366350A1 (fr) * 1976-10-04 1978-04-28 Allied Chem Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions
FR2370089A2 (fr) * 1976-11-08 1978-06-02 Allied Chem Produits a base d'acides arylsulfoniques et de composes aryliques chlores ou alkylaryliques, pour l'enlevement de substances polymeres organiques
EP0365988A2 (fr) * 1988-10-26 1990-05-02 E.I. Du Pont De Nemours & Company Incorporated Solvant pour le développement de couches réticulées par photopolymérisation et procédé de fabrication de formes en relief
EP0365988A3 (en) * 1988-10-26 1990-12-12 Hoechst Aktiengesellschaft Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms
EP0613053A1 (fr) * 1993-02-10 1994-08-31 MICROPARTS GESELLSCHAFT FÜR MIKROSTRUKTURTECHNIK mbH Procédé pour éliminer des matières plastiques de microstructures
US5631303A (en) * 1993-02-10 1997-05-20 Microparts Process for removing plastics from microstructures

Also Published As

Publication number Publication date
CH601916A5 (fr) 1978-07-14
US4070203A (en) 1978-01-24
DE2454399C2 (de) 1981-09-24
GB1491577A (en) 1977-11-09
JPS5911100B2 (ja) 1984-03-13
FR2291607B3 (fr) 1977-12-16
IT1052264B (it) 1981-06-20
DE2454399A1 (de) 1976-05-26
JPS5172503A (en) 1976-06-23
BE835591A (fr) 1976-05-14

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