IT1052264B - Agente di distacco per fotoresist e procedimento per la sua produzione - Google Patents
Agente di distacco per fotoresist e procedimento per la sua produzioneInfo
- Publication number
- IT1052264B IT1052264B IT52225/75A IT5222575A IT1052264B IT 1052264 B IT1052264 B IT 1052264B IT 52225/75 A IT52225/75 A IT 52225/75A IT 5222575 A IT5222575 A IT 5222575A IT 1052264 B IT1052264 B IT 1052264B
- Authority
- IT
- Italy
- Prior art keywords
- photoresist
- procedure
- production
- release agent
- release
- Prior art date
Links
- 229920002120 photoresistant polymer Polymers 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2454399A DE2454399C2 (de) | 1974-11-16 | 1974-11-16 | Ablösemittel für Fotolacke |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1052264B true IT1052264B (it) | 1981-06-20 |
Family
ID=5931004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT52225/75A IT1052264B (it) | 1974-11-16 | 1975-11-14 | Agente di distacco per fotoresist e procedimento per la sua produzione |
Country Status (8)
Country | Link |
---|---|
US (1) | US4070203A (it) |
JP (1) | JPS5911100B2 (it) |
BE (1) | BE835591A (it) |
CH (1) | CH601916A5 (it) |
DE (1) | DE2454399C2 (it) |
FR (1) | FR2291607A1 (it) |
GB (1) | GB1491577A (it) |
IT (1) | IT1052264B (it) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4169068A (en) * | 1976-08-20 | 1979-09-25 | Japan Synthetic Rubber Company Limited | Stripping liquor composition for removing photoresists comprising hydrogen peroxide |
US4165295A (en) * | 1976-10-04 | 1979-08-21 | Allied Chemical Corporation | Organic stripping compositions and method for using same |
US4242218A (en) * | 1976-11-08 | 1980-12-30 | Allied Chemical Corporation | Phenol-free photoresist stripper |
US4165294A (en) * | 1976-11-08 | 1979-08-21 | Allied Chemical Corporation | Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids |
US4215005A (en) * | 1978-01-30 | 1980-07-29 | Allied Chemical Corporation | Organic stripping compositions and method for using same |
US4190461A (en) * | 1978-03-20 | 1980-02-26 | Alpha-Omega Services, Inc. | Method for removing metallic seeds from nylon tubing used in interstitial brachytherapy |
CA1116059A (en) * | 1978-05-22 | 1982-01-12 | Allied Corporation | Phenol-free and chlorinated hydrocarbon-free photoresist stripper |
US4221674A (en) * | 1979-03-09 | 1980-09-09 | Allied Chemical Corporation | Organic sulfonic acid stripping composition and method with nitrile and fluoride metal corrosion inhibitor system |
US4187191A (en) * | 1978-07-26 | 1980-02-05 | General Motors Corporation | Photoresist stripper with dodecylsulfonic acid and chlorinated solvents |
US4414035A (en) * | 1979-05-21 | 1983-11-08 | Petrolite Corporation | Method for the removal of asphaltenic deposits |
US4664721A (en) * | 1981-12-07 | 1987-05-12 | Intercontinental Chemical Corporation | Printing screen cleaning and reclaiming compositions |
US4491530A (en) * | 1983-05-20 | 1985-01-01 | Allied Corporation | Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper |
JPS60164498U (ja) * | 1984-04-11 | 1985-10-31 | 川崎 敏明 | 船舶における昇降巻取り式帆走装置 |
JPS6235357A (ja) * | 1985-08-09 | 1987-02-16 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト用剥離液 |
DE3836403A1 (de) * | 1988-10-26 | 1990-05-03 | Hoechst Ag | Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen |
US5312719A (en) * | 1988-10-26 | 1994-05-17 | E. I. Du Pont De Nemours And Company | Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms |
US4971715A (en) * | 1988-11-18 | 1990-11-20 | International Business Machines Corporation | Phenolic-free stripping composition and use thereof |
US4992108A (en) * | 1990-01-18 | 1991-02-12 | Ward Irl E | Photoresist stripping compositions |
DE4303923A1 (de) * | 1993-02-10 | 1994-08-11 | Microparts Gmbh | Verfahren zum Beseitigen von Kunststoffen aus Mikrostrukturen |
US5728664A (en) * | 1996-04-15 | 1998-03-17 | Ashland, Inc. | Photoresist stripping compositions |
KR100301680B1 (ko) | 1999-06-28 | 2001-09-22 | 주식회사 동진쎄미켐 | 네가티브 화학증폭 레지스트용 스트리퍼 조성물 |
WO2014160962A2 (en) | 2013-03-29 | 2014-10-02 | Life Technologies Corporation | Method for treating a semiconductor device |
JP5195362B2 (ja) * | 2008-12-03 | 2013-05-08 | 三菱電機株式会社 | 回路基板の製造方法および回路基板 |
ES2924907T3 (es) | 2015-03-05 | 2022-10-11 | Life Technologies Corp | Estabilización superficial de biosensores |
CN107530739B (zh) | 2015-03-26 | 2021-04-27 | 生命技术公司 | 用于处理半导体传感器阵列装置的方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2607741A (en) * | 1952-08-19 | Offiol | ||
US985405A (en) * | 1907-03-30 | 1911-02-28 | Chadeloid Chemical Co | Paint or varnish remover. |
US1185641A (en) * | 1911-10-10 | 1916-06-06 | Chadeloid Chemical Co | Finish-removing process. |
US2750343A (en) * | 1952-04-12 | 1956-06-12 | Adolph J Beber | Paint brush cleaner |
US3179609A (en) * | 1958-09-25 | 1965-04-20 | Union Carbide Corp | Finish removal formulation |
US3582401A (en) * | 1967-11-15 | 1971-06-01 | Mallinckrodt Chemical Works | Photosensitive resist remover compositions and methods |
US3574123A (en) * | 1968-04-23 | 1971-04-06 | Grace W R & Co | Paint stripping composition and process |
US3592691A (en) * | 1968-07-11 | 1971-07-13 | Westinghouse Electric Corp | Photoresist removal method |
US3625763A (en) * | 1968-12-04 | 1971-12-07 | Bunker Ramo | Conformal coating stripping method and composition |
US3629004A (en) * | 1969-04-17 | 1971-12-21 | Grace W R & Co | Paint-removing method |
US3813309A (en) * | 1969-12-23 | 1974-05-28 | Ibm | Method for stripping resists from substrates |
DE2007693B2 (de) * | 1970-02-19 | 1976-12-16 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum lokalen abaetzen einer auf einem halbleiterkoerper aufgebrachten siliciumnitridschicht |
-
1974
- 1974-11-16 DE DE2454399A patent/DE2454399C2/de not_active Expired
-
1975
- 1975-10-31 GB GB45300/75A patent/GB1491577A/en not_active Expired
- 1975-11-13 US US05/631,660 patent/US4070203A/en not_active Expired - Lifetime
- 1975-11-14 CH CH1482275A patent/CH601916A5/xx not_active IP Right Cessation
- 1975-11-14 IT IT52225/75A patent/IT1052264B/it active
- 1975-11-14 BE BE161887A patent/BE835591A/xx not_active IP Right Cessation
- 1975-11-15 JP JP50137686A patent/JPS5911100B2/ja not_active Expired
- 1975-11-17 FR FR7535025A patent/FR2291607A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5911100B2 (ja) | 1984-03-13 |
JPS5172503A (en) | 1976-06-23 |
FR2291607B3 (it) | 1977-12-16 |
DE2454399A1 (de) | 1976-05-26 |
DE2454399C2 (de) | 1981-09-24 |
BE835591A (fr) | 1976-05-14 |
GB1491577A (en) | 1977-11-09 |
FR2291607A1 (fr) | 1976-06-11 |
CH601916A5 (it) | 1978-07-14 |
US4070203A (en) | 1978-01-24 |
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