FR2360916A1 - Procede pour ajuster un substrat en forme de disque par rapport a un masque photosensible dans un appareil d'exposition au rayonnement x - Google Patents

Procede pour ajuster un substrat en forme de disque par rapport a un masque photosensible dans un appareil d'exposition au rayonnement x

Info

Publication number
FR2360916A1
FR2360916A1 FR7723760A FR7723760A FR2360916A1 FR 2360916 A1 FR2360916 A1 FR 2360916A1 FR 7723760 A FR7723760 A FR 7723760A FR 7723760 A FR7723760 A FR 7723760A FR 2360916 A1 FR2360916 A1 FR 2360916A1
Authority
FR
France
Prior art keywords
disc
adjusting
exposure apparatus
shaped substrate
photosensitive mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7723760A
Other languages
English (en)
French (fr)
Other versions
FR2360916B1 (en:Method
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of FR2360916A1 publication Critical patent/FR2360916A1/fr
Application granted granted Critical
Publication of FR2360916B1 publication Critical patent/FR2360916B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR7723760A 1976-08-05 1977-08-02 Procede pour ajuster un substrat en forme de disque par rapport a un masque photosensible dans un appareil d'exposition au rayonnement x Granted FR2360916A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762635275 DE2635275C2 (de) 1976-08-05 1976-08-05 Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät

Publications (2)

Publication Number Publication Date
FR2360916A1 true FR2360916A1 (fr) 1978-03-03
FR2360916B1 FR2360916B1 (en:Method) 1982-05-21

Family

ID=5984815

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7723760A Granted FR2360916A1 (fr) 1976-08-05 1977-08-02 Procede pour ajuster un substrat en forme de disque par rapport a un masque photosensible dans un appareil d'exposition au rayonnement x

Country Status (7)

Country Link
JP (1) JPS5318970A (en:Method)
BE (1) BE857539A (en:Method)
DE (1) DE2635275C2 (en:Method)
FR (1) FR2360916A1 (en:Method)
GB (1) GB1589286A (en:Method)
IT (1) IT1081184B (en:Method)
NL (1) NL7708652A (en:Method)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure
JP7497649B2 (ja) * 2020-08-25 2024-06-11 セイコーエプソン株式会社 液体噴射装置、液体噴射装置のメンテナンス方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2295452A2 (fr) * 1974-12-21 1976-07-16 Ibm Procede et dispositif de projection d'images sur une plaquette semiconductrice
FR2350628A1 (fr) * 1976-05-03 1977-12-02 Hughes Aircraft Co Procede d'alignement d'un cache a l'aide de reperes

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804923A1 (de) * 1967-10-27 1969-07-31 Hilger & Watts Ltd Verfahren und Vorrichtung zur Reproduktion eines Musters von einem ebenen Koerper auf einen zweiten ebenen Koerper
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2295452A2 (fr) * 1974-12-21 1976-07-16 Ibm Procede et dispositif de projection d'images sur une plaquette semiconductrice
FR2350628A1 (fr) * 1976-05-03 1977-12-02 Hughes Aircraft Co Procede d'alignement d'un cache a l'aide de reperes

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NV700/76 *

Also Published As

Publication number Publication date
DE2635275A1 (de) 1978-02-09
FR2360916B1 (en:Method) 1982-05-21
NL7708652A (nl) 1978-02-07
JPS5318970A (en) 1978-02-21
DE2635275C2 (de) 1984-09-06
GB1589286A (en) 1981-05-07
BE857539A (fr) 1977-12-01
IT1081184B (it) 1985-05-16

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Legal Events

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