JPS5318970A - Method of aligning relative position of substrate and photo mask - Google Patents

Method of aligning relative position of substrate and photo mask

Info

Publication number
JPS5318970A
JPS5318970A JP9330377A JP9330377A JPS5318970A JP S5318970 A JPS5318970 A JP S5318970A JP 9330377 A JP9330377 A JP 9330377A JP 9330377 A JP9330377 A JP 9330377A JP S5318970 A JPS5318970 A JP S5318970A
Authority
JP
Japan
Prior art keywords
substrate
relative position
photo mask
aligning relative
aligning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9330377A
Other languages
English (en)
Inventor
Furiidoritsuhi Hansu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS5318970A publication Critical patent/JPS5318970A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9330377A 1976-08-05 1977-08-03 Method of aligning relative position of substrate and photo mask Pending JPS5318970A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762635275 DE2635275C2 (de) 1976-08-05 1976-08-05 Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät

Publications (1)

Publication Number Publication Date
JPS5318970A true JPS5318970A (en) 1978-02-21

Family

ID=5984815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9330377A Pending JPS5318970A (en) 1976-08-05 1977-08-03 Method of aligning relative position of substrate and photo mask

Country Status (7)

Country Link
JP (1) JPS5318970A (ja)
BE (1) BE857539A (ja)
DE (1) DE2635275C2 (ja)
FR (1) FR2360916A1 (ja)
GB (1) GB1589286A (ja)
IT (1) IT1081184B (ja)
NL (1) NL7708652A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3657545A (en) * 1967-10-27 1972-04-18 Rank Organisation Ltd Method and apparatus for reproducing a pattern from one planar element upon another planar element
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
DE2460914C2 (de) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographische Projektionsvorrichtung
US4085329A (en) * 1976-05-03 1978-04-18 Hughes Aircraft Company Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure
JPS6214935B2 (ja) * 1979-10-11 1987-04-04 Nippon Telegraph & Telephone

Also Published As

Publication number Publication date
BE857539A (fr) 1977-12-01
FR2360916A1 (fr) 1978-03-03
GB1589286A (en) 1981-05-07
IT1081184B (it) 1985-05-16
NL7708652A (nl) 1978-02-07
DE2635275A1 (de) 1978-02-09
DE2635275C2 (de) 1984-09-06
FR2360916B1 (ja) 1982-05-21

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