FR2330030B1 - - Google Patents
Info
- Publication number
- FR2330030B1 FR2330030B1 FR7533464A FR7533464A FR2330030B1 FR 2330030 B1 FR2330030 B1 FR 2330030B1 FR 7533464 A FR7533464 A FR 7533464A FR 7533464 A FR7533464 A FR 7533464A FR 2330030 B1 FR2330030 B1 FR 2330030B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7533464A FR2330030A1 (fr) | 1975-10-31 | 1975-10-31 | Nouvel appareil photorepeteur de masques de haute precision |
| US05/735,890 US4084903A (en) | 1975-10-31 | 1976-10-26 | High-precision mask photorepeater |
| NL7612028A NL7612028A (nl) | 1975-10-31 | 1976-10-29 | Inrichting voor het fotografisch aanbrengen van een masker. |
| GB45178/76A GB1556028A (en) | 1975-10-31 | 1976-10-29 | High precision mask photorepeater |
| DE19762649687 DE2649687A1 (de) | 1975-10-31 | 1976-10-29 | Maskenfotouebertrager |
| JP13114776A JPS5255472A (en) | 1975-10-31 | 1976-10-30 | Mask photo repeater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7533464A FR2330030A1 (fr) | 1975-10-31 | 1975-10-31 | Nouvel appareil photorepeteur de masques de haute precision |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2330030A1 FR2330030A1 (fr) | 1977-05-27 |
| FR2330030B1 true FR2330030B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1979-05-04 |
Family
ID=9161914
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7533464A Granted FR2330030A1 (fr) | 1975-10-31 | 1975-10-31 | Nouvel appareil photorepeteur de masques de haute precision |
Country Status (6)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4298273A (en) | 1978-10-20 | 1981-11-03 | Hitachi, Ltd. | Projection aligner and method of positioning a wafer |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2429447A1 (fr) * | 1978-06-23 | 1980-01-18 | Thomson Csf | Systeme optique de projection muni d'un positionneur de plaque |
| US4198159A (en) * | 1978-12-29 | 1980-04-15 | International Business Machines Corporation | Optical alignment system in projection printing |
| DE3070825D1 (en) * | 1979-04-02 | 1985-08-08 | Eaton Optimetrix Inc | A system for positioning a utilization device |
| US4540278A (en) * | 1979-04-02 | 1985-09-10 | Optimetrix Corporation | Optical focusing system |
| DE2915313A1 (de) * | 1979-04-14 | 1980-10-23 | Ibm Deutschland | Piezoelektrische antriebsanordnung, insbesondere fuer fokussiersysteme |
| DE3110341C2 (de) * | 1980-03-19 | 1983-11-17 | Hitachi, Ltd., Tokyo | Verfahren und Vorrichtung zum Ausrichten eines dünnen Substrats in der Bildebene eines Kopiergerätes |
| US4344160A (en) * | 1980-05-02 | 1982-08-10 | The Perkin-Elmer Corporation | Automatic wafer focusing and flattening system |
| JPS58500730A (ja) * | 1981-05-15 | 1983-05-06 | ゼネラル シグナル コ−ポレ−シヨン | 一連の像を半導体ウエ−ハのダイス体上に投影するための装置 |
| US4391494A (en) * | 1981-05-15 | 1983-07-05 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| US4425037A (en) | 1981-05-15 | 1984-01-10 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| JPS5830128A (ja) * | 1981-08-17 | 1983-02-22 | Hitachi Ltd | ウエハのチヤツク装置 |
| US4431304A (en) * | 1981-11-25 | 1984-02-14 | Mayer Herbert E | Apparatus for the projection copying of mask patterns on a workpiece |
| JPS5885338U (ja) * | 1981-12-07 | 1983-06-09 | 株式会社日立製作所 | 自動焦点装置 |
| JPS58156937A (ja) * | 1982-03-12 | 1983-09-19 | Hitachi Ltd | 露光装置 |
| JPS58179834A (ja) * | 1982-04-14 | 1983-10-21 | Canon Inc | 投影露光装置及び方法 |
| US4444492A (en) * | 1982-05-15 | 1984-04-24 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| US4504144A (en) * | 1982-07-06 | 1985-03-12 | The Perkin-Elmer Corporation | Simple electromechanical tilt and focus device |
| JPS5975625A (ja) * | 1982-10-22 | 1984-04-28 | Fujitsu Ltd | 基板支持方法 |
| US4441808A (en) * | 1982-11-15 | 1984-04-10 | Tre Semiconductor Equipment Corp. | Focusing device for photo-exposure system |
| JPS59154023A (ja) * | 1983-02-22 | 1984-09-03 | Nippon Kogaku Kk <Nikon> | 板状体の姿勢制御装置 |
| JPS59155919A (ja) * | 1983-02-25 | 1984-09-05 | Hitachi Ltd | 自動焦点合せ方法およびその装置 |
| JPS59169134A (ja) * | 1983-03-16 | 1984-09-25 | Hitachi Ltd | 縮小投影露光装置 |
| JPS6018918A (ja) * | 1983-07-13 | 1985-01-31 | Canon Inc | ステージ装置 |
| US4600282A (en) * | 1983-11-14 | 1986-07-15 | Canon Kabushiki Kaisha | Alignment apparatus |
| JPS60105232A (ja) * | 1983-11-14 | 1985-06-10 | Canon Inc | 自動焦点合わせ装置 |
| JP2516194B2 (ja) * | 1984-06-11 | 1996-07-10 | 株式会社日立製作所 | 投影露光方法 |
| US4708467A (en) * | 1984-09-21 | 1987-11-24 | Cameronics Technology Corporation, Ltd. | Camera |
| DE3447488A1 (de) * | 1984-10-19 | 1986-05-07 | Canon K.K., Tokio/Tokyo | Projektionseinrichtung |
| JPH0618168B2 (ja) * | 1985-02-27 | 1994-03-09 | 株式会社日立製作所 | 原画パターンを半導体ウエハ上面に露光する露光方法 |
| US4714331A (en) * | 1985-03-25 | 1987-12-22 | Canon Kabushiki Kaisha | Method and apparatus for automatic focusing |
| US4624553A (en) * | 1985-05-28 | 1986-11-25 | Harvey Alwood E | Photographic enlarger apparatus with critical focusing platform for photosensitive medium |
| JPS61278141A (ja) * | 1985-05-31 | 1986-12-09 | Canon Inc | 投影倍率調整方法 |
| US4669868A (en) * | 1986-04-18 | 1987-06-02 | Ovonic Imaging Systems, Inc. | Step and repeat exposure apparatus and method |
| JPS63172148A (ja) * | 1987-01-12 | 1988-07-15 | Hitachi Ltd | 基板表面変形装置 |
| WO1989006376A1 (en) * | 1987-12-30 | 1989-07-13 | Hampshire Instruments, Inc. | Positioning subassembly for a lithography machine |
| JPH02228658A (ja) * | 1989-03-01 | 1990-09-11 | Nec Kyushu Ltd | 縮小投影型露光装置 |
| US5087927A (en) * | 1990-01-31 | 1992-02-11 | Ateo Corporation | On-axis air gage focus system |
| JP3401769B2 (ja) * | 1993-12-28 | 2003-04-28 | 株式会社ニコン | 露光方法、ステージ装置、及び露光装置 |
| KR19980019031A (ko) | 1996-08-27 | 1998-06-05 | 고노 시게오 | 스테이지 장치(a stage apparatus) |
| JPH10270535A (ja) * | 1997-03-25 | 1998-10-09 | Nikon Corp | 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2030468A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1969-01-29 | 1970-11-13 | Thomson Brandt Csf | |
| US3704946A (en) * | 1969-02-20 | 1972-12-05 | Opt Omechanisms Inc | Microcircuit art generating means |
| DE2025280A1 (de) * | 1970-05-23 | 1971-12-09 | Licentia Patent Verwaltungs GmbH, 6000 Frankfurt | Halterung fur ein Objektiv |
| US3704657A (en) * | 1971-05-05 | 1972-12-05 | Computervision Corp | Adaptive optical focusing system |
| FR2223865B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-03-27 | 1978-10-20 | Thomson Csf | |
| SU497551A1 (ru) * | 1973-06-26 | 1975-12-30 | Московский институт электронной техники | Устройство дл ориентации |
| DE2413551C2 (de) * | 1974-03-21 | 1985-03-21 | Western Electric Co., Inc., New York, N.Y. | Einrichtung zum Korrigieren der Lage einer lichtempfindlichen Fläche in einer Masken-Projektionsvorrichtung |
-
1975
- 1975-10-31 FR FR7533464A patent/FR2330030A1/fr active Granted
-
1976
- 1976-10-26 US US05/735,890 patent/US4084903A/en not_active Expired - Lifetime
- 1976-10-29 DE DE19762649687 patent/DE2649687A1/de not_active Withdrawn
- 1976-10-29 NL NL7612028A patent/NL7612028A/xx not_active Application Discontinuation
- 1976-10-29 GB GB45178/76A patent/GB1556028A/en not_active Expired
- 1976-10-30 JP JP13114776A patent/JPS5255472A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4298273A (en) | 1978-10-20 | 1981-11-03 | Hitachi, Ltd. | Projection aligner and method of positioning a wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| US4084903A (en) | 1978-04-18 |
| DE2649687A1 (de) | 1977-05-05 |
| FR2330030A1 (fr) | 1977-05-27 |
| JPS5255472A (en) | 1977-05-06 |
| GB1556028A (en) | 1979-11-14 |
| NL7612028A (nl) | 1977-05-03 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |