FR2221754A1 - Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate - Google Patents
Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrateInfo
- Publication number
- FR2221754A1 FR2221754A1 FR7404782A FR7404782A FR2221754A1 FR 2221754 A1 FR2221754 A1 FR 2221754A1 FR 7404782 A FR7404782 A FR 7404782A FR 7404782 A FR7404782 A FR 7404782A FR 2221754 A1 FR2221754 A1 FR 2221754A1
- Authority
- FR
- France
- Prior art keywords
- substrate
- carboxylic acid
- prodn
- lacquer
- good adhesion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34212373A | 1973-03-16 | 1973-03-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2221754A1 true FR2221754A1 (en) | 1974-10-11 |
FR2221754B1 FR2221754B1 (fr) | 1977-09-23 |
Family
ID=23340434
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7404782A Granted FR2221754A1 (en) | 1973-03-16 | 1974-02-12 | Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS49123323A (fr) |
DE (1) | DE2410880A1 (fr) |
FR (1) | FR2221754A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1085212A (fr) * | 1975-05-27 | 1980-09-09 | Ronald H. Engebrecht | Masques contenant des diazothydrures quinoniques, ameliores par l'emploi d'acides carboxyliques volatils |
US4510230A (en) * | 1982-04-12 | 1985-04-09 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements containing acid to reduce scum and stain formation |
JPS60191237A (ja) * | 1984-03-13 | 1985-09-28 | Asahi Chem Ind Co Ltd | 露光硬化後非粘着性感光性樹脂組成物 |
JP2823104B2 (ja) * | 1992-04-14 | 1998-11-11 | 宇部興産株式会社 | 感光性組成物 |
JP5412039B2 (ja) * | 2008-02-06 | 2014-02-12 | 日立化成株式会社 | 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
JPWO2012133617A1 (ja) * | 2011-03-30 | 2014-07-28 | 日本ゼオン株式会社 | 樹脂組成物および半導体素子基板 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3118767A (en) * | 1958-12-30 | 1964-01-21 | Gen Aniline & Film Corp | Photopolymerization of vinyl monomers with metal oxides as catalysts |
US3157501A (en) * | 1960-09-26 | 1964-11-17 | Gen Aniline & Film Corp | Production of dyed polymeric images |
FR1528489A (fr) * | 1966-07-01 | 1968-06-07 | Eastman Kodak Co | Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique |
-
1974
- 1974-02-12 FR FR7404782A patent/FR2221754A1/fr active Granted
- 1974-02-20 JP JP1961074A patent/JPS49123323A/ja active Pending
- 1974-03-07 DE DE19742410880 patent/DE2410880A1/de active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3118767A (en) * | 1958-12-30 | 1964-01-21 | Gen Aniline & Film Corp | Photopolymerization of vinyl monomers with metal oxides as catalysts |
US3157501A (en) * | 1960-09-26 | 1964-11-17 | Gen Aniline & Film Corp | Production of dyed polymeric images |
FR1528489A (fr) * | 1966-07-01 | 1968-06-07 | Eastman Kodak Co | Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique |
Also Published As
Publication number | Publication date |
---|---|
FR2221754B1 (fr) | 1977-09-23 |
JPS49123323A (fr) | 1974-11-26 |
DE2410880A1 (de) | 1974-09-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |