DE2410880A1 - Verfahren zum herstellen eines maskierenden musters aus photolack - Google Patents

Verfahren zum herstellen eines maskierenden musters aus photolack

Info

Publication number
DE2410880A1
DE2410880A1 DE19742410880 DE2410880A DE2410880A1 DE 2410880 A1 DE2410880 A1 DE 2410880A1 DE 19742410880 DE19742410880 DE 19742410880 DE 2410880 A DE2410880 A DE 2410880A DE 2410880 A1 DE2410880 A1 DE 2410880A1
Authority
DE
Germany
Prior art keywords
photoresist
acid
carboxylic acid
substrate
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19742410880
Other languages
German (de)
English (en)
Inventor
Leon H Kaplan
John Baldwin Lounsbury
Steven Michael Zimmerman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2410880A1 publication Critical patent/DE2410880A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE19742410880 1973-03-16 1974-03-07 Verfahren zum herstellen eines maskierenden musters aus photolack Pending DE2410880A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US34212373A 1973-03-16 1973-03-16

Publications (1)

Publication Number Publication Date
DE2410880A1 true DE2410880A1 (de) 1974-09-19

Family

ID=23340434

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19742410880 Pending DE2410880A1 (de) 1973-03-16 1974-03-07 Verfahren zum herstellen eines maskierenden musters aus photolack

Country Status (3)

Country Link
JP (1) JPS49123323A (fr)
DE (1) DE2410880A1 (fr)
FR (1) FR2221754A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623790A1 (de) * 1975-05-27 1976-12-23 Eastman Kodak Co Lichtempfindliche masse fuer die erzeugung von photoresistschichten und lichtempfindlichen aufzeichnungsmaterialien
EP0154994A2 (fr) * 1984-03-13 1985-09-18 Asahi Kasei Kogyo Kabushiki Kaisha Composition résineuse photosensible améliorée ayant une surface non poisseuse et méthode d'utilisation
EP0193621A1 (fr) * 1982-04-12 1986-09-10 E.I. Du Pont De Nemours And Company Compositions et éléments photopolymérisables contenant des acides pour réduire la formation de mousses et de souillures

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2823104B2 (ja) * 1992-04-14 1998-11-11 宇部興産株式会社 感光性組成物
JP5412039B2 (ja) * 2008-02-06 2014-02-12 日立化成株式会社 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法
CN103443707A (zh) * 2011-03-30 2013-12-11 日本瑞翁株式会社 树脂组合物和半导体元件基板

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE582954A (fr) * 1958-12-30
BE605776A (fr) * 1960-09-26
FR1528489A (fr) * 1966-07-01 1968-06-07 Eastman Kodak Co Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623790A1 (de) * 1975-05-27 1976-12-23 Eastman Kodak Co Lichtempfindliche masse fuer die erzeugung von photoresistschichten und lichtempfindlichen aufzeichnungsmaterialien
EP0193621A1 (fr) * 1982-04-12 1986-09-10 E.I. Du Pont De Nemours And Company Compositions et éléments photopolymérisables contenant des acides pour réduire la formation de mousses et de souillures
EP0154994A2 (fr) * 1984-03-13 1985-09-18 Asahi Kasei Kogyo Kabushiki Kaisha Composition résineuse photosensible améliorée ayant une surface non poisseuse et méthode d'utilisation
EP0154994A3 (en) * 1984-03-13 1986-01-22 Asahi Kasei Kogyo Kabushiki Kaisha A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method
US4716094A (en) * 1984-03-13 1987-12-29 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method

Also Published As

Publication number Publication date
FR2221754A1 (en) 1974-10-11
FR2221754B1 (fr) 1977-09-23
JPS49123323A (fr) 1974-11-26

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Legal Events

Date Code Title Description
OHJ Non-payment of the annual fee