FR1528489A - Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique - Google Patents

Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique

Info

Publication number
FR1528489A
FR1528489A FR111589A FR111589A FR1528489A FR 1528489 A FR1528489 A FR 1528489A FR 111589 A FR111589 A FR 111589A FR 111589 A FR111589 A FR 111589A FR 1528489 A FR1528489 A FR 1528489A
Authority
FR
France
Prior art keywords
boards
preparation
compositions useful
photosensitive compositions
new photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR111589A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Priority to FR111589A priority Critical patent/FR1528489A/fr
Application granted granted Critical
Publication of FR1528489A publication Critical patent/FR1528489A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
FR111589A 1966-07-01 1967-06-23 Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique Expired FR1528489A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR111589A FR1528489A (fr) 1966-07-01 1967-06-23 Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56210466A 1966-07-01 1966-07-01
FR111589A FR1528489A (fr) 1966-07-01 1967-06-23 Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique

Publications (1)

Publication Number Publication Date
FR1528489A true FR1528489A (fr) 1968-06-07

Family

ID=26177564

Family Applications (1)

Application Number Title Priority Date Filing Date
FR111589A Expired FR1528489A (fr) 1966-07-01 1967-06-23 Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique

Country Status (1)

Country Link
FR (1) FR1528489A (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2221754A1 (en) * 1973-03-16 1974-10-11 Ibm Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate
EP0164022A2 (fr) * 1984-06-04 1985-12-11 Dainippon Screen Mfg., Co., Ltd. Procédé pour obtenir des couches résistantes à la corrosion sur support en cuivre ou alliage de cuivre
EP0193621A1 (fr) * 1982-04-12 1986-09-10 E.I. Du Pont De Nemours And Company Compositions et éléments photopolymérisables contenant des acides pour réduire la formation de mousses et de souillures
EP0204415A2 (fr) * 1985-04-24 1986-12-10 Nippon Paint Co., Ltd. Procédé pour la fabrication de circuits imprimés

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2221754A1 (en) * 1973-03-16 1974-10-11 Ibm Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate
EP0193621A1 (fr) * 1982-04-12 1986-09-10 E.I. Du Pont De Nemours And Company Compositions et éléments photopolymérisables contenant des acides pour réduire la formation de mousses et de souillures
EP0164022A2 (fr) * 1984-06-04 1985-12-11 Dainippon Screen Mfg., Co., Ltd. Procédé pour obtenir des couches résistantes à la corrosion sur support en cuivre ou alliage de cuivre
EP0164022A3 (fr) * 1984-06-04 1986-12-03 Dainippon Screen Mfg., Co., Ltd. Procédé pour obtenir des couches résistantes à la corrosion sur support en cuivre ou alliage de cuivre
EP0204415A2 (fr) * 1985-04-24 1986-12-10 Nippon Paint Co., Ltd. Procédé pour la fabrication de circuits imprimés
EP0204415A3 (en) * 1985-04-24 1987-10-28 Nippon Paint Co., Ltd. A method for preparing a printed circuit board

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