CA918484A - Technique for the preparation of thermally stable photoresist - Google Patents
Technique for the preparation of thermally stable photoresistInfo
- Publication number
- CA918484A CA918484A CA079001A CA79001A CA918484A CA 918484 A CA918484 A CA 918484A CA 079001 A CA079001 A CA 079001A CA 79001 A CA79001 A CA 79001A CA 918484 A CA918484 A CA 918484A
- Authority
- CA
- Canada
- Prior art keywords
- technique
- preparation
- thermally stable
- stable photoresist
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US84377969A | 1969-07-22 | 1969-07-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA918484A true CA918484A (en) | 1973-01-09 |
Family
ID=25290992
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA079001A Expired CA918484A (en) | 1969-07-22 | 1970-04-02 | Technique for the preparation of thermally stable photoresist |
Country Status (8)
Country | Link |
---|---|
US (1) | US3623870A (en) |
JP (1) | JPS4917374B1 (en) |
BE (1) | BE753624A (en) |
CA (1) | CA918484A (en) |
FR (1) | FR2055193A5 (en) |
GB (1) | GB1316976A (en) |
NL (1) | NL144064B (en) |
SE (1) | SE365877B (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4093461A (en) * | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
US4055515A (en) * | 1975-12-31 | 1977-10-25 | Borden, Inc. | Developer for printing plates |
US4180404A (en) * | 1977-11-17 | 1979-12-25 | Asahi Kasei Kogyo Kabushiki Kaisha | Heat resistant photoresist composition and process for preparing the same |
US4208477A (en) * | 1977-12-26 | 1980-06-17 | Asahi Kasei Kogyo Kabushiki Kaisha | Heat resistant photoresist composition and process for preparing the same |
DE2967162D1 (en) * | 1978-09-29 | 1984-09-13 | Hitachi Ltd | Light-sensitive polymer composition |
US4331705A (en) | 1979-05-11 | 1982-05-25 | Minnesota Mining And Manufacturing Company | Curing of polyamic acids or salts thereof by ultraviolet exposure |
IT1144060B (en) * | 1979-05-11 | 1986-10-29 | Minnesota Mining & Mfg | PROCEDURE FOR THE MATURATION OF POLYAMIC ACIDS OR THEIR SALTS THROUGH ULTRAVIOLET IRRADIATION FOR EXAMPLE FOR THE FORMATION OF IMAGES IN SUBSTRATES AND PRODUCT OBTAINED |
US4410612A (en) * | 1980-09-03 | 1983-10-18 | E. I. Du Pont De Nemours And Company | Electrical device formed from polymeric heat resistant photopolymerizable composition |
US4369247A (en) * | 1980-09-03 | 1983-01-18 | E. I. Du Pont De Nemours And Company | Process of producing relief structures using polyamide ester resins |
US4329419A (en) * | 1980-09-03 | 1982-05-11 | E. I. Du Pont De Nemours And Company | Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors |
US4414312A (en) * | 1980-09-03 | 1983-11-08 | E. I. Du Pont De Nemours & Co. | Photopolymerizable polyamide ester resin compositions containing an oxygen scavenger |
EP0119719B1 (en) * | 1983-03-03 | 1987-05-06 | Toray Industries, Inc. | Radiation sensitive polymer composition |
US4548688A (en) * | 1983-05-23 | 1985-10-22 | Fusion Semiconductor Systems | Hardening of photoresist |
JP2787531B2 (en) * | 1993-02-17 | 1998-08-20 | 信越化学工業株式会社 | Photosensitive resin composition and protective film for electronic parts |
JP5333452B2 (en) | 2008-10-02 | 2013-11-06 | 大日本印刷株式会社 | Photosensitive resin composition, article using the same, and negative pattern forming method |
-
1969
- 1969-07-22 US US843779A patent/US3623870A/en not_active Expired - Lifetime
-
1970
- 1970-04-02 CA CA079001A patent/CA918484A/en not_active Expired
- 1970-07-14 SE SE09742/70A patent/SE365877B/xx unknown
- 1970-07-16 GB GB3443670A patent/GB1316976A/en not_active Expired
- 1970-07-16 FR FR7026176A patent/FR2055193A5/fr not_active Expired
- 1970-07-16 NL NL707010534A patent/NL144064B/en not_active IP Right Cessation
- 1970-07-17 BE BE753624D patent/BE753624A/en not_active IP Right Cessation
- 1970-07-21 JP JP45063497A patent/JPS4917374B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE2035191A1 (en) | 1971-02-11 |
US3623870A (en) | 1971-11-30 |
FR2055193A5 (en) | 1971-05-07 |
SE365877B (en) | 1974-04-01 |
GB1316976A (en) | 1973-05-16 |
JPS4917374B1 (en) | 1974-04-30 |
BE753624A (en) | 1970-12-31 |
NL7010534A (en) | 1971-01-26 |
NL144064B (en) | 1974-11-15 |
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