SE365877B - - Google Patents
Info
- Publication number
- SE365877B SE365877B SE09742/70A SE974270A SE365877B SE 365877 B SE365877 B SE 365877B SE 09742/70 A SE09742/70 A SE 09742/70A SE 974270 A SE974270 A SE 974270A SE 365877 B SE365877 B SE 365877B
- Authority
- SE
- Sweden
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US84377969A | 1969-07-22 | 1969-07-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SE365877B true SE365877B (xx) | 1974-04-01 |
Family
ID=25290992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE09742/70A SE365877B (xx) | 1969-07-22 | 1970-07-14 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3623870A (xx) |
| JP (1) | JPS4917374B1 (xx) |
| BE (1) | BE753624A (xx) |
| CA (1) | CA918484A (xx) |
| FR (1) | FR2055193A5 (xx) |
| GB (1) | GB1316976A (xx) |
| NL (1) | NL144064B (xx) |
| SE (1) | SE365877B (xx) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4093461A (en) * | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
| US4055515A (en) * | 1975-12-31 | 1977-10-25 | Borden, Inc. | Developer for printing plates |
| US4180404A (en) * | 1977-11-17 | 1979-12-25 | Asahi Kasei Kogyo Kabushiki Kaisha | Heat resistant photoresist composition and process for preparing the same |
| US4208477A (en) * | 1977-12-26 | 1980-06-17 | Asahi Kasei Kogyo Kabushiki Kaisha | Heat resistant photoresist composition and process for preparing the same |
| DE2967162D1 (en) * | 1978-09-29 | 1984-09-13 | Hitachi Ltd | Light-sensitive polymer composition |
| US4331705A (en) | 1979-05-11 | 1982-05-25 | Minnesota Mining And Manufacturing Company | Curing of polyamic acids or salts thereof by ultraviolet exposure |
| IT1144060B (it) * | 1979-05-11 | 1986-10-29 | Minnesota Mining & Mfg | Procedimento per la maturazione di acidi poliammici o loro sali mediante irradiazione ultravioletta ad esempio per la formazione di immagini in substrati e prodotto ottenuto |
| US4410612A (en) * | 1980-09-03 | 1983-10-18 | E. I. Du Pont De Nemours And Company | Electrical device formed from polymeric heat resistant photopolymerizable composition |
| US4369247A (en) * | 1980-09-03 | 1983-01-18 | E. I. Du Pont De Nemours And Company | Process of producing relief structures using polyamide ester resins |
| US4329419A (en) * | 1980-09-03 | 1982-05-11 | E. I. Du Pont De Nemours And Company | Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors |
| US4414312A (en) * | 1980-09-03 | 1983-11-08 | E. I. Du Pont De Nemours & Co. | Photopolymerizable polyamide ester resin compositions containing an oxygen scavenger |
| EP0119719B1 (en) * | 1983-03-03 | 1987-05-06 | Toray Industries, Inc. | Radiation sensitive polymer composition |
| US4548688A (en) * | 1983-05-23 | 1985-10-22 | Fusion Semiconductor Systems | Hardening of photoresist |
| JP2787531B2 (ja) * | 1993-02-17 | 1998-08-20 | 信越化学工業株式会社 | 感光性樹脂組成物及び電子部品用保護膜 |
| JP5333452B2 (ja) | 2008-10-02 | 2013-11-06 | 大日本印刷株式会社 | 感光性樹脂組成物、およびこれを用いた物品、及びネガ型パターン形成方法 |
-
1969
- 1969-07-22 US US843779A patent/US3623870A/en not_active Expired - Lifetime
-
1970
- 1970-04-02 CA CA079001A patent/CA918484A/en not_active Expired
- 1970-07-14 SE SE09742/70A patent/SE365877B/xx unknown
- 1970-07-16 GB GB3443670A patent/GB1316976A/en not_active Expired
- 1970-07-16 FR FR7026176A patent/FR2055193A5/fr not_active Expired
- 1970-07-16 NL NL707010534A patent/NL144064B/xx not_active IP Right Cessation
- 1970-07-17 BE BE753624D patent/BE753624A/xx not_active IP Right Cessation
- 1970-07-21 JP JP45063497A patent/JPS4917374B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2035191A1 (de) | 1971-02-11 |
| US3623870A (en) | 1971-11-30 |
| FR2055193A5 (xx) | 1971-05-07 |
| GB1316976A (en) | 1973-05-16 |
| JPS4917374B1 (xx) | 1974-04-30 |
| BE753624A (fr) | 1970-12-31 |
| NL7010534A (xx) | 1971-01-26 |
| NL144064B (nl) | 1974-11-15 |
| CA918484A (en) | 1973-01-09 |