NL7010534A - - Google Patents

Info

Publication number
NL7010534A
NL7010534A NL7010534A NL7010534A NL7010534A NL 7010534 A NL7010534 A NL 7010534A NL 7010534 A NL7010534 A NL 7010534A NL 7010534 A NL7010534 A NL 7010534A NL 7010534 A NL7010534 A NL 7010534A
Authority
NL
Netherlands
Application number
NL7010534A
Other versions
NL144064B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7010534A publication Critical patent/NL7010534A/xx
Publication of NL144064B publication Critical patent/NL144064B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
NL707010534A 1969-07-22 1970-07-16 Werkwijze voor het vormen van een thermisch stabiel patroon op een drager, alsmede met deze werkwijze verkregen voorwerp. NL144064B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84377969A 1969-07-22 1969-07-22

Publications (2)

Publication Number Publication Date
NL7010534A true NL7010534A (xx) 1971-01-26
NL144064B NL144064B (nl) 1974-11-15

Family

ID=25290992

Family Applications (1)

Application Number Title Priority Date Filing Date
NL707010534A NL144064B (nl) 1969-07-22 1970-07-16 Werkwijze voor het vormen van een thermisch stabiel patroon op een drager, alsmede met deze werkwijze verkregen voorwerp.

Country Status (8)

Country Link
US (1) US3623870A (xx)
JP (1) JPS4917374B1 (xx)
BE (1) BE753624A (xx)
CA (1) CA918484A (xx)
FR (1) FR2055193A5 (xx)
GB (1) GB1316976A (xx)
NL (1) NL144064B (xx)
SE (1) SE365877B (xx)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4093461A (en) * 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
US4055515A (en) * 1975-12-31 1977-10-25 Borden, Inc. Developer for printing plates
US4180404A (en) * 1977-11-17 1979-12-25 Asahi Kasei Kogyo Kabushiki Kaisha Heat resistant photoresist composition and process for preparing the same
US4208477A (en) * 1977-12-26 1980-06-17 Asahi Kasei Kogyo Kabushiki Kaisha Heat resistant photoresist composition and process for preparing the same
DE2967162D1 (en) * 1978-09-29 1984-09-13 Hitachi Ltd Light-sensitive polymer composition
US4331705A (en) 1979-05-11 1982-05-25 Minnesota Mining And Manufacturing Company Curing of polyamic acids or salts thereof by ultraviolet exposure
IT1144060B (it) * 1979-05-11 1986-10-29 Minnesota Mining & Mfg Procedimento per la maturazione di acidi poliammici o loro sali mediante irradiazione ultravioletta ad esempio per la formazione di immagini in substrati e prodotto ottenuto
US4410612A (en) * 1980-09-03 1983-10-18 E. I. Du Pont De Nemours And Company Electrical device formed from polymeric heat resistant photopolymerizable composition
US4369247A (en) * 1980-09-03 1983-01-18 E. I. Du Pont De Nemours And Company Process of producing relief structures using polyamide ester resins
US4329419A (en) * 1980-09-03 1982-05-11 E. I. Du Pont De Nemours And Company Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors
US4414312A (en) * 1980-09-03 1983-11-08 E. I. Du Pont De Nemours & Co. Photopolymerizable polyamide ester resin compositions containing an oxygen scavenger
EP0119719B1 (en) * 1983-03-03 1987-05-06 Toray Industries, Inc. Radiation sensitive polymer composition
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
JP2787531B2 (ja) * 1993-02-17 1998-08-20 信越化学工業株式会社 感光性樹脂組成物及び電子部品用保護膜
JP5333452B2 (ja) 2008-10-02 2013-11-06 大日本印刷株式会社 感光性樹脂組成物、およびこれを用いた物品、及びネガ型パターン形成方法

Also Published As

Publication number Publication date
DE2035191A1 (de) 1971-02-11
US3623870A (en) 1971-11-30
FR2055193A5 (xx) 1971-05-07
SE365877B (xx) 1974-04-01
GB1316976A (en) 1973-05-16
JPS4917374B1 (xx) 1974-04-30
BE753624A (fr) 1970-12-31
NL144064B (nl) 1974-11-15
CA918484A (en) 1973-01-09

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: WESTERN