BE753624A - Technique de preparation d'une reserve photosensible thermiquement stable - Google Patents

Technique de preparation d'une reserve photosensible thermiquement stable

Info

Publication number
BE753624A
BE753624A BE753624DA BE753624A BE 753624 A BE753624 A BE 753624A BE 753624D A BE753624D A BE 753624DA BE 753624 A BE753624 A BE 753624A
Authority
BE
Belgium
Prior art keywords
technique
preparation
thermally stable
stable photosensitive
reserve
Prior art date
Application number
Other languages
English (en)
Inventor
R K Curran
M R Goldrick
R E Kervin
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of BE753624A publication Critical patent/BE753624A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
BE753624D 1969-07-22 1970-07-17 Technique de preparation d'une reserve photosensible thermiquement stable BE753624A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84377969A 1969-07-22 1969-07-22

Publications (1)

Publication Number Publication Date
BE753624A true BE753624A (fr) 1970-12-31

Family

ID=25290992

Family Applications (1)

Application Number Title Priority Date Filing Date
BE753624D BE753624A (fr) 1969-07-22 1970-07-17 Technique de preparation d'une reserve photosensible thermiquement stable

Country Status (8)

Country Link
US (1) US3623870A (fr)
JP (1) JPS4917374B1 (fr)
BE (1) BE753624A (fr)
CA (1) CA918484A (fr)
FR (1) FR2055193A5 (fr)
GB (1) GB1316976A (fr)
NL (1) NL144064B (fr)
SE (1) SE365877B (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4093461A (en) * 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
US4055515A (en) * 1975-12-31 1977-10-25 Borden, Inc. Developer for printing plates
US4180404A (en) * 1977-11-17 1979-12-25 Asahi Kasei Kogyo Kabushiki Kaisha Heat resistant photoresist composition and process for preparing the same
US4208477A (en) * 1977-12-26 1980-06-17 Asahi Kasei Kogyo Kabushiki Kaisha Heat resistant photoresist composition and process for preparing the same
DE2967162D1 (en) * 1978-09-29 1984-09-13 Hitachi Ltd Light-sensitive polymer composition
IT1144060B (it) * 1979-05-11 1986-10-29 Minnesota Mining & Mfg Procedimento per la maturazione di acidi poliammici o loro sali mediante irradiazione ultravioletta ad esempio per la formazione di immagini in substrati e prodotto ottenuto
US4331705A (en) 1979-05-11 1982-05-25 Minnesota Mining And Manufacturing Company Curing of polyamic acids or salts thereof by ultraviolet exposure
US4410612A (en) * 1980-09-03 1983-10-18 E. I. Du Pont De Nemours And Company Electrical device formed from polymeric heat resistant photopolymerizable composition
US4369247A (en) * 1980-09-03 1983-01-18 E. I. Du Pont De Nemours And Company Process of producing relief structures using polyamide ester resins
US4414312A (en) * 1980-09-03 1983-11-08 E. I. Du Pont De Nemours & Co. Photopolymerizable polyamide ester resin compositions containing an oxygen scavenger
US4329419A (en) * 1980-09-03 1982-05-11 E. I. Du Pont De Nemours And Company Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors
DE3463576D1 (en) * 1983-03-03 1987-06-11 Toray Industries Radiation sensitive polymer composition
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
JP2787531B2 (ja) * 1993-02-17 1998-08-20 信越化学工業株式会社 感光性樹脂組成物及び電子部品用保護膜
JP5333452B2 (ja) 2008-10-02 2013-11-06 大日本印刷株式会社 感光性樹脂組成物、およびこれを用いた物品、及びネガ型パターン形成方法

Also Published As

Publication number Publication date
CA918484A (en) 1973-01-09
NL7010534A (fr) 1971-01-26
US3623870A (en) 1971-11-30
DE2035191A1 (de) 1971-02-11
JPS4917374B1 (fr) 1974-04-30
FR2055193A5 (fr) 1971-05-07
GB1316976A (en) 1973-05-16
NL144064B (nl) 1974-11-15
SE365877B (fr) 1974-04-01

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: WESTERN ELECTRIC CY

Effective date: 19850731