SE365877B - - Google Patents

Info

Publication number
SE365877B
SE365877B SE09742/70A SE974270A SE365877B SE 365877 B SE365877 B SE 365877B SE 09742/70 A SE09742/70 A SE 09742/70A SE 974270 A SE974270 A SE 974270A SE 365877 B SE365877 B SE 365877B
Authority
SE
Sweden
Application number
SE09742/70A
Inventor
R Curran
M Goldrick
R Kerwin
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of SE365877B publication Critical patent/SE365877B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SE09742/70A 1969-07-22 1970-07-14 SE365877B (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84377969A 1969-07-22 1969-07-22

Publications (1)

Publication Number Publication Date
SE365877B true SE365877B (fr) 1974-04-01

Family

ID=25290992

Family Applications (1)

Application Number Title Priority Date Filing Date
SE09742/70A SE365877B (fr) 1969-07-22 1970-07-14

Country Status (8)

Country Link
US (1) US3623870A (fr)
JP (1) JPS4917374B1 (fr)
BE (1) BE753624A (fr)
CA (1) CA918484A (fr)
FR (1) FR2055193A5 (fr)
GB (1) GB1316976A (fr)
NL (1) NL144064B (fr)
SE (1) SE365877B (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4093461A (en) * 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
US4055515A (en) * 1975-12-31 1977-10-25 Borden, Inc. Developer for printing plates
US4180404A (en) * 1977-11-17 1979-12-25 Asahi Kasei Kogyo Kabushiki Kaisha Heat resistant photoresist composition and process for preparing the same
US4208477A (en) * 1977-12-26 1980-06-17 Asahi Kasei Kogyo Kabushiki Kaisha Heat resistant photoresist composition and process for preparing the same
WO1980000706A1 (fr) * 1978-09-29 1980-04-17 Hitachi Ltd Composition polymere sensible a la lumiere
US4331705A (en) 1979-05-11 1982-05-25 Minnesota Mining And Manufacturing Company Curing of polyamic acids or salts thereof by ultraviolet exposure
GB2053941B (en) * 1979-05-11 1983-11-16 Minnesota Mining & Mfg Curing of polyamic acids or salts thereof by ultraviolet exposure
US4414312A (en) * 1980-09-03 1983-11-08 E. I. Du Pont De Nemours & Co. Photopolymerizable polyamide ester resin compositions containing an oxygen scavenger
US4410612A (en) * 1980-09-03 1983-10-18 E. I. Du Pont De Nemours And Company Electrical device formed from polymeric heat resistant photopolymerizable composition
US4329419A (en) * 1980-09-03 1982-05-11 E. I. Du Pont De Nemours And Company Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors
US4369247A (en) * 1980-09-03 1983-01-18 E. I. Du Pont De Nemours And Company Process of producing relief structures using polyamide ester resins
EP0119719B1 (fr) * 1983-03-03 1987-05-06 Toray Industries, Inc. Composition de polymère sensible au rayonnement
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
JP2787531B2 (ja) * 1993-02-17 1998-08-20 信越化学工業株式会社 感光性樹脂組成物及び電子部品用保護膜
JP5333452B2 (ja) 2008-10-02 2013-11-06 大日本印刷株式会社 感光性樹脂組成物、およびこれを用いた物品、及びネガ型パターン形成方法

Also Published As

Publication number Publication date
FR2055193A5 (fr) 1971-05-07
CA918484A (en) 1973-01-09
NL144064B (nl) 1974-11-15
BE753624A (fr) 1970-12-31
GB1316976A (en) 1973-05-16
DE2035191A1 (de) 1971-02-11
NL7010534A (fr) 1971-01-26
JPS4917374B1 (fr) 1974-04-30
US3623870A (en) 1971-11-30

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