JPS49123323A - - Google Patents
Info
- Publication number
- JPS49123323A JPS49123323A JP1961074A JP1961074A JPS49123323A JP S49123323 A JPS49123323 A JP S49123323A JP 1961074 A JP1961074 A JP 1961074A JP 1961074 A JP1961074 A JP 1961074A JP S49123323 A JPS49123323 A JP S49123323A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34212373A | 1973-03-16 | 1973-03-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS49123323A true JPS49123323A (ja) | 1974-11-26 |
Family
ID=23340434
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1961074A Pending JPS49123323A (ja) | 1973-03-16 | 1974-02-20 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS49123323A (ja) |
| DE (1) | DE2410880A1 (ja) |
| FR (1) | FR2221754A1 (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05289334A (ja) * | 1992-04-14 | 1993-11-05 | Ube Ind Ltd | 感光性組成物 |
| JP2009186780A (ja) * | 2008-02-06 | 2009-08-20 | Hitachi Chem Co Ltd | 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
| WO2012133617A1 (ja) * | 2011-03-30 | 2012-10-04 | 日本ゼオン株式会社 | 樹脂組成物および半導体素子基板 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1085212A (en) * | 1975-05-27 | 1980-09-09 | Ronald H. Engebrecht | Use of volatile carboxylic acids in improved photoresists containing quinone diazides |
| US4510230A (en) * | 1982-04-12 | 1985-04-09 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements containing acid to reduce scum and stain formation |
| JPS60191237A (ja) * | 1984-03-13 | 1985-09-28 | Asahi Chem Ind Co Ltd | 露光硬化後非粘着性感光性樹脂組成物 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE582954A (ja) * | 1958-12-30 | |||
| BE605776A (ja) * | 1960-09-26 | |||
| FR1528489A (fr) * | 1966-07-01 | 1968-06-07 | Eastman Kodak Co | Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique |
-
1974
- 1974-02-12 FR FR7404782A patent/FR2221754A1/fr active Granted
- 1974-02-20 JP JP1961074A patent/JPS49123323A/ja active Pending
- 1974-03-07 DE DE19742410880 patent/DE2410880A1/de active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05289334A (ja) * | 1992-04-14 | 1993-11-05 | Ube Ind Ltd | 感光性組成物 |
| JP2009186780A (ja) * | 2008-02-06 | 2009-08-20 | Hitachi Chem Co Ltd | 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
| WO2012133617A1 (ja) * | 2011-03-30 | 2012-10-04 | 日本ゼオン株式会社 | 樹脂組成物および半導体素子基板 |
| JPWO2012133617A1 (ja) * | 2011-03-30 | 2014-07-28 | 日本ゼオン株式会社 | 樹脂組成物および半導体素子基板 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2221754B1 (ja) | 1977-09-23 |
| FR2221754A1 (en) | 1974-10-11 |
| DE2410880A1 (de) | 1974-09-19 |