DE2410880A1 - Verfahren zum herstellen eines maskierenden musters aus photolack - Google Patents
Verfahren zum herstellen eines maskierenden musters aus photolackInfo
- Publication number
- DE2410880A1 DE2410880A1 DE19742410880 DE2410880A DE2410880A1 DE 2410880 A1 DE2410880 A1 DE 2410880A1 DE 19742410880 DE19742410880 DE 19742410880 DE 2410880 A DE2410880 A DE 2410880A DE 2410880 A1 DE2410880 A1 DE 2410880A1
- Authority
- DE
- Germany
- Prior art keywords
- photoresist
- acid
- carboxylic acid
- substrate
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34212373A | 1973-03-16 | 1973-03-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE2410880A1 true DE2410880A1 (de) | 1974-09-19 |
Family
ID=23340434
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19742410880 Pending DE2410880A1 (de) | 1973-03-16 | 1974-03-07 | Verfahren zum herstellen eines maskierenden musters aus photolack |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS49123323A (ja) |
DE (1) | DE2410880A1 (ja) |
FR (1) | FR2221754A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2623790A1 (de) * | 1975-05-27 | 1976-12-23 | Eastman Kodak Co | Lichtempfindliche masse fuer die erzeugung von photoresistschichten und lichtempfindlichen aufzeichnungsmaterialien |
EP0154994A2 (en) * | 1984-03-13 | 1985-09-18 | Asahi Kasei Kogyo Kabushiki Kaisha | Improved surface tack-free photosensitive resin composition and a method using same |
EP0193621A1 (en) * | 1982-04-12 | 1986-09-10 | E.I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements containing acid to reduce scum and stain formation |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2823104B2 (ja) * | 1992-04-14 | 1998-11-11 | 宇部興産株式会社 | 感光性組成物 |
JP5412039B2 (ja) * | 2008-02-06 | 2014-02-12 | 日立化成株式会社 | 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
CN103443707A (zh) * | 2011-03-30 | 2013-12-11 | 日本瑞翁株式会社 | 树脂组合物和半导体元件基板 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE582954A (ja) * | 1958-12-30 | |||
BE605776A (ja) * | 1960-09-26 | |||
FR1528489A (fr) * | 1966-07-01 | 1968-06-07 | Eastman Kodak Co | Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique |
-
1974
- 1974-02-12 FR FR7404782A patent/FR2221754A1/fr active Granted
- 1974-02-20 JP JP1961074A patent/JPS49123323A/ja active Pending
- 1974-03-07 DE DE19742410880 patent/DE2410880A1/de active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2623790A1 (de) * | 1975-05-27 | 1976-12-23 | Eastman Kodak Co | Lichtempfindliche masse fuer die erzeugung von photoresistschichten und lichtempfindlichen aufzeichnungsmaterialien |
EP0193621A1 (en) * | 1982-04-12 | 1986-09-10 | E.I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements containing acid to reduce scum and stain formation |
EP0154994A2 (en) * | 1984-03-13 | 1985-09-18 | Asahi Kasei Kogyo Kabushiki Kaisha | Improved surface tack-free photosensitive resin composition and a method using same |
EP0154994A3 (en) * | 1984-03-13 | 1986-01-22 | Asahi Kasei Kogyo Kabushiki Kaisha | A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method |
US4716094A (en) * | 1984-03-13 | 1987-12-29 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method |
Also Published As
Publication number | Publication date |
---|---|
FR2221754A1 (en) | 1974-10-11 |
FR2221754B1 (ja) | 1977-09-23 |
JPS49123323A (ja) | 1974-11-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0000702B1 (de) | Verfahren zur Herstellung einer fliessbeständigen Resistmaske aus strahlungsempfindlichem Resistmaterial | |
DE2447225C2 (de) | Verfahren zum Ablösen von positiven Photolack | |
DE2420589C3 (de) | Verfahren zum Herstellen von Photolackmustern | |
DE2424338C2 (de) | Verfahren zum Aufbringen von Mustern dünner Filme auf einem Substrat | |
EP0057738B1 (de) | Verfahren zum Herstellen und Füllen von Löchern in einer auf einem Substrat aufliegenden Schicht | |
DE2541624C2 (de) | Wässrige Ätzlösung und Verfahren zum Ätzen von Polymerfilmen oder Folien auf Polyimidbasis | |
CH619055A5 (ja) | ||
EP0450189B1 (de) | Hochwärmebeständige Negativresists und Verfahren zur Herstellung hochwärmebeständiger Reliefstrukturen | |
DE2007208A1 (de) | Positivkopierlack | |
DE2722557A1 (de) | Verfahren zum aufbringen von metallisierungsmustern auf einem halbleitersubstrat | |
EP0146834A2 (de) | Entwickler für Positiv-Fotoresists | |
DE2312499A1 (de) | Diazochinon-siloxane und verwendung derselben fuer photolacke und lichtempfindliche gegenstaende | |
DE2728352C2 (ja) | ||
EP0002669A1 (de) | Verfahren zum Entfernen von Material von einem Substrat durch selektive Trockemätzung und Anwendung dieses Verfahrens bei der Herstellung von Leitungsmustern | |
DE3541451A1 (de) | Verfahren zum herstellen eines negativbildes | |
DE2539691A1 (de) | Verfahren zum entwickeln von elektronenstrahlempfindlichen resistfilmen | |
DE69935488T2 (de) | Herstellung eines Trägers für Flachdruckplatte | |
DE2539690A1 (de) | Verfahren zum entwickeln von resistfilmen | |
DE2410880A1 (de) | Verfahren zum herstellen eines maskierenden musters aus photolack | |
EP0278996A1 (de) | Verfahren zur Verbesserung der Haftung von Photoresistmaterialien | |
DE1297949B (de) | Verfahren zur Herstellung gedruckter Schaltungen | |
DE2521727A1 (de) | Verfahren zur herstellung eines resistbildes | |
DE2849996C2 (de) | Photodepolymerisierbares Gemisch und ein Verfahren zur Herstellung eines Positivbildes | |
DE3246947A1 (de) | Verfahren zum bilden eines musters in einer resistschicht | |
DE2335072B2 (ja) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
OHJ | Non-payment of the annual fee |