CA1085212A - Masques contenant des diazothydrures quinoniques, ameliores par l'emploi d'acides carboxyliques volatils - Google Patents

Masques contenant des diazothydrures quinoniques, ameliores par l'emploi d'acides carboxyliques volatils

Info

Publication number
CA1085212A
CA1085212A CA232,058A CA232058A CA1085212A CA 1085212 A CA1085212 A CA 1085212A CA 232058 A CA232058 A CA 232058A CA 1085212 A CA1085212 A CA 1085212A
Authority
CA
Canada
Prior art keywords
light sensitive
methyl
hydrogen
carbon atoms
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA232,058A
Other languages
English (en)
Inventor
Ronald H. Engebrecht
John R. Guild
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of CA1085212A publication Critical patent/CA1085212A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/14—Modified phenol-aldehyde condensates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
CA232,058A 1975-05-27 1975-07-23 Masques contenant des diazothydrures quinoniques, ameliores par l'emploi d'acides carboxyliques volatils Expired CA1085212A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58084575A 1975-05-27 1975-05-27
US580,845 1975-05-27

Publications (1)

Publication Number Publication Date
CA1085212A true CA1085212A (fr) 1980-09-09

Family

ID=24322804

Family Applications (1)

Application Number Title Priority Date Filing Date
CA232,058A Expired CA1085212A (fr) 1975-05-27 1975-07-23 Masques contenant des diazothydrures quinoniques, ameliores par l'emploi d'acides carboxyliques volatils

Country Status (5)

Country Link
JP (1) JPS51145313A (fr)
CA (1) CA1085212A (fr)
DE (1) DE2623790C3 (fr)
FR (1) FR2312799A1 (fr)
GB (1) GB1546633A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS58152236A (ja) * 1982-03-05 1983-09-09 Toray Ind Inc 感光性組成物
JPS5986046A (ja) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPS5988734A (ja) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd 感光性組成物
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
JP2719912B2 (ja) * 1987-05-07 1998-02-25 コニカ株式会社 感光性平版印刷版
JPS63276047A (ja) * 1987-05-07 1988-11-14 Konica Corp 感光性組成物及び感光性平版印刷版
JP2806474B2 (ja) * 1987-07-28 1998-09-30 三菱化学株式会社 感光性組成物
US5403695A (en) * 1991-04-30 1995-04-04 Kabushiki Kaisha Toshiba Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups
RU2153986C2 (ru) 1996-04-23 2000-08-10 Хорселл Грэфик Индастриз Лимитед Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US6117610A (en) 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6090532A (en) 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
BR9810545A (pt) 1997-07-05 2000-09-05 Kodak Polychrome Graphics Llc Métodos para a formação de configuração
US6060217A (en) 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
EP1449654A1 (fr) 1997-10-17 2004-08-25 Fuji Photo Film Co., Ltd. Produit formateur d'image photosensible travaillant en positif pour laser infra-rouge et composition travaillant en positif pour laser infra-rouge
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6534238B1 (en) 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6451505B1 (en) 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
US6905809B2 (en) 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions
US6790582B1 (en) 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US6939663B2 (en) 2003-07-08 2005-09-06 Kodak Polychrome Graphics Llc Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78723C (fr) * 1949-07-23
BE506677A (fr) * 1950-10-31
US2990281A (en) * 1956-12-17 1961-06-27 Monsanto Chemicals Photosensitive resinous compositions and photographic elements
FR2221754A1 (en) * 1973-03-16 1974-10-11 Ibm Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition

Also Published As

Publication number Publication date
JPS5760620B2 (fr) 1982-12-20
FR2312799B1 (fr) 1978-11-17
DE2623790A1 (de) 1976-12-23
GB1546633A (en) 1979-05-31
JPS51145313A (en) 1976-12-14
FR2312799A1 (fr) 1976-12-24
DE2623790B2 (de) 1978-03-09
DE2623790C3 (de) 1984-10-25

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Legal Events

Date Code Title Description
MKEX Expiry