JPS5221768A - Producing system of semiconductor element - Google Patents

Producing system of semiconductor element

Info

Publication number
JPS5221768A
JPS5221768A JP9755075A JP9755075A JPS5221768A JP S5221768 A JPS5221768 A JP S5221768A JP 9755075 A JP9755075 A JP 9755075A JP 9755075 A JP9755075 A JP 9755075A JP S5221768 A JPS5221768 A JP S5221768A
Authority
JP
Japan
Prior art keywords
semiconductor element
producing system
face
wafer
liquid flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9755075A
Other languages
Japanese (ja)
Other versions
JPS5745057B2 (en
Inventor
Noboru Kawasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9755075A priority Critical patent/JPS5221768A/en
Publication of JPS5221768A publication Critical patent/JPS5221768A/en
Publication of JPS5745057B2 publication Critical patent/JPS5745057B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To form plating film of equal thickness on face P and face N through making surface-activated liquid flow collide against face P of wafer.
COPYRIGHT: (C)1977,JPO&Japio
JP9755075A 1975-08-13 1975-08-13 Producing system of semiconductor element Granted JPS5221768A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9755075A JPS5221768A (en) 1975-08-13 1975-08-13 Producing system of semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9755075A JPS5221768A (en) 1975-08-13 1975-08-13 Producing system of semiconductor element

Publications (2)

Publication Number Publication Date
JPS5221768A true JPS5221768A (en) 1977-02-18
JPS5745057B2 JPS5745057B2 (en) 1982-09-25

Family

ID=14195339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9755075A Granted JPS5221768A (en) 1975-08-13 1975-08-13 Producing system of semiconductor element

Country Status (1)

Country Link
JP (1) JPS5221768A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58209122A (en) * 1982-05-14 1983-12-06 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Method of producing metal pattern finely composed on surface of metal or semiconductor
JPS61271829A (en) * 1985-05-28 1986-12-02 Kanto Kasei Kogyo Kk Surface-treating method for silicon wafer
JPS6477401A (en) * 1987-09-16 1989-03-23 Aisin Aw Co Vehicle braking power control device utilizing motor braking power
JPH01198201A (en) * 1988-01-29 1989-08-09 Toyota Motor Corp Controller for braking of electric automobile

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63164053A (en) * 1986-12-26 1988-07-07 Sony Corp Capstan device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58209122A (en) * 1982-05-14 1983-12-06 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Method of producing metal pattern finely composed on surface of metal or semiconductor
JPS61271829A (en) * 1985-05-28 1986-12-02 Kanto Kasei Kogyo Kk Surface-treating method for silicon wafer
JPS6477401A (en) * 1987-09-16 1989-03-23 Aisin Aw Co Vehicle braking power control device utilizing motor braking power
JPH01198201A (en) * 1988-01-29 1989-08-09 Toyota Motor Corp Controller for braking of electric automobile

Also Published As

Publication number Publication date
JPS5745057B2 (en) 1982-09-25

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