JPS5323584A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5323584A JPS5323584A JP9788876A JP9788876A JPS5323584A JP S5323584 A JPS5323584 A JP S5323584A JP 9788876 A JP9788876 A JP 9788876A JP 9788876 A JP9788876 A JP 9788876A JP S5323584 A JPS5323584 A JP S5323584A
- Authority
- JP
- Japan
- Prior art keywords
- film
- production
- semiconductor device
- inhibit
- decrease
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To inhibit the decrease in the thickness of an Al film at the time of anodization treatment of the Al film and subsequent selective etching treatment of the Al2O3 film and improve bonding characteristics by selectively providing Si3N4 of good adhesiveness to the Al film to said film.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9788876A JPS5323584A (en) | 1976-08-17 | 1976-08-17 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9788876A JPS5323584A (en) | 1976-08-17 | 1976-08-17 | Production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5323584A true JPS5323584A (en) | 1978-03-04 |
Family
ID=14204278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9788876A Pending JPS5323584A (en) | 1976-08-17 | 1976-08-17 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5323584A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633899A (en) * | 1979-08-29 | 1981-04-04 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of forming multilayer wire |
JPH07211690A (en) * | 1994-01-12 | 1995-08-11 | Lg Semicon Co Ltd | Selective etching method |
-
1976
- 1976-08-17 JP JP9788876A patent/JPS5323584A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633899A (en) * | 1979-08-29 | 1981-04-04 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of forming multilayer wire |
JPS6337517B2 (en) * | 1979-08-29 | 1988-07-26 | Cho Eru Esu Ai Gijutsu Kenkyu Kumiai | |
JPH07211690A (en) * | 1994-01-12 | 1995-08-11 | Lg Semicon Co Ltd | Selective etching method |
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