FI953947A0 - Puhdistusaine ja menetelmä puolijohdelevyjen puhdistamiseksi - Google Patents

Puhdistusaine ja menetelmä puolijohdelevyjen puhdistamiseksi

Info

Publication number
FI953947A0
FI953947A0 FI953947A FI953947A FI953947A0 FI 953947 A0 FI953947 A0 FI 953947A0 FI 953947 A FI953947 A FI 953947A FI 953947 A FI953947 A FI 953947A FI 953947 A0 FI953947 A0 FI 953947A0
Authority
FI
Finland
Prior art keywords
detergent
procedure
cleaning semiconductor
semiconductor boards
boards
Prior art date
Application number
FI953947A
Other languages
English (en)
Swedish (sv)
Other versions
FI953947A (fi
Inventor
Roland Brunner
Georg Hochgesang
Anton Schnegg
Gertraud Thalhammer
Original Assignee
Wacker Siltronic Halbleitermat
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE4430217A external-priority patent/DE4430217A1/de
Priority claimed from DE19515024A external-priority patent/DE19515024A1/de
Application filed by Wacker Siltronic Halbleitermat filed Critical Wacker Siltronic Halbleitermat
Publication of FI953947A0 publication Critical patent/FI953947A0/fi
Publication of FI953947A publication Critical patent/FI953947A/fi

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2075—Carboxylic acids-salts thereof
    • C11D3/2082—Polycarboxylic acids-salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/34—Organic compounds containing sulfur
    • C11D3/3472—Organic compounds containing sulfur additionally containing -COOH groups or derivatives thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
FI953947A 1994-08-25 1995-08-23 Puhdistusaine ja menetelmä puolijohdelevyjen puhdistamiseksi FI953947A (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4430217A DE4430217A1 (de) 1994-08-25 1994-08-25 Reinigungsmittel und Verfahren zum Reinigen von Halbleiterscheiben
DE19515024A DE19515024A1 (de) 1995-04-24 1995-04-24 Reinigungsmittel und Verfahren zum Reinigen von Halbleiterscheiben

Publications (2)

Publication Number Publication Date
FI953947A0 true FI953947A0 (fi) 1995-08-23
FI953947A FI953947A (fi) 1996-02-26

Family

ID=25939522

Family Applications (1)

Application Number Title Priority Date Filing Date
FI953947A FI953947A (fi) 1994-08-25 1995-08-23 Puhdistusaine ja menetelmä puolijohdelevyjen puhdistamiseksi

Country Status (8)

Country Link
US (1) US5695572A (fi)
EP (1) EP0698917B1 (fi)
JP (1) JP2709452B2 (fi)
KR (1) KR0157702B1 (fi)
CN (1) CN1057330C (fi)
DE (1) DE59506147D1 (fi)
FI (1) FI953947A (fi)
TW (1) TW330211B (fi)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3693441B2 (ja) * 1996-12-27 2005-09-07 富士通株式会社 記録媒体の製造方法
US6200896B1 (en) 1998-01-22 2001-03-13 Cypress Semiconductor Corporation Employing an acidic liquid and an abrasive surface to polish a semiconductor topography
US6232231B1 (en) 1998-08-31 2001-05-15 Cypress Semiconductor Corporation Planarized semiconductor interconnect topography and method for polishing a metal layer to form interconnect
US5972124A (en) * 1998-08-31 1999-10-26 Advanced Micro Devices, Inc. Method for cleaning a surface of a dielectric material
JP4516176B2 (ja) 1999-04-20 2010-08-04 関東化学株式会社 電子材料用基板洗浄液
US6230720B1 (en) 1999-08-16 2001-05-15 Memc Electronic Materials, Inc. Single-operation method of cleaning semiconductors after final polishing
JP3396030B2 (ja) * 2001-04-27 2003-04-14 沖電気工業株式会社 半導体装置の製造方法
US6969684B1 (en) 2001-04-30 2005-11-29 Cypress Semiconductor Corp. Method of making a planarized semiconductor structure
US6828678B1 (en) 2002-03-29 2004-12-07 Silicon Magnetic Systems Semiconductor topography with a fill material arranged within a plurality of valleys associated with the surface roughness of the metal layer
US6905974B2 (en) * 2002-08-08 2005-06-14 Micron Technology, Inc. Methods using a peroxide-generating compound to remove group VIII metal-containing residue
US7077975B2 (en) * 2002-08-08 2006-07-18 Micron Technology, Inc. Methods and compositions for removing group VIII metal-containing materials from surfaces
US20060166846A1 (en) * 2002-08-19 2006-07-27 Ying-Hao Li Remover solution
KR100495661B1 (ko) * 2002-10-01 2005-06-16 삼성전자주식회사 반도체 소자 및 그 형성 방법
KR20050065312A (ko) * 2003-12-25 2005-06-29 마츠시타 덴끼 산교 가부시키가이샤 반도체웨이퍼의 세정방법
JP4613744B2 (ja) * 2005-08-10 2011-01-19 株式会社Ｓｕｍｃｏ シリコンウェーハの洗浄方法
US20080318343A1 (en) * 2007-06-25 2008-12-25 Krishna Vepa Wafer reclaim method based on wafer type
US7775856B2 (en) 2007-09-27 2010-08-17 Applied Materials, Inc. Method for removal of surface films from reclaim substrates
CN102211880B (zh) * 2011-04-11 2013-01-02 李莉 一种玻璃清洗设备
CN102228892A (zh) * 2011-04-11 2011-11-02 李莉 一种玻璃清洗池
CN103882444A (zh) * 2012-12-19 2014-06-25 安集微电子（上海）有限公司 一种清洗液及其应用
CN103013711A (zh) * 2013-01-15 2013-04-03 常州比太科技有限公司 一种去除晶体硅片金属离子污染的清洗液及其清洗工艺

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3915633A (en) * 1972-09-21 1975-10-28 Colgate Palmolive Co Complexing acid pre-wash composition and method
US4009299A (en) * 1975-10-22 1977-02-22 Motorola, Inc. Tin strip formulation for metal to glass seal diodes
US4014715A (en) * 1975-12-08 1977-03-29 General Electric Company Solder cleaning and coating composition
US4376057A (en) * 1980-11-26 1983-03-08 International Business Machines Corporation Etchant composition and use thereof
JPS58204100A (ja) * 1982-05-24 1983-11-28 ダイキン工業株式会社 表面清浄化用組成物
JPS59196385A (ja) * 1983-04-23 1984-11-07 Shinko Electric Ind Co Ltd 化学研摩液
US4714517A (en) * 1986-05-08 1987-12-22 National Semiconductor Corporation Copper cleaning and passivating for tape automated bonding
JPS63283028A (ja) * 1986-09-29 1988-11-18 Hashimoto Kasei Kogyo Kk 微細加工表面処理剤
US5061393A (en) * 1990-09-13 1991-10-29 The Procter & Gamble Company Acidic liquid detergent compositions for bathrooms
DE4209865C2 (de) * 1992-03-26 1994-06-30 Wacker Chemitronic Verfahren zur Verbesserung der Wirksamkeit wässeriger Reinigungsmittel zum Entfernen metallhaltiger Rückstände auf Halbleiteroberflächen
US5397397A (en) * 1992-09-18 1995-03-14 Crestek, Inc. Method for cleaning and drying of metallic and nonmetallic surfaces

Also Published As

Publication number Publication date
US5695572A (en) 1997-12-09
CN1124763A (zh) 1996-06-19
KR0157702B1 (en) 1998-12-01
KR960009041A (ko) 1996-03-22
TW330211B (en) 1998-04-21
EP0698917B1 (de) 1999-06-09
FI953947A (fi) 1996-02-26
JPH08100195A (ja) 1996-04-16
CN1057330C (zh) 2000-10-11
EP0698917A1 (de) 1996-02-28
DE59506147D1 (de) 1999-07-15
JP2709452B2 (ja) 1998-02-04

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Legal Events

Date Code Title Description
HC Name/ company changed in application

Owner name: WACKER SILTRONIC GESELLSCHAFT FUER