FI20041059A0 - Komponentin sisältävän kerroksen valmistaminen - Google Patents

Komponentin sisältävän kerroksen valmistaminen

Info

Publication number
FI20041059A0
FI20041059A0 FI20041059A FI20041059A FI20041059A0 FI 20041059 A0 FI20041059 A0 FI 20041059A0 FI 20041059 A FI20041059 A FI 20041059A FI 20041059 A FI20041059 A FI 20041059A FI 20041059 A0 FI20041059 A0 FI 20041059A0
Authority
FI
Finland
Prior art keywords
preparation
component
layer containing
layer
Prior art date
Application number
FI20041059A
Other languages
English (en)
Swedish (sv)
Other versions
FI20041059A (fi
FI117812B (fi
Inventor
Risto Tuominen
Petteri Palm
Original Assignee
Imbera Electronics Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imbera Electronics Oy filed Critical Imbera Electronics Oy
Publication of FI20041059A0 publication Critical patent/FI20041059A0/fi
Priority to FI20041059A priority Critical patent/FI117812B/fi
Priority to CN200910164685A priority patent/CN101686612A/zh
Priority to PCT/FI2005/000352 priority patent/WO2006013230A2/en
Priority to KR1020077005242A priority patent/KR20070041774A/ko
Priority to US11/659,190 priority patent/US7673387B2/en
Priority to JP2007524358A priority patent/JP4630333B2/ja
Priority to CNB2005800263538A priority patent/CN100543983C/zh
Priority to AT0932705A priority patent/AT503718B1/de
Publication of FI20041059A publication Critical patent/FI20041059A/fi
Application granted granted Critical
Publication of FI117812B publication Critical patent/FI117812B/fi
Priority to US12/702,653 priority patent/US8487194B2/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/82Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5389Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/19Manufacturing methods of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0652Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next and on each other, i.e. mixed assemblies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/50Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/182Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
    • H05K1/185Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
    • H05K1/188Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit manufactured by mounting on or attaching to a structure having a conductive layer, e.g. a metal foil, such that the terminals of the component are connected to or adjacent to the conductive layer before embedding, and by using the conductive layer, which is patterned after embedding, at least partially for connecting the component
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/568Temporary substrate used as encapsulation process aid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/82Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
    • H01L2224/82009Pre-treatment of the connector or the bonding area
    • H01L2224/8203Reshaping, e.g. forming vias
    • H01L2224/82035Reshaping, e.g. forming vias by heating means
    • H01L2224/82039Reshaping, e.g. forming vias by heating means using a laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/83001Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus
    • H01L2224/83005Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus being a temporary or sacrificial substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8312Aligning
    • H01L2224/83121Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors
    • H01L2224/83132Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors using marks formed outside the semiconductor or solid-state body, i.e. "off-chip"
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/921Connecting a surface with connectors of different types
    • H01L2224/9212Sequential connecting processes
    • H01L2224/92142Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92144Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a build-up interconnect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/07802Adhesive characteristics other than chemical not being an ohmic electrical conductor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49126Assembling bases
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913Assembling to base an electrical component, e.g., capacitor, etc.
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913Assembling to base an electrical component, e.g., capacitor, etc.
    • Y10T29/49144Assembling to base an electrical component, e.g., capacitor, etc. by metal fusion
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49165Manufacturing circuit on or in base by forming conductive walled aperture in base

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
FI20041059A 2004-08-05 2004-08-05 Komponentin sisältävän kerroksen valmistaminen FI117812B (fi)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FI20041059A FI117812B (fi) 2004-08-05 2004-08-05 Komponentin sisältävän kerroksen valmistaminen
US11/659,190 US7673387B2 (en) 2004-08-05 2005-08-04 Manufacture of a layer including a component
PCT/FI2005/000352 WO2006013230A2 (en) 2004-08-05 2005-08-04 Manufacture of a layer including a component
KR1020077005242A KR20070041774A (ko) 2004-08-05 2005-08-04 부품을 포함한 층의 제조
CN200910164685A CN101686612A (zh) 2004-08-05 2005-08-04 制造包括部件的层
JP2007524358A JP4630333B2 (ja) 2004-08-05 2005-08-04 基板表面上に回路基板層を形成する方法
CNB2005800263538A CN100543983C (zh) 2004-08-05 2005-08-04 在基底表面上制造电路板层的方法
AT0932705A AT503718B1 (de) 2004-08-05 2005-08-04 Herstellung einer eine komponente umfassenden schicht
US12/702,653 US8487194B2 (en) 2004-08-05 2010-02-09 Circuit board including an embedded component

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20041059A FI117812B (fi) 2004-08-05 2004-08-05 Komponentin sisältävän kerroksen valmistaminen
FI20041059 2004-08-05

Publications (3)

Publication Number Publication Date
FI20041059A0 true FI20041059A0 (fi) 2004-08-05
FI20041059A FI20041059A (fi) 2006-02-06
FI117812B FI117812B (fi) 2007-02-28

Family

ID=32922092

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20041059A FI117812B (fi) 2004-08-05 2004-08-05 Komponentin sisältävän kerroksen valmistaminen

Country Status (7)

Country Link
US (1) US7673387B2 (fi)
JP (1) JP4630333B2 (fi)
KR (1) KR20070041774A (fi)
CN (2) CN101686612A (fi)
AT (1) AT503718B1 (fi)
FI (1) FI117812B (fi)
WO (1) WO2006013230A2 (fi)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI20031341A (fi) 2003-09-18 2005-03-19 Imbera Electronics Oy Menetelmä elektroniikkamoduulin valmistamiseksi
FI117814B (fi) * 2004-06-15 2007-02-28 Imbera Electronics Oy Menetelmä elektroniikkamoduulin valmistamiseksi
FI117369B (fi) * 2004-11-26 2006-09-15 Imbera Electronics Oy Menetelmä elektroniikkamoduulin valmistamiseksi
WO2006134220A1 (en) * 2005-06-16 2006-12-21 Imbera Electronics Oy Method for manufacturing a circuit board structure, and a circuit board structure
FI122128B (fi) * 2005-06-16 2011-08-31 Imbera Electronics Oy Menetelmä piirilevyrakenteen valmistamiseksi
FI119714B (fi) * 2005-06-16 2009-02-13 Imbera Electronics Oy Piirilevyrakenne ja menetelmä piirilevyrakenteen valmistamiseksi
EP2031946A4 (en) * 2006-05-24 2011-07-13 Dainippon Printing Co Ltd PCB WITH AN INTEGRATED COMPONENT AND METHOD FOR PRODUCING A PCB WITH AN INTEGRATED COMPONENT
US9953910B2 (en) 2007-06-21 2018-04-24 General Electric Company Demountable interconnect structure
US9610758B2 (en) 2007-06-21 2017-04-04 General Electric Company Method of making demountable interconnect structure
JP5012896B2 (ja) * 2007-06-26 2012-08-29 株式会社村田製作所 部品内蔵基板の製造方法
CN101472399B (zh) * 2007-12-26 2011-09-21 欣兴电子股份有限公司 内埋式线路板的制作方法
US8259454B2 (en) 2008-04-14 2012-09-04 General Electric Company Interconnect structure including hybrid frame panel
US8264085B2 (en) 2008-05-05 2012-09-11 Infineon Technologies Ag Semiconductor device package interconnections
KR101048515B1 (ko) * 2008-10-15 2011-07-12 삼성전기주식회사 전자 소자 내장 인쇄회로기판 및 그 제조 방법
US8124449B2 (en) 2008-12-02 2012-02-28 Infineon Technologies Ag Device including a semiconductor chip and metal foils
FI20095110A0 (fi) * 2009-02-06 2009-02-06 Imbera Electronics Oy Elektroniikkamoduuli, jossa on EMI-suoja
CN102332408B (zh) * 2010-07-13 2015-05-13 矽品精密工业股份有限公司 芯片尺寸封装件及其制法
US8735735B2 (en) 2010-07-23 2014-05-27 Ge Embedded Electronics Oy Electronic module with embedded jumper conductor
AT12737U1 (de) * 2010-09-17 2012-10-15 Austria Tech & System Tech Verfahren zum herstellen einer aus mehreren leiterplattenbereichen bestehenden leiterplatte sowie leiterplatte
TWI462194B (zh) * 2011-08-25 2014-11-21 Chipmos Technologies Inc 半導體封裝結構及其製作方法
JP2013211519A (ja) * 2012-02-29 2013-10-10 Ngk Spark Plug Co Ltd 多層配線基板の製造方法
AT513047B1 (de) * 2012-07-02 2014-01-15 Austria Tech & System Tech Verfahren zum Einbetten zumindest eines Bauteils in eine Leiterplatte
TWI463634B (zh) * 2012-08-29 2014-12-01 Macronix Int Co Ltd 晶片堆疊結構及其製造方法
US8860202B2 (en) * 2012-08-29 2014-10-14 Macronix International Co., Ltd. Chip stack structure and manufacturing method thereof
JP6103054B2 (ja) * 2013-06-18 2017-03-29 株式会社村田製作所 樹脂多層基板の製造方法
US10219384B2 (en) 2013-11-27 2019-02-26 At&S Austria Technologie & Systemtechnik Aktiengesellschaft Circuit board structure
AT515101B1 (de) 2013-12-12 2015-06-15 Austria Tech & System Tech Verfahren zum Einbetten einer Komponente in eine Leiterplatte
US11523520B2 (en) 2014-02-27 2022-12-06 At&S Austria Technologie & Systemtechnik Aktiengesellschaft Method for making contact with a component embedded in a printed circuit board
AT515447B1 (de) 2014-02-27 2019-10-15 At & S Austria Tech & Systemtechnik Ag Verfahren zum Kontaktieren eines in eine Leiterplatte eingebetteten Bauelements sowie Leiterplatte
US10178755B2 (en) * 2017-05-09 2019-01-08 Unimicron Technology Corp. Circuit board stacked structure and method for forming the same
KR102175825B1 (ko) * 2018-11-26 2020-11-06 엘비세미콘 주식회사 반도체 패키지의 제조방법
CN111010808B (zh) * 2019-12-31 2022-05-13 生益电子股份有限公司 一种pcb的制作方法
US11778752B2 (en) 2020-01-21 2023-10-03 Avary Holding (Shenzhen) Co., Limited. Circuit board with embedded electronic component and method for manufacturing the same
WO2022209319A1 (ja) * 2021-04-02 2022-10-06 株式会社村田製作所 配線基板及びモジュール

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4246595A (en) 1977-03-08 1981-01-20 Matsushita Electric Industrial Co., Ltd. Electronics circuit device and method of making the same
JPH0744320B2 (ja) 1989-10-20 1995-05-15 松下電器産業株式会社 樹脂回路基板及びその製造方法
JP3094481B2 (ja) * 1991-03-13 2000-10-03 松下電器産業株式会社 電子回路装置とその製造方法
US5353498A (en) 1993-02-08 1994-10-11 General Electric Company Method for fabricating an integrated circuit module
JPH11135951A (ja) * 1997-10-30 1999-05-21 Kyocera Corp 多層配線基板
JP4606685B2 (ja) * 1997-11-25 2011-01-05 パナソニック株式会社 回路部品内蔵モジュール
US6038133A (en) 1997-11-25 2000-03-14 Matsushita Electric Industrial Co., Ltd. Circuit component built-in module and method for producing the same
JP3619395B2 (ja) * 1999-07-30 2005-02-09 京セラ株式会社 半導体素子内蔵配線基板およびその製造方法
US6284564B1 (en) 1999-09-20 2001-09-04 Lockheed Martin Corp. HDI chip attachment method for reduced processing
US6271469B1 (en) 1999-11-12 2001-08-07 Intel Corporation Direct build-up layer on an encapsulated die package
US6154366A (en) 1999-11-23 2000-11-28 Intel Corporation Structures and processes for fabricating moisture resistant chip-on-flex packages
JP2001156457A (ja) * 1999-11-30 2001-06-08 Taiyo Yuden Co Ltd 電子回路装置の製造方法
US6475877B1 (en) * 1999-12-22 2002-11-05 General Electric Company Method for aligning die to interconnect metal on flex substrate
US6876072B1 (en) 2000-10-13 2005-04-05 Bridge Semiconductor Corporation Semiconductor chip assembly with chip in substrate cavity
TW511405B (en) 2000-12-27 2002-11-21 Matsushita Electric Ind Co Ltd Device built-in module and manufacturing method thereof
TW511415B (en) 2001-01-19 2002-11-21 Matsushita Electric Ind Co Ltd Component built-in module and its manufacturing method
JP2003037205A (ja) * 2001-07-23 2003-02-07 Sony Corp Icチップ内蔵多層基板及びその製造方法
JP2003133693A (ja) * 2001-10-29 2003-05-09 Denso Corp 配線形成方法、回路形成方法、配線形成装置、回路形成装置
JP3910045B2 (ja) * 2001-11-05 2007-04-25 シャープ株式会社 電子部品内装配線板の製造方法
FI115285B (fi) * 2002-01-31 2005-03-31 Imbera Electronics Oy Menetelmä komponentin upottamiseksi alustaan ja kontaktin muodostamiseksi
FI119215B (fi) * 2002-01-31 2008-08-29 Imbera Electronics Oy Menetelmä komponentin upottamiseksi alustaan ja elektroniikkamoduuli
US6701614B2 (en) 2002-02-15 2004-03-09 Advanced Semiconductor Engineering Inc. Method for making a build-up package of a semiconductor
JP2003249763A (ja) 2002-02-25 2003-09-05 Fujitsu Ltd 多層配線基板及びその製造方法
JP4288912B2 (ja) * 2002-08-08 2009-07-01 日立化成工業株式会社 配線板、半導体パッケージ用基板、半導体パッケージ及びそれらの製造方法
JP2004146634A (ja) 2002-10-25 2004-05-20 Murata Mfg Co Ltd 樹脂基板の製造方法、および樹脂多層基板の製造方法
JP4489411B2 (ja) * 2003-01-23 2010-06-23 新光電気工業株式会社 電子部品実装構造の製造方法
FI115601B (fi) 2003-04-01 2005-05-31 Imbera Electronics Oy Menetelmä elektroniikkamoduulin valmistamiseksi ja elektroniikkamoduuli

Also Published As

Publication number Publication date
FI20041059A (fi) 2006-02-06
JP4630333B2 (ja) 2011-02-09
US20080295326A1 (en) 2008-12-04
AT503718A2 (de) 2007-12-15
US7673387B2 (en) 2010-03-09
AT503718A5 (de) 2009-04-15
FI117812B (fi) 2007-02-28
AT503718B1 (de) 2009-06-15
KR20070041774A (ko) 2007-04-19
WO2006013230A3 (en) 2006-05-11
CN101027775A (zh) 2007-08-29
WO2006013230A2 (en) 2006-02-09
CN101686612A (zh) 2010-03-31
JP2008509549A (ja) 2008-03-27
CN100543983C (zh) 2009-09-23

Similar Documents

Publication Publication Date Title
FI20041059A0 (fi) Komponentin sisältävän kerroksen valmistaminen
NO20070753L (no) Fremgangsmåte for fremstilling av dihydropteridinoner
DE602005015215D1 (de) Orthosubstituierte aryl- oder heteroarylamidverbindungen
DK1809978T3 (da) Modul-skydebane
DK1828164T3 (da) Fremgangsmåde til fremstilling af N-phenylpyrazol-1-carboxamider
DK1720866T3 (da) Fremgangsmåde
DK1830956T3 (da) Fremgangsmåde til forberedelse af katalytiske materialer
DE602005027222D1 (de) Schaumbare zusammensetzung
NO20055643D0 (no) Preparation of lodixanol
DE602005017191D1 (de) Geruchsreduzierte waschstück-zusammensetzung
DK1831223T3 (da) Fremgangsmåde til fremstilling af L-biopterin
NO20043305D0 (no) Preparation of lodixanol
DK3332789T3 (da) Cladribinkur til behandling af multipel sklerose
AT500549B8 (de) Klärbecken
SE0400476L (sv) Komponent
FR2871686B1 (fr) Composition anti-decoloration
SE0601411L (sv) Förfarande vid beredning
FR2877833B1 (fr) Correcteur de lordoses
SE0400530L (sv) Förfarande
ATE384719T1 (de) Dioxazinyl-substituierte thienylsulfonylaminocarbonylverbindungen
FI20041385A (fi) Symmetria-akselin määrittäminen
ITMI20041086A1 (it) Procedimento per la preparazione di idrocarbilalogenuri
DE602005002161D1 (de) Hubschrauber
SE0403090D0 (sv) Framställning av häften
FI20041228A0 (fi) Hiomakiven kunto

Legal Events

Date Code Title Description
FG Patent granted

Ref document number: 117812

Country of ref document: FI

PC Transfer of assignment of patent

Owner name: GE EMBEDDED ELECTRONICS OY

PC Transfer of assignment of patent

Owner name: IMBERA TEK, LLC