ES8601557A1 - Un metodo de formar una estructura de contacto electrico - Google Patents

Un metodo de formar una estructura de contacto electrico

Info

Publication number
ES8601557A1
ES8601557A1 ES533300A ES533300A ES8601557A1 ES 8601557 A1 ES8601557 A1 ES 8601557A1 ES 533300 A ES533300 A ES 533300A ES 533300 A ES533300 A ES 533300A ES 8601557 A1 ES8601557 A1 ES 8601557A1
Authority
ES
Spain
Prior art keywords
transition metal
metal alloy
electrical contact
thin gold
gold coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES533300A
Other languages
English (en)
Other versions
ES533300A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Burlington Industries Inc
Original Assignee
Burlington Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Burlington Industries Inc filed Critical Burlington Industries Inc
Publication of ES533300A0 publication Critical patent/ES533300A0/es
Publication of ES8601557A1 publication Critical patent/ES8601557A1/es
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/562Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/615Microstructure of the layers, e.g. mixed structure
    • C25D5/619Amorphous layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/02Contacts characterised by the material thereof
    • H01H1/021Composite material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Contacts (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacture Of Switches (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)
  • Conductive Materials (AREA)

Abstract

UN CONTACTO DE INTERRUPTOR ELECTRICO. INCLUYE UN SUSTRATO ELECTRICAMENTE CONDUCTOR CON UNA ALEACION AMORFA DE METAL DE TRANSICION DEPOSITADA ELECTROLITICAMENTE SOBRE EL SUSTRATO. LA ALEACION AMORFA DE METAL DE TRANSICION ES UNA ALEACION DE NIQUEL-FOSFORO O DE NIQUEL-COBALTO-FOSFORO Y TIENE UN REVESTIMIENTO DESCUBIERTO DE ORO SOBRE SI. EL REVESTIMIENTO DE ORO TIENE UN ESPESOR COMPRENDIDO APROXIMADAMENTE ENTRE 254 Y 762 MILIMICRAS PREFERIBLEMENTE ENTRE 127 Y 381 MILIMICRAS DE ORO DURO.
ES533300A 1984-05-11 1984-06-11 Un metodo de formar una estructura de contacto electrico Expired ES8601557A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60913784A 1984-05-11 1984-05-11

Publications (2)

Publication Number Publication Date
ES533300A0 ES533300A0 (es) 1985-10-16
ES8601557A1 true ES8601557A1 (es) 1985-10-16

Family

ID=24439500

Family Applications (1)

Application Number Title Priority Date Filing Date
ES533300A Expired ES8601557A1 (es) 1984-05-11 1984-06-11 Un metodo de formar una estructura de contacto electrico

Country Status (5)

Country Link
EP (1) EP0160761B1 (es)
JP (1) JPS6129021A (es)
AT (1) ATE40721T1 (es)
DE (1) DE3476684D1 (es)
ES (1) ES8601557A1 (es)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0192703B1 (en) * 1984-08-31 1989-11-02 AT&T Corp. Nickel-based electrical contact
JPH01132072A (ja) * 1987-11-18 1989-05-24 Yazaki Corp 端子、接点等の金メッキ部品
US5637925A (en) * 1988-02-05 1997-06-10 Raychem Ltd Uses of uniaxially electrically conductive articles
US4891480A (en) * 1989-02-01 1990-01-02 American Telephone And Telegraph Company, At&T Bell Laboratories Apparatus including electrical contacts
JPH0359972A (ja) * 1989-07-27 1991-03-14 Yazaki Corp 電気接点
US5408574A (en) * 1989-12-01 1995-04-18 Philip Morris Incorporated Flat ceramic heater having discrete heating zones
US5468936A (en) * 1993-03-23 1995-11-21 Philip Morris Incorporated Heater having a multiple-layer ceramic substrate and method of fabrication
US6335107B1 (en) * 1999-09-23 2002-01-01 Lucent Technologies Inc. Metal article coated with multilayer surface finish for porosity reduction
FI113912B (fi) * 2001-12-13 2004-06-30 Outokumpu Oy Lisäaineellisella pinnoitteella varustettu yhdysterminaali
US7615255B2 (en) 2005-09-07 2009-11-10 Rohm And Haas Electronic Materials Llc Metal duplex method
DE102005047799A1 (de) * 2005-10-05 2007-05-24 W.C. Heraeus Gmbh Schleifringkörper zur kontinuierlichen Stromübertragung
US8652649B2 (en) * 2009-07-10 2014-02-18 Xtalic Corporation Coated articles and methods
DE102010033715A1 (de) 2010-08-07 2012-02-09 Audi Ag Ausgleichsbehälter für einen Kühlmittelkreislauf
US20130065069A1 (en) * 2011-09-09 2013-03-14 Yun Li Liu Electrodeposition of Hard Magnetic Coatings
US20170100916A1 (en) 2015-10-12 2017-04-13 Tyco Electronics Corporation Electronic Component and Process of Producing Electronic Component
US20170100744A1 (en) 2015-10-12 2017-04-13 Tyco Electronics Corporation Electronic Component and Process of Producing Electronic Component

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1059738B (de) * 1957-12-06 1959-06-18 Duerrwaechter E Dr Doduco Verfahren zur Herstellung eines Mehrschichtenmetalls
GB1507782A (en) * 1976-04-13 1978-04-19 Lea Ronal Inc Electrodeposition of gold
US4101389A (en) * 1976-05-20 1978-07-18 Sony Corporation Method of manufacturing amorphous alloy

Also Published As

Publication number Publication date
EP0160761B1 (en) 1989-02-08
DE3476684D1 (en) 1989-03-16
EP0160761A1 (en) 1985-11-13
ES533300A0 (es) 1985-10-16
ATE40721T1 (de) 1989-02-15
JPS6129021A (ja) 1986-02-08

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