ES2525040T3 - Materiales dieléctricos basados en fotopolímero y métodos de preparación y uso de los mismos - Google Patents
Materiales dieléctricos basados en fotopolímero y métodos de preparación y uso de los mismos Download PDFInfo
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- ES2525040T3 ES2525040T3 ES07862266.9T ES07862266T ES2525040T3 ES 2525040 T3 ES2525040 T3 ES 2525040T3 ES 07862266 T ES07862266 T ES 07862266T ES 2525040 T3 ES2525040 T3 ES 2525040T3
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- dielectric material
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- 239000003989 dielectric material Substances 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title description 45
- 238000002360 preparation method Methods 0.000 title description 13
- 239000004065 semiconductor Substances 0.000 claims abstract description 61
- 229920001577 copolymer Polymers 0.000 claims abstract description 23
- 150000002367 halogens Chemical class 0.000 claims abstract description 15
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 13
- 125000001424 substituent group Chemical group 0.000 claims abstract description 11
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims abstract description 10
- 125000001188 haloalkyl group Chemical group 0.000 claims abstract description 9
- 125000005915 C6-C14 aryl group Chemical group 0.000 claims abstract description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 8
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims abstract description 4
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims abstract description 4
- 229920001519 homopolymer Polymers 0.000 claims abstract 9
- 230000005669 field effect Effects 0.000 claims description 16
- 239000003960 organic solvent Substances 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 6
- 239000012808 vapor phase Substances 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 description 77
- 239000010410 layer Substances 0.000 description 73
- 239000000243 solution Substances 0.000 description 62
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- -1 n-octyl Chemical group 0.000 description 51
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 46
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 33
- 125000003118 aryl group Chemical group 0.000 description 33
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- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 23
- 125000000217 alkyl group Chemical group 0.000 description 22
- 238000004132 cross linking Methods 0.000 description 22
- 239000003990 capacitor Substances 0.000 description 19
- 239000010931 gold Substances 0.000 description 19
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- 238000006243 chemical reaction Methods 0.000 description 17
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- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 17
- 230000008569 process Effects 0.000 description 17
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- 241000522081 Cyema Species 0.000 description 16
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 16
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- 238000005481 NMR spectroscopy Methods 0.000 description 13
- 238000007792 addition Methods 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 125000000753 cycloalkyl group Chemical group 0.000 description 11
- 125000001072 heteroaryl group Chemical group 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
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- 125000004432 carbon atom Chemical group C* 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 9
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- 238000005160 1H NMR spectroscopy Methods 0.000 description 8
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 8
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- 239000004926 polymethyl methacrylate Substances 0.000 description 8
- 230000003252 repetitive effect Effects 0.000 description 8
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical compound FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 description 8
- 125000006519 CCH3 Chemical group 0.000 description 7
- 125000000304 alkynyl group Chemical group 0.000 description 7
- 229920002338 polyhydroxyethylmethacrylate Polymers 0.000 description 7
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 7
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- 238000003860 storage Methods 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
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- 125000005842 heteroatom Chemical group 0.000 description 6
- 125000000904 isoindolyl group Chemical group C=1(NC=C2C=CC=CC12)* 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 238000005266 casting Methods 0.000 description 5
- PXKHGMGELZGJQE-ILBGXUMGSA-N chloramphenicol palmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@@H](NC(=O)C(Cl)Cl)[C@H](O)C1=CC=C([N+]([O-])=O)C=C1 PXKHGMGELZGJQE-ILBGXUMGSA-N 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
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- 239000011159 matrix material Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 4
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 229920001940 conductive polymer Polymers 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 229940117389 dichlorobenzene Drugs 0.000 description 4
- 238000000113 differential scanning calorimetry Methods 0.000 description 4
- 238000007646 gravure printing Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- JRJXJINFDBNABL-UHFFFAOYSA-N (3-oxo-5-phenylpent-4-enyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC(=O)C=CC1=CC=CC=C1 JRJXJINFDBNABL-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 125000000041 C6-C10 aryl group Chemical group 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WLLGXSLBOPFWQV-UHFFFAOYSA-N MGK 264 Chemical compound C1=CC2CC1C1C2C(=O)N(CC(CC)CCCC)C1=O WLLGXSLBOPFWQV-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000004630 atomic force microscopy Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- XNMQEEKYCVKGBD-UHFFFAOYSA-N dimethylacetylene Natural products CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000007641 inkjet printing Methods 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 3
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 3
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- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 description 2
- 238000004566 IR spectroscopy Methods 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
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- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
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- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
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- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 2
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- KDKYADYSIPSCCQ-UHFFFAOYSA-N but-1-yne Chemical compound CCC#C KDKYADYSIPSCCQ-UHFFFAOYSA-N 0.000 description 2
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- 238000004364 calculation method Methods 0.000 description 2
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- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
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- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
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- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
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- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
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- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
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- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 108010081348 HRT1 protein Hairy Proteins 0.000 description 1
- 102100021881 Hairy/enhancer-of-split related with YRPW motif protein 1 Human genes 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Thin Film Transistor (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (3)
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| US86130806P | 2006-11-28 | 2006-11-28 | |
| US861308P | 2006-11-28 | ||
| PCT/US2007/024473 WO2008066826A1 (en) | 2006-11-28 | 2007-11-28 | Photopolymer-based dielectric materials and methods of preparation and use thereof |
Publications (1)
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| ES2525040T3 true ES2525040T3 (es) | 2014-12-16 |
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| ES07862266.9T Active ES2525040T3 (es) | 2006-11-28 | 2007-11-28 | Materiales dieléctricos basados en fotopolímero y métodos de preparación y uso de los mismos |
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| US (2) | US7981989B2 (enExample) |
| EP (1) | EP2089442B1 (enExample) |
| JP (1) | JP5148624B2 (enExample) |
| ES (1) | ES2525040T3 (enExample) |
| WO (1) | WO2008066826A1 (enExample) |
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| EP1839339A2 (en) | 2004-12-23 | 2007-10-03 | Northwestern University | Siloxane-polymer dielectric compositions and related organic field-effect transistors |
| US20070078675A1 (en) * | 2005-09-30 | 2007-04-05 | Kaplan Craig A | Contributor reputation-based message boards and forums |
| WO2008002660A2 (en) * | 2006-06-28 | 2008-01-03 | Northwestern University | Crosslinked polymeric dielectric materials and methods of manufacturing and use thereof |
| KR101717398B1 (ko) * | 2008-11-24 | 2017-03-16 | 바스프 에스이 | 광경화성 중합체 유전체 및 이의 제조 및 이용 방법 |
| CN102002121A (zh) | 2009-08-31 | 2011-04-06 | 住友化学株式会社 | 树脂，抗蚀剂组合物和用于制造抗蚀剂图案的方法 |
| TW201126606A (en) * | 2009-09-15 | 2011-08-01 | Sumitomo Chemical Co | Photocrosslinkable organic thin-film transistor insulation layer material |
| US8471253B2 (en) | 2010-05-19 | 2013-06-25 | Northwestern University | Crosslinked hybrid gate dielectric materials and electronic devices incorporating same |
| KR101841000B1 (ko) | 2010-07-28 | 2018-03-22 | 스미또모 가가꾸 가부시키가이샤 | 포토레지스트 조성물 |
| TWI521302B (zh) | 2010-08-30 | 2016-02-11 | 住友化學股份有限公司 | 阻劑組成物及阻劑圖案的產生方法 |
| US8436068B2 (en) | 2010-10-27 | 2013-05-07 | Industrial Technology Research Institute | Composition and polymer |
| JP5829939B2 (ja) | 2011-02-25 | 2015-12-09 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP5829940B2 (ja) | 2011-02-25 | 2015-12-09 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP6034025B2 (ja) | 2011-02-25 | 2016-11-30 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP5947053B2 (ja) | 2011-02-25 | 2016-07-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP5947051B2 (ja) | 2011-02-25 | 2016-07-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP5898520B2 (ja) | 2011-02-25 | 2016-04-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP5898521B2 (ja) | 2011-02-25 | 2016-04-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP6034026B2 (ja) | 2011-02-25 | 2016-11-30 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP5829941B2 (ja) * | 2011-02-25 | 2015-12-09 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| WO2012129511A2 (en) | 2011-03-24 | 2012-09-27 | Northwestern University | Semiconducting compounds and devices incorporating same |
| JP2013008951A (ja) * | 2011-05-26 | 2013-01-10 | Sumitomo Chemical Co Ltd | 光及び熱エネルギー架橋性有機薄膜トランジスタ絶縁層材料 |
| KR101308489B1 (ko) | 2011-05-26 | 2013-09-17 | 경희대학교 산학협력단 | 폴리(2-히드록시알킬메타아크릴레이트)계 유도체를 사용한 액정 배향막 및 이의 제조방법 |
| JP5886696B2 (ja) | 2011-07-19 | 2016-03-16 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP6013799B2 (ja) | 2011-07-19 | 2016-10-25 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP6013797B2 (ja) | 2011-07-19 | 2016-10-25 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP6189020B2 (ja) | 2011-07-19 | 2017-08-30 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP5912912B2 (ja) | 2011-07-19 | 2016-04-27 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
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| WO2008066826A1 (en) | 2008-06-05 |
| US7981989B2 (en) | 2011-07-19 |
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| US20110266534A1 (en) | 2011-11-03 |
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