JP5148624B2 - フォトポリマーベースの誘電材料ならびにその調製方法および使用方法 - Google Patents

フォトポリマーベースの誘電材料ならびにその調製方法および使用方法 Download PDF

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JP5148624B2
JP5148624B2 JP2009539298A JP2009539298A JP5148624B2 JP 5148624 B2 JP5148624 B2 JP 5148624B2 JP 2009539298 A JP2009539298 A JP 2009539298A JP 2009539298 A JP2009539298 A JP 2009539298A JP 5148624 B2 JP5148624 B2 JP 5148624B2
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dielectric material
dielectric
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copolymer
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JP2010511094A5 (enExample
JP2010511094A (ja
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ヘ ヤン，
アントニオ ファチェッティ，
トビン ジェイ． マークス，
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Polyera Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Thin Film Transistor (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Formation Of Insulating Films (AREA)
JP2009539298A 2006-11-28 2007-11-28 フォトポリマーベースの誘電材料ならびにその調製方法および使用方法 Active JP5148624B2 (ja)

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US86130806P 2006-11-28 2006-11-28
US60/861,308 2006-11-28
PCT/US2007/024473 WO2008066826A1 (en) 2006-11-28 2007-11-28 Photopolymer-based dielectric materials and methods of preparation and use thereof

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JP2010511094A5 JP2010511094A5 (enExample) 2012-01-26
JP5148624B2 true JP5148624B2 (ja) 2013-02-20

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US (2) US7981989B2 (enExample)
EP (1) EP2089442B1 (enExample)
JP (1) JP5148624B2 (enExample)
ES (1) ES2525040T3 (enExample)
WO (1) WO2008066826A1 (enExample)

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JP2018018928A (ja) * 2016-07-27 2018-02-01 東ソー株式会社 絶縁膜及びこれを含む有機電界効果トランジスタデバイス
US12291587B2 (en) 2017-03-16 2025-05-06 Tosoh Corporation Photocrosslinkable polymer, insulating film, planarization film, lyophilic/liquid repellent patterned film, and organic field effect transistor device comprising same

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JP6013797B2 (ja) 2011-07-19 2016-10-25 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
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Cited By (2)

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Publication number Priority date Publication date Assignee Title
JP2018018928A (ja) * 2016-07-27 2018-02-01 東ソー株式会社 絶縁膜及びこれを含む有機電界効果トランジスタデバイス
US12291587B2 (en) 2017-03-16 2025-05-06 Tosoh Corporation Photocrosslinkable polymer, insulating film, planarization film, lyophilic/liquid repellent patterned film, and organic field effect transistor device comprising same

Also Published As

Publication number Publication date
US8338555B2 (en) 2012-12-25
JP2010511094A (ja) 2010-04-08
ES2525040T3 (es) 2014-12-16
EP2089442B1 (en) 2014-10-01
WO2008066826A1 (en) 2008-06-05
US7981989B2 (en) 2011-07-19
EP2089442A1 (en) 2009-08-19
US20080161524A1 (en) 2008-07-03
US20110266534A1 (en) 2011-11-03

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