ES2396801T3 - Baño galvánico, procedimiento para la deposición galvánica y uso de una membrana bipolar para la separación en un baño galvánico - Google Patents

Baño galvánico, procedimiento para la deposición galvánica y uso de una membrana bipolar para la separación en un baño galvánico Download PDF

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Publication number
ES2396801T3
ES2396801T3 ES08861431T ES08861431T ES2396801T3 ES 2396801 T3 ES2396801 T3 ES 2396801T3 ES 08861431 T ES08861431 T ES 08861431T ES 08861431 T ES08861431 T ES 08861431T ES 2396801 T3 ES2396801 T3 ES 2396801T3
Authority
ES
Spain
Prior art keywords
galvanic bath
galvanic
zinc
membrane
bath according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES08861431T
Other languages
English (en)
Spanish (es)
Inventor
Hartmut Trenkner
Alexander Jimenez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coventya GmbH
Original Assignee
Coventya GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coventya GmbH filed Critical Coventya GmbH
Application granted granted Critical
Publication of ES2396801T3 publication Critical patent/ES2396801T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Cosmetics (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
ES08861431T 2007-12-14 2008-12-15 Baño galvánico, procedimiento para la deposición galvánica y uso de una membrana bipolar para la separación en un baño galvánico Active ES2396801T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007060200A DE102007060200A1 (de) 2007-12-14 2007-12-14 Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad
DE102007060200 2007-12-14
PCT/EP2008/010635 WO2009077146A2 (de) 2007-12-14 2008-12-15 Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad

Publications (1)

Publication Number Publication Date
ES2396801T3 true ES2396801T3 (es) 2013-02-27

Family

ID=40394014

Family Applications (1)

Application Number Title Priority Date Filing Date
ES08861431T Active ES2396801T3 (es) 2007-12-14 2008-12-15 Baño galvánico, procedimiento para la deposición galvánica y uso de una membrana bipolar para la separación en un baño galvánico

Country Status (6)

Country Link
EP (1) EP2235236B1 (pl)
BR (1) BRPI0820988B1 (pl)
DE (1) DE102007060200A1 (pl)
ES (1) ES2396801T3 (pl)
PL (1) PL2235236T3 (pl)
WO (1) WO2009077146A2 (pl)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2489763A1 (en) * 2011-02-15 2012-08-22 Atotech Deutschland GmbH Zinc-iron alloy layer material
JP5805055B2 (ja) * 2012-11-24 2015-11-04 丸仲工業株式会社 水平搬送式電解メッキ装置
JP5995906B2 (ja) 2014-05-19 2016-09-21 株式会社豊田中央研究所 隔膜の製造方法、及び金属被膜の製造方法
CN106550606B (zh) 2015-07-22 2019-04-26 迪普索股份公司 锌合金镀敷方法
RU2613826C1 (ru) * 2015-07-22 2017-03-21 Дипсол Кемикалз Ко., Лтд. Способ гальваностегии цинковым сплавом
CN106987879A (zh) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 电沉积装置及其电沉积方法
EP3696299A1 (en) 2019-02-15 2020-08-19 Coventya GmbH Method for producing a corrosion-resistant aluminum-silicon alloy casting, corresponding corrosion-resistant aluminum-silicon alloy casting and its use
CN111663167A (zh) * 2020-06-16 2020-09-15 合肥工业大学 一种基于bpe技术的金属线制备方法
CN113025829B (zh) * 2021-04-26 2022-12-06 福建师范大学 一种应用双极膜电渗析处理铜矿石冶炼废渣的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4122543A1 (de) * 1991-03-18 1992-10-08 Hans Josef May Verfahren zur elektrochemischen beschichtung von metallbaendern
DE29615084U1 (de) * 1996-08-29 1996-10-24 Ko, Chien-Hsin, Taipeh/T`ai-pei Vorrichtung zum kontinuierlichen Galvanisieren von Platten
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
US6827832B2 (en) * 1999-12-22 2004-12-07 National Research Council Of Canada Electrochemical cell and process for reducing the amount of organic contaminants in metal plating baths
DE60023190T3 (de) 2000-06-15 2016-03-10 Coventya, Inc. Zink-nickel-elektroplattierung
US6528185B2 (en) * 2001-02-28 2003-03-04 Hong Kong Polytechnic University Cobalt-tungsten-phosphorus alloy diffusion barrier coatings, methods for their preparation, and their use in plated articles
GB2383337A (en) * 2001-12-21 2003-06-25 Accentus Plc Electroplating plant and method
DE10225203A1 (de) 2002-06-06 2003-12-18 Goema Ag Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
US20050274620A1 (en) * 2004-06-15 2005-12-15 Kovarsky Nicolay Y Copper replenishment system for interconnect applications
WO2006004662A1 (en) * 2004-06-25 2006-01-12 Ge Ionics, Inc. Bipolar membrane and method of making same

Also Published As

Publication number Publication date
BRPI0820988B1 (pt) 2018-12-04
PL2235236T3 (pl) 2013-03-29
BRPI0820988A2 (pt) 2015-08-04
EP2235236A2 (de) 2010-10-06
WO2009077146A3 (de) 2010-01-14
WO2009077146A2 (de) 2009-06-25
DE102007060200A1 (de) 2009-06-18
EP2235236B1 (de) 2012-10-03

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