WO2009077146A3 - Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad - Google Patents

Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad Download PDF

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Publication number
WO2009077146A3
WO2009077146A3 PCT/EP2008/010635 EP2008010635W WO2009077146A3 WO 2009077146 A3 WO2009077146 A3 WO 2009077146A3 EP 2008010635 W EP2008010635 W EP 2008010635W WO 2009077146 A3 WO2009077146 A3 WO 2009077146A3
Authority
WO
WIPO (PCT)
Prior art keywords
galvanic
zinc
bath
galvanic bath
separating
Prior art date
Application number
PCT/EP2008/010635
Other languages
English (en)
French (fr)
Other versions
WO2009077146A2 (de
Inventor
Hartmut Trenkner
Alexander Jimenez
Original Assignee
Coventya Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coventya Gmbh filed Critical Coventya Gmbh
Priority to EP08861431A priority Critical patent/EP2235236B1/de
Priority to ES08861431T priority patent/ES2396801T3/es
Priority to PL08861431T priority patent/PL2235236T3/pl
Priority to BRPI0820988A priority patent/BRPI0820988B1/pt
Publication of WO2009077146A2 publication Critical patent/WO2009077146A2/de
Publication of WO2009077146A3 publication Critical patent/WO2009077146A3/de

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/22Electroplating: Baths therefor from solutions of zinc
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002Cell separation, e.g. membranes, diaphragms
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/565Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Cosmetics (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

Die Erfindung betrifft ein alkalisches, galvanisches Bad zum Aufbringen von Zink oder Zinklegierungen auf Substraten, bei dem der Anodenraum und der Kathodenraum durch eine bipolare Membran voneinander getrennt sind. Das Galvanikbad wird mit Zink bzw. Zinklegierungsbädern betrieben, die weitere Zusätze enthalten können. Weiterhin betrifft die Erfindung ein Verfahren zur galvanischen Abscheidung von Zink oder Zinklegierungen auf Substraten, bei dem das Substrat in das erfindungsgemäße galvanische Bad eingebracht wird. Darüber hinaus betrifft die Erfindung die Verwendung von bipolaren Membranen zur Separation von Anodenraum und Kathodenraum in galvanischen Bädern und zur Vermeidung der anodischen Zersetzung organischer Komponenten des Elektrolyten in galvanischen Bädern.
PCT/EP2008/010635 2007-12-14 2008-12-15 Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad WO2009077146A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP08861431A EP2235236B1 (de) 2007-12-14 2008-12-15 Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad
ES08861431T ES2396801T3 (es) 2007-12-14 2008-12-15 Baño galvánico, procedimiento para la deposición galvánica y uso de una membrana bipolar para la separación en un baño galvánico
PL08861431T PL2235236T3 (pl) 2007-12-14 2008-12-15 Kąpiel galwaniczna, sposób galwanicznego osadzania i zastosowanie bipolarnej membrany do separacji w kąpieli galwanicznej
BRPI0820988A BRPI0820988B1 (pt) 2007-12-14 2008-12-15 banho galvânico, processo para a separação galvânica e emprego de um diafragma bipolar para a separação em um banho galvânico e emprego de um diafragma bipolar para evitar a decomposição anódica

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007060200.8 2007-12-14
DE102007060200A DE102007060200A1 (de) 2007-12-14 2007-12-14 Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad

Publications (2)

Publication Number Publication Date
WO2009077146A2 WO2009077146A2 (de) 2009-06-25
WO2009077146A3 true WO2009077146A3 (de) 2010-01-14

Family

ID=40394014

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/010635 WO2009077146A2 (de) 2007-12-14 2008-12-15 Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad

Country Status (6)

Country Link
EP (1) EP2235236B1 (de)
BR (1) BRPI0820988B1 (de)
DE (1) DE102007060200A1 (de)
ES (1) ES2396801T3 (de)
PL (1) PL2235236T3 (de)
WO (1) WO2009077146A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2489763A1 (de) * 2011-02-15 2012-08-22 Atotech Deutschland GmbH Zink-Eisen-Legierungsschichtmaterial
JP5805055B2 (ja) * 2012-11-24 2015-11-04 丸仲工業株式会社 水平搬送式電解メッキ装置
JP5995906B2 (ja) 2014-05-19 2016-09-21 株式会社豊田中央研究所 隔膜の製造方法、及び金属被膜の製造方法
WO2016075964A1 (ja) 2015-07-22 2016-05-19 ディップソール株式会社 亜鉛合金めっき方法
KR101622527B1 (ko) 2015-07-22 2016-05-18 딥솔 가부시키가이샤 아연 합금 도금 방법
CN106987879A (zh) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 电沉积装置及其电沉积方法
EP3696299A1 (de) * 2019-02-15 2020-08-19 Coventya GmbH Verfahren zur herstellung eines korrosionsbeständigen aluminium-silicium-legierungs-gusses, korrosionsbeständiger aluminium-silicium-legierungs-guss und dessen verwendung
CN111663167A (zh) * 2020-06-16 2020-09-15 合肥工业大学 一种基于bpe技术的金属线制备方法
CN113025829B (zh) * 2021-04-26 2022-12-06 福建师范大学 一种应用双极膜电渗析处理铜矿石冶炼废渣的方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4122543A1 (de) * 1991-03-18 1992-10-08 Hans Josef May Verfahren zur elektrochemischen beschichtung von metallbaendern
WO2001096631A1 (en) * 2000-06-15 2001-12-20 Taskem Inc. Zinc-nickel electroplating
US20020160222A1 (en) * 2001-02-28 2002-10-31 Man Hau-Chung Cobalt-tungsten-phosphorus alloy diffusion barrier coatings, methods for their preparation, and their use in plated articles
US20030089622A1 (en) * 1999-12-22 2003-05-15 Henuset Yves Michel Electrochemical cell and process for reducing the amount of organic contaminants in metal plating baths
GB2383337A (en) * 2001-12-21 2003-06-25 Accentus Plc Electroplating plant and method
US20050189231A1 (en) * 2004-02-26 2005-09-01 Capper Lee D. Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
US20050274620A1 (en) * 2004-06-15 2005-12-15 Kovarsky Nicolay Y Copper replenishment system for interconnect applications
US20060173084A1 (en) * 2004-06-25 2006-08-03 Yongchang Zheng Bipolar membrane and method of making same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE29615084U1 (de) * 1996-08-29 1996-10-24 Ko, Chien-Hsin, Taipeh/T`ai-pei Vorrichtung zum kontinuierlichen Galvanisieren von Platten
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
DE10225203A1 (de) 2002-06-06 2003-12-18 Goema Ag Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4122543A1 (de) * 1991-03-18 1992-10-08 Hans Josef May Verfahren zur elektrochemischen beschichtung von metallbaendern
US20030089622A1 (en) * 1999-12-22 2003-05-15 Henuset Yves Michel Electrochemical cell and process for reducing the amount of organic contaminants in metal plating baths
WO2001096631A1 (en) * 2000-06-15 2001-12-20 Taskem Inc. Zinc-nickel electroplating
US20020160222A1 (en) * 2001-02-28 2002-10-31 Man Hau-Chung Cobalt-tungsten-phosphorus alloy diffusion barrier coatings, methods for their preparation, and their use in plated articles
GB2383337A (en) * 2001-12-21 2003-06-25 Accentus Plc Electroplating plant and method
US20050189231A1 (en) * 2004-02-26 2005-09-01 Capper Lee D. Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
US20050274620A1 (en) * 2004-06-15 2005-12-15 Kovarsky Nicolay Y Copper replenishment system for interconnect applications
US20060173084A1 (en) * 2004-06-25 2006-08-03 Yongchang Zheng Bipolar membrane and method of making same

Also Published As

Publication number Publication date
EP2235236A2 (de) 2010-10-06
DE102007060200A1 (de) 2009-06-18
ES2396801T3 (es) 2013-02-27
BRPI0820988A2 (pt) 2015-08-04
BRPI0820988B1 (pt) 2018-12-04
PL2235236T3 (pl) 2013-03-29
EP2235236B1 (de) 2012-10-03
WO2009077146A2 (de) 2009-06-25

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