HK1143194A1 - Method to electrodeposit metals using ionic liquids in the presence of an additive - Google Patents

Method to electrodeposit metals using ionic liquids in the presence of an additive

Info

Publication number
HK1143194A1
HK1143194A1 HK10109690.2A HK10109690A HK1143194A1 HK 1143194 A1 HK1143194 A1 HK 1143194A1 HK 10109690 A HK10109690 A HK 10109690A HK 1143194 A1 HK1143194 A1 HK 1143194A1
Authority
HK
Hong Kong
Prior art keywords
metal
additive
ionic liquid
ionic liquids
electrodeposit metals
Prior art date
Application number
HK10109690.2A
Inventor
Boris Kuzmanovic
Lamberdine Johanna Willemina Maria Nabuurs-Willems
Cornelis Johannes Govardus Van Strien
Franz Winfried Welter
Johanna Christina Speelman
Original Assignee
Akzo Nobel Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akzo Nobel Nv filed Critical Akzo Nobel Nv
Publication of HK1143194A1 publication Critical patent/HK1143194A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing

Abstract

The present invention pertains to the use of an additive selected from the group consisting of amorphous silica, graphite powder, and a mixture thereof in a process to electroplate or electropolish a metal on a substrate using an ionic liquid as the electrolyte to increase metal layer thickness. It furthermore pertains to a method to electroplate or electropolish a metal on a metal substrate wherein an ionic liquid is employed as electrolyte, wherein a metal salt added to said ionic liquid or a metal anode is employed as metal source, and wherein said ionic liquid comprises said additive.
HK10109690.2A 2007-08-02 2010-10-13 Method to electrodeposit metals using ionic liquids in the presence of an additive HK1143194A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07113717 2007-08-02
US95443407P 2007-08-07 2007-08-07
PCT/EP2008/059962 WO2009016189A1 (en) 2007-08-02 2008-07-30 Method to electrodeposit metals using ionic liquids in the presence of an additive

Publications (1)

Publication Number Publication Date
HK1143194A1 true HK1143194A1 (en) 2010-12-24

Family

ID=38870310

Family Applications (1)

Application Number Title Priority Date Filing Date
HK10109690.2A HK1143194A1 (en) 2007-08-02 2010-10-13 Method to electrodeposit metals using ionic liquids in the presence of an additive

Country Status (12)

Country Link
US (1) US20100252446A1 (en)
EP (1) EP2171131B1 (en)
JP (1) JP2010535283A (en)
CN (1) CN101765681B (en)
AT (1) ATE493523T1 (en)
CA (1) CA2695488A1 (en)
DE (1) DE602008004255D1 (en)
ES (1) ES2358967T3 (en)
HK (1) HK1143194A1 (en)
PL (1) PL2171131T3 (en)
TW (1) TWI359880B (en)
WO (1) WO2009016189A1 (en)

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AU2010225457B2 (en) * 2009-03-17 2015-08-20 Commonwealth Scientific And Industrial Research Organisation Electrorecovery of metals
DE102009035660A1 (en) 2009-07-30 2011-02-03 Ewald Dörken Ag Process for the electrochemical coating of a workpiece
US20120189778A1 (en) * 2011-01-26 2012-07-26 Riewe Curtis H Coating method using ionic liquid
CN102888630B (en) * 2011-07-20 2015-11-18 中国科学院过程工程研究所 A kind of ionic liquid/additive system Low-temperature electro-deposition prepares the method for nano aluminum or nano aluminum coating
US9758884B2 (en) 2012-02-16 2017-09-12 Stacey Hingley Color control of trivalent chromium deposits
DE102012104707A1 (en) * 2012-05-31 2013-12-05 Benteler Automobiltechnik Gmbh Method for producing an exhaust gas heat exchanger
WO2013182631A1 (en) 2012-06-08 2013-12-12 Onderzoekscentrum Voor Aanwending Van Staal N.V. Method for producing a metal coating
CN102839403B (en) * 2012-09-10 2015-02-25 太原理工大学 Method for electroplating aluminum in ionic liquid
CN103484900A (en) * 2013-09-18 2014-01-01 湖南工业大学 Method for preparing crystalline nanocrystal micro-crack-free chromium coating in ionic liquid in direct electro-deposition mode
EP3080338B1 (en) 2013-12-10 2018-10-03 Lei Chen Nickel-chromium-aluminum composite by electrodeposition
US10669867B2 (en) 2013-12-10 2020-06-02 Raytheon Technologies Corporation Electrodeposited nickel-chromium alloy
EP3080323B1 (en) * 2013-12-11 2019-05-15 United Technologies Corporation Electroformed nickel-chromium alloy
CN104294327B (en) * 2014-10-20 2016-07-13 中国科学院过程工程研究所 A kind of il electrolyte and the method preparing light aluminium coat with this electrolyte
CN105220216B (en) * 2015-09-28 2017-08-25 中国科学院兰州化学物理研究所 A kind of aluminum or aluminum alloy electrochemical polishing method
TWI662162B (en) * 2016-11-15 2019-06-11 財團法人工業技術研究院 Electroplating method and system thereof
JP7072796B2 (en) * 2018-02-19 2022-05-23 国立大学法人 名古屋工業大学 Dimming member
US20210156041A1 (en) * 2019-11-22 2021-05-27 Hamilton Sundstrand Corporation Metallic coating and method of application

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
JPS5265120A (en) * 1975-11-26 1977-05-30 Sony Corp Electro plating method of aluminium or aluminium alloy
JPH01132571A (en) * 1987-11-18 1989-05-25 Aguro Kanesho Kk Agricultural and horticultural fungicide
GB0023706D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Ionic liquids
GB0023708D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Hydrated salt mixtures
US6552843B1 (en) * 2002-01-31 2003-04-22 Innovative Technology Licensing Llc Reversible electrodeposition device with ionic liquid electrolyte
US20050205425A1 (en) * 2002-06-25 2005-09-22 Integran Technologies Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents
US6721080B1 (en) * 2002-09-27 2004-04-13 D Morgan Tench Optimum switching of a reversible electrochemical mirror device
US6798556B2 (en) * 2003-01-31 2004-09-28 Rockwell Scientific Licensing, Llc. Locally-switched reversible electrodeposition optical modulator
DE102004059520A1 (en) * 2004-12-10 2006-06-14 Merck Patent Gmbh Electrochemical deposition of tantalum and / or copper in ionic liquids
US7320832B2 (en) * 2004-12-17 2008-01-22 Integran Technologies Inc. Fine-grained metallic coatings having the coefficient of thermal expansion matched to the one of the substrate
JP2007070698A (en) * 2005-09-07 2007-03-22 Kyoto Univ Method for electrodepositing metal
JP5134553B2 (en) * 2006-02-15 2013-01-30 アクゾ ノーベル ナムローゼ フェンノートシャップ Metal electrodeposition using ionic liquid

Also Published As

Publication number Publication date
ATE493523T1 (en) 2011-01-15
ES2358967T3 (en) 2011-05-17
TWI359880B (en) 2012-03-11
CN101765681A (en) 2010-06-30
EP2171131B1 (en) 2010-12-29
DE602008004255D1 (en) 2011-02-10
PL2171131T3 (en) 2011-05-31
CA2695488A1 (en) 2009-02-05
CN101765681B (en) 2013-03-20
TW200925334A (en) 2009-06-16
WO2009016189A1 (en) 2009-02-05
EP2171131A1 (en) 2010-04-07
JP2010535283A (en) 2010-11-18
US20100252446A1 (en) 2010-10-07

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20170730